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US5067976A
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Cryogenic process for the production of an oxygen-free and methane-free, krypton/xenon product
Assignee: Air Products and Chemicals Inc
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Filing: 1991-02-05
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Granted: 1991-11-26
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Expires: 2011-02-05
Abstract
Abstract The present invention relates to a process for the production of kryton and xenon by using an oxygen-free vapor stream to strip a liquid stream containing oxygen, krypton, methane, and xenon of methane and oxygen. This is accomplished by properly controlling the liquid to vapor flow ratio in the distillation column so that such ratio is less than 0.15. A suitable reflux liquid is used to decrease the loss of krypton and xenon in the methane and oxygen laden vapor stream leaving the distillation system.
Inventors
- 👤 Rakesh Agrawal
- 👤 Brian E. Farrell
- 👤 Keith B. Wilson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:57
CPC Classifications
F; F25; F25J; F25J3/00; F25J3/02; F25J3/04; F25J3/04642; F25J3/04745; F25J3/04406; F25J3/04412; F25J3/04648; F25J3/04654; F25J3/04666; F25J3/04672; F25J3/04678; F25J2200/00; F25J2200/32; F25J2200/34; F25J2205/00; F25J2205/30; F25J2205/60; F25J2245/00; F25J2245/42; Y; Y10; Y10S; Y10S62/00; Y10S62/923; Y10S62/925
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
165 words
In a process for separating a feed gas containing krypton, xenon, oxygen and methane in a cryogenic distillation column wherein the feed gas is fed to an intermediate location of the distillation column for fractionation into a methane-free, krypton and xenon bottoms liquid and a methane-rich waste overhead, wherein liquid reflux for the column is provided by introducing a liquid feed to an upper location in the column above the intermediate feed location, and wherein vapor reflux is provided to the column by introducing a gaseous bottom feed to an lower location in the column below the intermediate feed location, the improvement for increasing recovery of krypton and xenon and producing a krypton and xenon product containing less than 1 ppm oxygen and 1 ppm methane comprises using a gaseous stream containing less than 1 ppm oxygen and 1 ppm methane as the gaseous bottom feed and operating the column so that the vapor to liquid flow ratio in the column is less than 0.15.
Claim 2
Dependent Claim
165 words
In a process for separating a feed gas containing krypton, xenon, oxygen and methane in a cryogenic distillation column wherein the feed gas is fed to an intermediate location of the distillation column for fractionation into a methane-free, krypton and xenon bottoms liquid and a methane-rich waste overhead, wherein liquid reflux for the column is provided by introducing a liquid feed to an upper location in the column above the intermediate feed location, and wherein vapor reflux is provided to the column by introducing a gaseous bottom feed to an lower location in the column below the intermediate feed location, the improvement for increasing recovery of krypton and xenon and producing a krypton and xenon product containing less than 1 ppm oxygen and 1 ppm methane comprises using a gaseous stream containing less than 1 ppm oxygen and 1 ppm methane as the gaseous bottom feed and operating the column so that the vapor to liquid flow ratio in the column is less than 0.15.
Claim 3
Dependent Claim
33 words
The process of claim 1, wherein additional vapor reflux to the column is provided by boiling a portion of the methane-free, krypton and xenon bottoms liquid in a reboiler against a heat source.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-11-25 | 1995-05-27 | 1995-11-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-11-25 | 1999-05-27 | 1999-11-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-11-25 | 2003-05-27 | 2003-11-26 | $7700.00 | Window Closed / Lapsed |