US5066751A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist material for energy beam lithography and method of using the same
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1990-01-22
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Granted: 1991-11-19
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Expires: 2010-01-22
Abstract
Abstract A positive-type resist material for forming resist patterns having submicron geometries on a substrate, the resist material comprising a copolymer of a first monomer of silicon containing methacrylic ester and a second monomer of either acrylic ester or acrylonitrile, the alpha-position of the second monomer being substituted by an electron attracting group. The first monomer has a high resistance to an oxygen plasma and the second monomer has a high sensitivity to e-beam/X-ray irradiation. As the electron attracting group, a trifluoromethyl group, a halogen group, a cyano group and a CH 2 CO 2 R group are used. The embodied first monomers are trimethylsilylmethyl methacrylate and (diphenylmethylsilyl)methyl methacrylate, and the embodied second monomers are α-trifluoromethyl (2,2,2-trifluoroethyl) acrylate and α-chloroacrylonitrile.
Inventors
- 👤 Akiko Kotachi
- 👤 Satoshi Takechi
- 👤 Yuko Nakamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 01:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
27 words
A resist material comprising a copolymer of silicon containing methacrylic ester the and acrylic ester, alpha-position of the acrylic ester being substituted by an electron attracting group.
Claim 2
Dependent Claim
27 words
A resist material comprising a copolymer of silicon containing methacrylic ester the and acrylic ester, alpha-position of the acrylic ester being substituted by an electron attracting group.
Claim 3
Dependent Claim
25 words
A resist material comprising a copolymer of silicon containing methacrylic ester and acrylonitrile, the alpha-position of the acrylonitrile being substituted by an electron attracting group.
Claim 4
Dependent Claim
25 words
A resist material comprising a copolymer of silicon containing methacrylic ester and acrylonitrile, the alpha-position of the acrylonitrile being substituted by an electron attracting group.
Claim 5
Dependent Claim
41 words
A resist material as recited in claims 1 or 2, wherein said electron attracting group is a selected one of a trifluoromethyl group (CF 3 ), a halogen group, a cyano group (CN) and a CH 2 CO 2 R group.
Claim 6
Dependent Claim
21 words
A resist material as recited in claim 1, wherein said silicon containing methacrylic ester is trimethylsilylmethyl methacrylate, shown as follows: ##STR9##
Claim 7
Dependent Claim
21 words
A resist material as recited in claim 1, wherein said silicon containing methacrylic ester is (diphenylmethylsilyl)methyl methacrylate, shown as follows: ##STR10##
Claim 8
Dependent Claim
30 words
A resist material as recited in claim 1, wherein said acrylic ester, the alpha-position thereof being substituted by an electron attracting group, is α-trifluoromethyl (2,2,2-trifluoroethyl) acrylate, shown as follows: ##STR11##
Claim 9
Dependent Claim
27 words
A resist material as recited in claim 2, wherein said acrylonitrile, the alpha-position thereof being substituted by an electron attracting group, is α-chloroacrylonitrile shown as follows: ##STR12##
Claim 10
Dependent Claim
38 words
A resist material as recited in claim 2, wherein said electron attracting group is any one selected among a trifluoromethyl group (CF 3 ), a halogen group, a cyano group (CN) and a CH 2 CO R group.
Claim 11
Dependent Claim
20 words
A resist material as recited in claim 2, wherein said silicon containing methacrylic ester is trimethylsilylmethyl methacrylate shown as follows:
Claim 12
Dependent Claim
20 words
A resist material as recited in claim 2, wherein said silicon containing methacrylic ester is (diphenylmethylsilyl)methyl methacrylate shown as follows:
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-11-18 | 1995-05-20 | 1995-11-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-11-18 | 1999-05-20 | 1999-11-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-11-18 | 2003-05-20 | 2003-11-19 | $7700.00 | Window Closed / Lapsed |