EP0271708A2
Expired / Lapsed
EP
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Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
Assignee: Eastman Kodak Co
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Filing: 1987-11-09
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Granted: —
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Expires: 2007-11-09
Abstract
Abstract A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.
Inventors
- 👤 David Benedict C/O Eastman Kodak Company Bailey
- 👤 Michael Mojsiej C/O Eastman Kodak Company Feldman
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-03 07:21
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
23 words
A photoresist composition comprising a photosensitive compound and an interpolymer characterized in that said interpolymer is of a silicon-containing monomer and an hydroxystyrene.
Claim 2
Dependent Claim
23 words
A photoresist composition comprising a photosensitive compound and an interpolymer characterized in that said interpolymer is of a silicon-containing monomer and an hydroxystyrene.
Claim 3
Dependent Claim
18 words
The composition of claim 1 wherein said hydroxystyrene has the structural formula where R⁴ is H or CH₃.
Claim 4
Dependent Claim
35 words
The composition of claim 1 wherein said silicon-containing monomer has the structural formula: wherein R is H or CH₃, n is 0 or 1, L is a linking group and B is a silicon-containing moiety.
Claim 5
Dependent Claim
12 words
The composition of claim 3 wherein said silicon-containing monomer is an acrylate.
Claim 6
Dependent Claim
16 words
The composition of claim 1 wherein said interpolymer comprises at least 6% by weight of Si.
Claim 7
Dependent Claim
45 words
The composition of claim 1 wherein said interpolymer comprises recurring units having the structural formulae: wherein x is 1, 2 or 3, and each R¹, R² and R³ is independently alkyl containing from 1 to 6 carbon atoms, and wherein R⁴ is H or CH₃.
Claim 8
Dependent Claim
9 words
The composition of claim 6 wherein R⁴ is H.
Claim 9
Dependent Claim
12 words
The composition of claim 6 wherein R¹, R² and R³ are methyl.
Claim 10
Dependent Claim
13 words
The composition of claim 1 wherein said photosensitive compound comprises a quinone diazide.
Claim 11
Dependent Claim
12 words
The composition of claim 1 wherein said photosensitive compound comprises a bisazide.
References Cited (Backward Citations)
No citation records indexed.
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