Patent US5062508A successfully refreshed from Google Patents.
US5062508A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cvd coating process for producing coatings and apparatus for carrying out the process
Assignee: Schott AG
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Filing: 1989-12-07
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Granted: 1991-11-05
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Expires: 2009-12-07
Abstract
Abstract A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.
Inventors
- 👤 Ulrich Ackermann
- 👤 Ralf T. Kersten
- 👤 Heinz-Werner Etzkorn
- 👤 Volker Paquet
- 👤 Uwe Rutze
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:49
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45502; C23C16/45504; C03; C03C; C03C17/00; C03C17/001; C23C16/458; C23C16/4582; C23C16/4583; C23C16/48; C23C16/50; C23C16/511; Y; Y02; Y02T; Y02T50/00; Y02T50/60
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
98 words
An apparatus for a chemical vapor deposition process comprising: a reaction chamber in which a substrate is coated; a tubular prechamber containing tubular shield means disposed therein; means for generating electromagnetic radiation in said prechamber, said prechamber having an opening which communicates with the interior of said reaction chamber; means for supplying reaction gas to said reaction chamber; vacuum means for reducing the pressure in the reaction chamber and for removing consumed reaction gases; and means for supplying at least one component of the reaction gas to the reaction chamber adjacent said opening other than from the prechamber.
Claim 2
Independent Claim
98 words
An apparatus for a chemical vapor deposition process comprising: a reaction chamber in which a substrate is coated; a tubular prechamber containing tubular shield means disposed therein; means for generating electromagnetic radiation in said prechamber, said prechamber having an opening which communicates with the interior of said reaction chamber; means for supplying reaction gas to said reaction chamber; vacuum means for reducing the pressure in the reaction chamber and for removing consumed reaction gases; and means for supplying at least one component of the reaction gas to the reaction chamber adjacent said opening other than from the prechamber.
Claim 3
Dependent Claim
21 words
An apparatus according to claim 1, wherein said prechamber is elongated and has a slot-shaped opening communicating with the reaction chamber.
Claim 4
Dependent Claim
18 words
An apparatus according to claim 1, wherein said shield is positioned in said prechamber above said opening therein.
Claim 5
Dependent Claim
20 words
An apparatus according to claim 1, further comprising means to displace a substrate in said reaction chamber below said opening.
Claim 6
Dependent Claim
17 words
An apparatus according to claim 1, further comprising means to rotate the substrate in the reaction chamber.
Claim 7
Dependent Claim
25 words
An apparatus according to claim 1, further comprising a dielectric closure positioned above said opening and separating part of the prechamber from said reaction chamber.
Claim 8
Dependent Claim
20 words
An apparatus according to claim 1, further comprising a plurality of prechambers having openings which communicate with the reaction chamber.
Claim 9
Dependent Claim
40 words
An apparatus according to claim 1, wherein a plurality of oppositely disposed lines positioned in the reaction chamber below the opening from the prechamber are adapted to supply at least one component of the reaction gas to a reaction zone.
Claim 10
Dependent Claim
15 words
An apparatus according to claim 1, said tubular prechamber and said tubular shield being coaxial.
Claim 11
Dependent Claim
15 words
An apparatus according to claim 1, said tubular shield having a solid side wall throughout.
Claim 12
Dependent Claim
17 words
An apparatus according to claim 10, said solid side wall being a dielectric substantially non-absorbable to microwaves.
Claim 13
Dependent Claim
15 words
An apparatus according to claim 11, said tubular prechamber and said tubular shield being coaxial.
Claim 14
Dependent Claim
14 words
An apparatus according to claim 1, said shield having a slotted solid side wall.
Claim 15
Dependent Claim
17 words
An apparatus according to claim 13, said solid side wall being a dielectric substantially non-absorbable to microwaves.
Claim 16
Dependent Claim
15 words
An apparatus according to claim 14, said tubular prechamber and said tubular shield being coaxial.
Claim 17
Independent Claim
108 words
An apparatus for a chemical vapor deposition process comprising: a reaction chamber in which a substrate is coated; a prechamber; means for generating electromagnetic radiation in said prechamber, said prechamber having an opening which communicates with the interior of said reaction chamber; a dielectric closure positioned above said opening and separating part of the prechamber from said reaction chamber; means for supplying reaction gas to said reaction chamber; vacuum means for reducing the pressure in the reaction chamber and for removing consumed reaction gases; and means for supplying at least one component of the reaction gas to the reaction chamber adjacent said opening other than from the prechamber.
Claim 18
Independent Claim
108 words
An apparatus for a chemical vapor deposition process comprising: a reaction chamber in which a substrate is coated; a prechamber; means for generating electromagnetic radiation in said prechamber, said prechamber having an opening which communicates with the interior of said reaction chamber; a dielectric closure positioned above said opening and separating part of the prechamber from said reaction chamber; means for supplying reaction gas to said reaction chamber; vacuum means for reducing the pressure in the reaction chamber and for removing consumed reaction gases; and means for supplying at least one component of the reaction gas to the reaction chamber adjacent said opening other than from the prechamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-11-04 | 1995-05-06 | 1995-11-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-11-04 | 1999-05-06 | 1999-11-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-11-04 | 2003-05-06 | 2003-11-05 | $7700.00 | Window Closed / Lapsed |