Patent US5059585A successfully refreshed from Google Patents.
US5059585A
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Method of making a sputtering target for a bismuth based superconductor
Assignee: Mitsubishi Materials Corp
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Filing: 1989-04-21
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Granted: 1991-10-22
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Expires: 2009-04-21
Abstract
Abstract A method for fabricating a low resistivity target for sputtering a bismuth-calcium-strontium-copper oxide superconductor. The method includes the steps of: preparing ingredient powders of a calcium carbonate, a strontium carbonate and a copper oxide; producing a porous bulk body of a complex oxide from the ingredient powders; and impregnating molten bismuth into the porous bulk body of the complex oxide.
Inventors
- 👤 Tadashi Sugihara
- 👤 Takuo Takeshita
- 👤 Yukihiro Ohuchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:19
CPC Classifications
C; C04; C04B; C04B35/00; C04B35/01; C04B35/45; C04B35/4521; C04B41/00; C04B41/45; C04B41/50; C04B41/51; C04B41/515; C04B41/80; C04B41/81; C04B41/85; C04B41/88; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/087; H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; Y; Y10; Y10S; Y10S505/00; Y10S505/725
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
141 words
A process of fabricating a target used in a sputtering system, comprising the steps of: a) preparing ingredient powders of a calcium carbonate, a strontium carbonate and a copper oxide; b) producing a porous bulk body of a complex oxide from said ingredient powders, said complex oxide being of the calcium-strontium-copper oxide system, by mixing said ingredient powders to a predetermined proportion to produce a mixture, calcining said mixture to produce said complex oxide, pulverizing said complex oxide to produce a powder of said complex oxide, pressurizing the powder of said complex oxide to produce a bulk body of the powder of said complex oxide, and sintering said bulk body of the powder of said complex oxide to produce a porous bulk body of said complex oxide; and c) impregnating molten bismuth into the porous bulk body of said complex oxide.
Claim 2
Dependent Claim
141 words
A process of fabricating a target used in a sputtering system, comprising the steps of: a) preparing ingredient powders of a calcium carbonate, a strontium carbonate and a copper oxide; b) producing a porous bulk body of a complex oxide from said ingredient powders, said complex oxide being of the calcium-strontium-copper oxide system, by mixing said ingredient powders to a predetermined proportion to produce a mixture, calcining said mixture to produce said complex oxide, pulverizing said complex oxide to produce a powder of said complex oxide, pressurizing the powder of said complex oxide to produce a bulk body of the powder of said complex oxide, and sintering said bulk body of the powder of said complex oxide to produce a porous bulk body of said complex oxide; and c) impregnating molten bismuth into the porous bulk body of said complex oxide.
Claim 3
Dependent Claim
29 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said ingredient powders are about 7 microns in average diameter.
Claim 4
Dependent Claim
33 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said mixture is formed in moisture by using a ball-mill for about three hours.
Claim 5
Dependent Claim
33 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which the calcining is carried out at about 860 degrees to about 1050 degrees centigrade.
Claim 6
Dependent Claim
28 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said pulverizing is carried out by using a ball-mill.
Claim 7
Dependent Claim
38 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which the powder of said complex oxide has an average diameter ranging between about 3.0 microns and about 13 microns.
Claim 8
Dependent Claim
36 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said pressurizing is carried out at about two tons per square centimeter by using a pressing machine.
Claim 9
Dependent Claim
37 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said sintering is carried out at about 800 degrees to about 1040 degrees centigrade for about five hours.
Claim 10
Dependent Claim
48 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which said impregnating step includes placing a bismuth film on said porous bulk body of said complex oxide and heating said bismuth film to or over a melting temperature thereof.
Claim 11
Dependent Claim
27 words
A process of fabricating a target used in a sputtering system as set forth in claim 9, in which said melting temperature is about 272 degrees centigrade.
Claim 12
Dependent Claim
30 words
A process of fabricating a target used in a sputtering system as set forth in claim 1, in which the pressurizing and sintering steps are carried out by hot pressing.
Claim 13
Dependent Claim
34 words
A process of fabricating a target used in a sputtering system as set forth in claim 11, in which said hot pressing is carried out at about 550 degrees to about 980 degrees centigrade.
Claim 14
Dependent Claim
28 words
A process of fabricating a target used in a sputtering system as set forth in claim 11, in which said hot pressing is carried out in a vacuum.
Claim 15
Dependent Claim
27 words
A process of fabricating a target used in a sputtering system as set forth in claim 11, in which said hot pressing is carried out in argon.
Claim 16
Dependent Claim
48 words
A process of fabricating a target used in a sputtering system as set forth in claim 11, in which said impregnating step includes placing a bismuth film on said porous bulk body of said complex oxide and heating said bismuth film to or over a melting temperature thereof.
References Cited (Backward Citations)
US4920094A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-10-21 | 1995-04-22 | 1995-10-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-10-21 | 1999-04-22 | 1999-10-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-10-21 | 2003-04-22 | 2003-10-22 | $7700.00 | Window Closed / Lapsed |