US5059550A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming an element isolating portion in a semiconductor device
Assignee: Sharp Corp
•
Filing: 1989-10-24
•
Granted: 1991-10-22
•
Expires: 2009-10-24
Abstract
Abstract A method for manufacturing a semiconductor device comprising: making a trench in a Si semiconductor substrate; forming on the surface of the substrate a thermal oxidation film a Si 3 N 4 film, and a SiO 2 film by a chemical vapor deposition as a three-layered insulating film, in that order; forming a polysilicon layer to fill the trench; removing the polysilicon layer outside the trench; and performing one of the following steps: (A) converting the exposed surface of the polysilicon layer in the trench to a SiO 2 film, and removing the insulating film on the Si semiconductor substrate outside the trench; (B) removing the SiO 2 layer of the insulating film, converting the exposed surface of the polysilicon layer in the trench to a SiO 2 film, removing the Si 3 N 4 layer of the insulating film located above the opening of the trench, depositing a SiO 2 film, and forming a side wall by leaving this SiO 2 film only at the peripheral portion of the SiO 2 film; whereby an element isolating portion is formed in the trench.
Inventors
- 👤 Hidehisa Tateoka
- 👤 Shigeo Onishi
- 👤 Kenichi Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 02:48
CPC Classifications
H; H10; H10W; H10W10/00; H10W10/01; H10W10/041; H10W10/40
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
208 words
A method for manufacturing a semiconductor device comprising the steps of: (i) making a trench in a Si semiconductor substrate; (ii) forming on the surface, including said trench, of said Si semiconductor substrate a thermal oxidation film, a Si 3 N 4 film and a SiO 2 film by a chemical vapor deposition as a three-layered insulating film in that order; (iii) forming a polysilicon layer, with the polysilicon filling said trench having said three-layered insulating film; (iv) removing said polysilicon layer outside said trench; (v) removing said SiO 2 film of said three-layered insulating film located above the exposed surface of said polysilicon layer in said trench; (vi) converting the exposed surface of said polysilicon layer in said trench to a SiO 2 film by a thermal oxidation; (vii) removing said Si 3 N 4 film of said three-layered insulating film located above the opening of said trench; (viii) depositing a SiO 2 film by a chemical vapor deposition on the entire surface of said Si semiconductor substrate including said trench; and (ix) forming a side wall by leaving a SiO 2 film only at the peripheral portion of said SiO 2 formed by said thermal oxidation; whereby an element isolating portion is formed in said trench.
Claim 2
Independent Claim
208 words
A method for manufacturing a semiconductor device comprising the steps of: (i) making a trench in a Si semiconductor substrate; (ii) forming on the surface, including said trench, of said Si semiconductor substrate a thermal oxidation film, a Si 3 N 4 film and a SiO 2 film by a chemical vapor deposition as a three-layered insulating film in that order; (iii) forming a polysilicon layer, with the polysilicon filling said trench having said three-layered insulating film; (iv) removing said polysilicon layer outside said trench; (v) removing said SiO 2 film of said three-layered insulating film located above the exposed surface of said polysilicon layer in said trench; (vi) converting the exposed surface of said polysilicon layer in said trench to a SiO 2 film by a thermal oxidation; (vii) removing said Si 3 N 4 film of said three-layered insulating film located above the opening of said trench; (viii) depositing a SiO 2 film by a chemical vapor deposition on the entire surface of said Si semiconductor substrate including said trench; and (ix) forming a side wall by leaving a SiO 2 film only at the peripheral portion of said SiO 2 formed by said thermal oxidation; whereby an element isolating portion is formed in said trench.
Claim 3
Dependent Claim
23 words
The method according to claim 1, wherein said thermal oxidation film in said three-layered insulating film is formed by a wet oxidation method.
Claim 4
Dependent Claim
23 words
The method according to claim 1, wherein said thermal oxidation film in said three-layered insulating film is formed by a dry oxidation method.
Claim 5
Dependent Claim
25 words
The method according to claim 1, wherein said Si 3 N 4 film in said three-layered insulating film is formed by a chemical vapor deposition.
Claim 6
Dependent Claim
46 words
The method according to claim 1, wherein said SiO 2 film on said Si 3 N 4 film in said three-layered insulating film is deposited by a chemical vapor deposition at 700 to 900° C. with a mixed gas of SiH 4 and N 2 O.
Claim 7
Dependent Claim
44 words
The method according to claim 1, wherein said SiO 2 film on said Si 3 N 4 film in said three-layered insulating film is deposited by a chemical vapor deposition at 350 to 450° C. with a mixed gas of tetra ethoxy-silane and ozone.
Claim 8
Dependent Claim
23 words
The method according to claim 1, wherein said polysilicon layer is buried in said trench by a low vapor pressure chemical vapor deposition.
Claim 9
Dependent Claim
18 words
The method according to claim 1, wherein said polysilicon layer outside said trench is removed by isotropic etching.
Claim 10
Dependent Claim
30 words
The method according to claim 1, wherein said polysilicon layer in said trench has its exposed surface oxidized with heat by a wet thermal oxidation at 950 to 1100° C.
Claim 11
Dependent Claim
62 words
The method according to claim 1, wherein said SiO 2 film formed by oxidizing with heat the exposed surface of said polysilicon layer in said trench has at its peripheral portion a side wall formed of said deposited SiO 2 film by a chemical vapor deposition at 700 to 900° C. with a mixed gas of SiH 4 and N 2 O.
Claim 12
Dependent Claim
60 words
The method according to claim 1, wherein said SiO 2 film formed by oxidizing with that the exposed surface of said polysilicon layer in said trench has at its peripheral portion a side wall formed of said deposited SiO 2 film by a chemical vapor deposition at 350 to 450° C. with a mixed gas of tetra ethoxy-silane and ozone.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-10-21 | 1995-04-22 | 1995-10-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-10-21 | 1999-04-22 | 1999-10-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-10-21 | 2003-04-22 | 2003-10-22 | $7700.00 | Window Closed / Lapsed |