US5053314A
Expired / Lapsed
US
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Positively photosensitive polyimide composition
Assignee: Nitto Denko Corp
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Filing: 1990-01-09
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Granted: 1991-10-01
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Expires: 2010-01-09
Abstract
Abstract A positively photosensitive polyimide composition is disclosed, which composition comprises polyimide having repeating unit represented by formula (I): ##STR1## wherein Ar 1 represents a tetravalent aromatic hydrocarbon group; Ar 2 represents a divalent aromatic hydrocarbon group having an acyloxy group at the ortho-position and/or the meta-position of the aromatic ring; Ar 3 represents a divalent aromatic hydrocarbon group; and the subunit having an amount ratio of m in the repeating unit is present in an amount of at least 20% by weight based on the polyimide. The composition exhibits high photosensitivity in reproduction of a fine pattern and excellent dimensional stability.
Inventors
- 👤 Tsuguo Yamaoka
- 👤 Amane Mochizuki
- 👤 Kazumasa Igarashi
- 👤 Toshihiko Omote
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 20:58
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
118 words
A positively photosensitive polyimide composition comprising polyimide having a repeating unit represented by formula (I): ##STR8## wherein Ar 1 represents a tetravalent aromatic hydrocarbon group; Ar 2 represents a divalent aromatic hydrocarbon group having at least one acyloxy or silyloxy group at the ortho-position and/or the meta-position of the aromatic ring of said aromatic hydrocarbon group; Ar 3 represents a divalent aromatic hydrocarbon group; and the subunit having an amount ratio of m in said repeating unit is present in an amount of at least 20% by weight based on the polyimide, wherein said composition further comprises a photodecomposable proton generator in an amount of from 1% to 50% by weight based on the amount of said polyimide.
Claim 2
Dependent Claim
118 words
A positively photosensitive polyimide composition comprising polyimide having a repeating unit represented by formula (I): ##STR8## wherein Ar 1 represents a tetravalent aromatic hydrocarbon group; Ar 2 represents a divalent aromatic hydrocarbon group having at least one acyloxy or silyloxy group at the ortho-position and/or the meta-position of the aromatic ring of said aromatic hydrocarbon group; Ar 3 represents a divalent aromatic hydrocarbon group; and the subunit having an amount ratio of m in said repeating unit is present in an amount of at least 20% by weight based on the polyimide, wherein said composition further comprises a photodecomposable proton generator in an amount of from 1% to 50% by weight based on the amount of said polyimide.
Claim 3
Dependent Claim
152 words
A positively photosensitive polyimide composition as claimed in claim 1, wherein Ar 2 represents --Ph(OR 1 )--Ph(OR 2 )-- or --Ph(OR 1 )--C(CF 3 ) 2 --Ph(OR 2 )--, wherein R 1 and R 2 each represents a hydrogen atom, an acyl group of formula R 3 CO-- or a group of formula R 4 Si--, wherein R 3 represents CH 3 --, CH 3 C(CH 3 ) 2 --, CH 3 C(CH 3 ) 2 --O--, CH 3 CH(CH 3 )-- [CH 3 CH(CH 3 ) 2 --] or CF 3 C(CF 3 ) 2 -- and [R 4 ] R 4 Si-- represents (CH 3 ) 3 SI-- or (CH 3 ) 2 (C 2 H 5 )Si-- [(CH 3 ) 3 -- or (CH 3 ) 2 (C 2 H 5 )--], provided that at least one of R 1 and R 2 represents said acyl or silyl group.
Claim 4
Dependent Claim
21 words
A positively photosensitive polyimide composition as claimed in claim 2, wherein Ar 2 represents a tert-butoxy group or a trimethylsilyl group.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-09-30 | 1995-04-01 | 1995-10-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-09-30 | 1999-04-01 | 1999-10-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-09-30 | 2003-04-01 | 2003-10-01 | $7700.00 | Window Closed / Lapsed |