Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
161 words
A master slice integrated circuit of the gate array type implemented in a logic semiconductor chip comprising: at least one stripe shaped functional gate region (21) of a determined height (H), said gate region having a top and a bottom, including a plurality of core cells (CELL1, CELL2, . . . ) arranged adjacent one another on a repetitive basis in a row direction, characterized in that, each core cell (e.g. CELL1) includes four devices of different size arranged in a column direction from said top to said bottom; a first small NFET (N1.1) having a continuous striped shaped source/drain diffusion region of a first width (WN1); a second large NFET (N2.1) having a continuous striped shaped source/drain diffusion region of a second width (WN2); a first large PFET (P2.1) having a continuous striped shaped source/drain diffusion region of a third width; and, a second small PFET (P1.1) having a continuous striped shaped source/drain diffusion region of a fourth width (WP1).
Claim 2
Dependent Claim
161 words
A master slice integrated circuit of the gate array type implemented in a logic semiconductor chip comprising: at least one stripe shaped functional gate region (21) of a determined height (H), said gate region having a top and a bottom, including a plurality of core cells (CELL1, CELL2, . . . ) arranged adjacent one another on a repetitive basis in a row direction, characterized in that, each core cell (e.g. CELL1) includes four devices of different size arranged in a column direction from said top to said bottom; a first small NFET (N1.1) having a continuous striped shaped source/drain diffusion region of a first width (WN1); a second large NFET (N2.1) having a continuous striped shaped source/drain diffusion region of a second width (WN2); a first large PFET (P2.1) having a continuous striped shaped source/drain diffusion region of a third width; and, a second small PFET (P1.1) having a continuous striped shaped source/drain diffusion region of a fourth width (WP1).
Claim 3
Dependent Claim
42 words
The circuit according to claim 1 wherein said first and second PFETs (P2.1, P1.1) have a common gate electrode to form a single device (P.1) and the said first and second NFETs (N1.1, N2.1), have separated gate electrodes to form individual devices.
Claim 4
Dependent Claim
135 words
A master slice integrated circuit of the gate array type implemented in a logic semiconductor chip comprising: at least one stripe shaped functional gate region (21) of a determined height (H), having a plurality of core cells (CELL1, CELL2, . . . ) arranged adjacent one another on a repetitive basis in a row direction, characterized in that, each core cell (e.g. CELL1) comprises four devices of different size arranged in a column direction; a first small NFET (N1.1) having a first width (WN1); a second large NFET (N2.1) having a second width (WN2); a first large PFET (P2.1) having a third width (WP2); and, a second small PFET (P1.1) having a fourth width (WP1), wherein the width relation WP2/WN2/WP1/WN1 of said devices in at least one core cell is on the order of 7/3.5/1.5/1.
Claim 5
Dependent Claim
135 words
A master slice integrated circuit of the gate array type implemented in a logic semiconductor chip comprising: at least one stripe shaped functional gate region (21) of a determined height (H), having a plurality of core cells (CELL1, CELL2, . . . ) arranged adjacent one another on a repetitive basis in a row direction, characterized in that, each core cell (e.g. CELL1) comprises four devices of different size arranged in a column direction; a first small NFET (N1.1) having a first width (WN1); a second large NFET (N2.1) having a second width (WN2); a first large PFET (P2.1) having a third width (WP2); and, a second small PFET (P1.1) having a fourth width (WP1), wherein the width relation WP2/WN2/WP1/WN1 of said devices in at least one core cell is on the order of 7/3.5/1.5/1.