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US5036646A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of packaging an integrated circuit in an inert gas

Assignee: MITUSI TOATSU CHEMICALS INCORPORATED A CORP OF JAPAN
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Filing: 1989-05-10
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Granted: 1991-08-06
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Expires: 2009-05-10
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Abstract

Abstract The present invention relates to a container for an integrated circuit wafer comprising a tray-shaped member having a recess and a complimentary sheet member sized to attach to and cover said recess, at least one of said members being made from a material selected from the group consisting of a single layer of a high nitrile resin, and a laminated layer of a high nitrile resin, a polyvinylidene chloride resin, an ethylene vinyl alcohol copolymer or a polyvinyl alcohol resin, and a method for storing the wafer.

Inventors

  • 👤 Masayuki Makihara
  • 👤 Toshirou Ryuno
  • 👤 Mitsunobu Fujita
  • 👤 Osamu Narimatsu
  • 👤 Toshiyuki Konishi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 17:26
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/10; H10P72/19; H10P72/1911

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 162 words
A method for storing an integrated circuit wafer comprising engaging a tray-shaped member and a complimentary sheet member to form a closed container comprising: (a) providing a tray-shaped member having a recess for holding said wafer; and (b) providing a complimentary sheet member proportionately sized to attach to and cover said recess; at least one of said tray-shaped member and said complimentary sheet member being made from a material selected from the group consisting of a single layer of at least one high-nitrile resin and a laminated layer of at least one thermoplastic resin and at least one gas barrier resin; and the surface of the container that may contact the integrated circuit wafer has an ASTM-D-2240 resin hardness of at least about 70; placing the integrated circuit wafer in the container, adding an inert gas to the container and storing the integrated circuit wafer in the container in the presence of the inert gas which has been added to the container.
Claim 2
Independent Claim 162 words
A method for storing an integrated circuit wafer comprising engaging a tray-shaped member and a complimentary sheet member to form a closed container comprising: (a) providing a tray-shaped member having a recess for holding said wafer; and (b) providing a complimentary sheet member proportionately sized to attach to and cover said recess; at least one of said tray-shaped member and said complimentary sheet member being made from a material selected from the group consisting of a single layer of at least one high-nitrile resin and a laminated layer of at least one thermoplastic resin and at least one gas barrier resin; and the surface of the container that may contact the integrated circuit wafer has an ASTM-D-2240 resin hardness of at least about 70; placing the integrated circuit wafer in the container, adding an inert gas to the container and storing the integrated circuit wafer in the container in the presence of the inert gas which has been added to the container.
Claim 3
Dependent Claim 21 words
The method of claim 1 wherein said high-nitrile resin has an ASTM D14340-66 oxygen permeability of 20 cc/m 2 .atm.24 hr.
Claim 4
Dependent Claim 34 words
The method of claim 1 wherein said gas barrier resin is selected from the group consisting of a high-nitrile resin, a polyvinylidene chloride resin, an ethylene vinyl alcohol copolymer and a polyvinyl alcohol resin.
Claim 5
Dependent Claim 16 words
The method of claim 1 wherein said high-nitrile resin is a copolymer containing unsaturated nitrile monomers.
Claim 6
Dependent Claim 18 words
The method of claim 4 wherein said copolymer contains at least about 50% by weight unsaturated nitrile monomers.
Claim 7
Dependent Claim 16 words
The method of claim 4 wherein said copolymer contains at least about 50% by weight acrylonitrile.
Claim 8
Dependent Claim 40 words
The method of claim 1 wherein said high-nitrile resin is a copolymer of at least one unsaturated nitrile monomer and a monomer selected from the group consisting of styrene, butadiene, isoprene, methyl acrylate, ethyl acrylate, methyl methacrylate and ethyl methacrylate.

References Cited (Backward Citations)

US3783089A Cited
US3756399A Cited
US3910410A Cited
USD248215S Cited
US4063349A Cited
US4409252A Cited
US4693056A Cited
US4867336A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-08-05 1995-02-04 1995-08-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-08-05 1999-02-04 1999-08-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-08-05 2003-02-04 2003-08-06 $7700.00 Window Closed / Lapsed

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