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US5036522A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor laser with localization of current

Assignee: Thomson Hybrides
•
Filing: 1990-05-24
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Granted: 1991-07-30
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Expires: 2010-05-24
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Abstract

Abstract The disclosure concerns semiconductor lasers in which the current has to be localized, preferably in the emissive strip. In a laser having at least one emissive strip and a contact for current injection, the current is localized on the strip by means of an overdoped well that goes through the confinement layer with doping gradient. This confinement layer is doped to a level of 10 18 at.cm -3 in the vicinity of the strip and to a level of 2.10 17 at.cm -3 in the vicinity of the injection contact. The disclosed device can be applied to telecommunications and data processing by optical fibers.

Inventors

  • 👤 Christian Tanguy
  • 👤 Guy Mesquida
  • 👤 Gerard-Maurice Marquebielle

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 04:59
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/30; H01S5/305; H01S5/20; H01S5/22; H01S5/223; H01S5/2232; H01S5/2054; H01S5/2059; H01S5/227; H01S5/2275

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 74 words
In a semiconductor laser comprising at least one emissive strip sandwiched between two confinement layers, and at least one current injection metallization, wherein the first confinement layer above the emissive strip and below the current injection metallization has a gradient of doping that decreases towards the metallization, and wherein a diffusion of zinc through said first confinement layer creates a well providing a preferred localization of current through the emissive strip of the laser.
Claim 2
Dependent Claim 74 words
In a semiconductor laser comprising at least one emissive strip sandwiched between two confinement layers, and at least one current injection metallization, wherein the first confinement layer above the emissive strip and below the current injection metallization has a gradient of doping that decreases towards the metallization, and wherein a diffusion of zinc through said first confinement layer creates a well providing a preferred localization of current through the emissive strip of the laser.
Claim 3
Dependent Claim 44 words
In a semiconductor laser according to claim 1, wherein the doping of said first confinement layer decreases from 10 18 at.cm -3 in the region close to the emissive strip to 2.10 17 at.cm -3 in the region close to the current injection metallization.
Claim 4
Dependent Claim 28 words
A laser semiconductor according to claim 1, wherein said well that goes through said first confinement layer is doped to the level of 10 18 at.cm -3 .
Claim 5
Dependent Claim 43 words
A semiconductor laser according to claim 1, wherein said well diffused in said first confinement layer is in contact with the overdoped region of said first confinement layer, thereby setting up an electrical continuity between the current injection metallization and the emissive strip.

References Cited (Backward Citations)

FR2225855A1 Cited
JPS5896791A Cited
JPS61220392A Cited
EP0273730A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-29 1995-01-28 1995-07-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-29 1999-01-28 1999-07-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-29 2003-01-28 2003-07-30 $7700.00 Window Closed / Lapsed

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