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US5032491A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming a fine pattern

Assignee: Toshiba Corp
•
Filing: 1988-08-22
•
Granted: 1991-07-16
•
Expires: 2008-08-22
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Abstract

Abstract A photoresist is coated on a substrate to form a planar surface, thus to form a recessed portions corresponding to a mask of a pattern to be formed in the photoresist layer having planar surface. SiO 2 etc. are deposited into the recessed portions to prepare a mask, thus to form a fine pattern by anisotropic etching. As a result, by films remaining below the recessed portions formed in the photoresist layer having planar surface, a fine pattern is formed.

Inventors

  • 👤 Katsuya Okumura
  • 👤 Tohru Watanabe

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 07:23
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 86 words
A method of forming a fine pattern, comprising the steps of: coating a photoresist on a surface on which a pattern is to be formed; forming a plurality of recessed portions defining a predetermined fine pattern at the top surface of said photoresist; depositing a material having an etch rate different from that of said photoresist into said recessed portions, said material being deposited by a liquid phase deposition method; and removing said photoresist with said material deposited within said recessed portions being as a mask.
Claim 2
Independent Claim 86 words
A method of forming a fine pattern, comprising the steps of: coating a photoresist on a surface on which a pattern is to be formed; forming a plurality of recessed portions defining a predetermined fine pattern at the top surface of said photoresist; depositing a material having an etch rate different from that of said photoresist into said recessed portions, said material being deposited by a liquid phase deposition method; and removing said photoresist with said material deposited within said recessed portions being as a mask.
Claim 3
Dependent Claim 46 words
A method of forming a fine pattern as claimed in claim 1, wherein said coating step comprises sufficiently thickly coating said photoresist so that the surface of said photoresist becomes planar even if said surface on which a pattern is to be formed has an offset.
Claim 4
Dependent Claim 45 words
A method of forming a fine pattern as claimed in claim 1, wherein said depositing step comprises depositing said material on the entire surface of said photoresist, thereafter to apply etch back to said material, thus allowing said material to remain within said recessed portions.
Claim 5
Dependent Claim 44 words
A method of forming a fine pattern as claimed in claim 3, wherein a second photoresist is formed on said deposited material, thereafter to apply etch back to said second photoresist and said material, thus allowing said material to remain within said recessed portions.
Claim 6
Dependent Claim 35 words
A method as claimed in claim 1, wherein said material is deposited at the top surface of said photoresist by immersing said surface into an immersion liquid of an acid saturated with SiO 2 .
Claim 7
Dependent Claim 34 words
A method as claimed in claim 1, wherein said material is deposited at the top surface of said photoresist by immersing said surface into an immersion liquid of an acid saturated with a metal.

References Cited (Backward Citations)

JPS58132927A Cited
JPS5976428A Cited
JPS59163829A Cited
EP0150597A1 Cited
EP0151948A2 Cited
US4599137A Cited
US4634645A Cited
JPS6154629A Cited
US4707218A Cited
EP0265638A2 Cited
US4732658A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-15 1995-01-14 1995-07-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-15 1999-01-14 1999-07-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-15 2003-01-14 2003-07-16 $7700.00 Window Closed / Lapsed

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