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US5027997A Expired / Lapsed US ⏱️ 0.0 years remaining

Silicon chip metallization system

Assignee: Raytheon Co
•
Filing: 1990-04-05
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Granted: 1991-07-02
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Expires: 2010-04-05
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Abstract

Abstract An improved silicon chip metallization system for use in attaching silicon chips to substrates. The improvement comprises providing a layer of titanium between the silicon chip backside and the layers of chrome and gold which are conventionally used as the backside metallization. The layer of titanium adjacent to the silicon chip backside reduces silicon dioxide formation during chip attachment procedures carried out in non-vacuum environments.

Inventors

  • 👤 Joseph J. Bendik
  • 👤 Stuart C. Billette

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 12:17
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W72/00; H10W72/071; H10W72/072; H10W72/07231; H10W72/07236; H10W72/50; H10W72/59

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 95 words
In a metallization system for attaching the backside of a silicon chip to a substrate, wherein said metallization system includes a layer of chrome located on the silicon chip backside and a layer of gold located on the layer of chrome, the improvement comprising a layer of titanium having a thickness of about 1000 angstroms and being located between the layer of chrome and the silicon chip backside wherein said layer of titanium limit the formation of silicon dioxide on said silicon chip to thereby provide improved attachment of said silicon chip to said substrate.
Claim 2
Dependent Claim 95 words
In a metallization system for attaching the backside of a silicon chip to a substrate, wherein said metallization system includes a layer of chrome located on the silicon chip backside and a layer of gold located on the layer of chrome, the improvement comprising a layer of titanium having a thickness of about 1000 angstroms and being located between the layer of chrome and the silicon chip backside wherein said layer of titanium limit the formation of silicon dioxide on said silicon chip to thereby provide improved attachment of said silicon chip to said substrate.
Claim 3
Dependent Claim 18 words
An improved metallization system according to claim 1 wherein the layer of chrome is about 300 angstroms thick.
Claim 4
Dependent Claim 18 words
An improved metallization system according to claim 1 wherein the layer of gold is about 4000 angstroms thick.
Claim 5
Dependent Claim 18 words
An improved metallization system according to claim 2 wherein the layer of gold is about 4000 angstroms thick.
Claim 6
Dependent Claim 98 words
In a method for attaching the backside of a silicon chip to a substrate wherein, prior to attachment, the silicon chip backside is coated with a layer of chrome onto which is coated a layer of gold, the improvement comprising the step of coating the silicon chip backside with a layer of titanium having a thickness of about 1000 angstroms, onto which is coated the layers of chrome and gold, respectively, wherein said layer of titanium limits the formation of silicon dioxide on said silicon chip to thereby improve said attachment of said silicon chip to said substrate.
Claim 7
Dependent Claim 98 words
In a method for attaching the backside of a silicon chip to a substrate wherein, prior to attachment, the silicon chip backside is coated with a layer of chrome onto which is coated a layer of gold, the improvement comprising the step of coating the silicon chip backside with a layer of titanium having a thickness of about 1000 angstroms, onto which is coated the layers of chrome and gold, respectively, wherein said layer of titanium limits the formation of silicon dioxide on said silicon chip to thereby improve said attachment of said silicon chip to said substrate.
Claim 8
Dependent Claim 23 words
An improved method according to claim 5 wherein the layer of chrome coated onto the layer of titanium is about 300 angstroms thick.
Claim 9
Dependent Claim 23 words
An improved method according to claim 5 wherein the layer of gold coated onto the layer of chrome is about 4000 angstroms thick.
Claim 10
Dependent Claim 23 words
An improved method according to claim 6 wherein the layer of gold coated onto the layer of chrome is about 4000 angstroms thick.
Claim 11
Dependent Claim 20 words
An improved method according to claim 5 including the further step of attaching said silicon chip backside to said substrate.

References Cited (Backward Citations)

US3651562A Cited
US4023725A Cited
WO1982002457A1 Cited
US4513905A Cited
US4772935A Cited
EP0279588A2 Cited
US4884123A Cited
JPS63302538A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-01 1994-12-31 1995-07-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-01 1998-12-31 1999-07-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-01 2002-12-31 2003-07-02 $7700.00 Window Closed / Lapsed

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