US5023679A
Expired / Lapsed
US
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Semiconductor device
Assignee: Toshiba Corp
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Filing: 1989-06-28
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Granted: 1991-06-11
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Expires: 2009-06-28
Abstract
Abstract A semiconductor device comprises a MOSFET of LDD structure, in which the gate electrode structure comprises an oxide film interposed between a poly-Si layer and a refractory metal layer or a metal silicide. The oxide film prevents the metal or metal silicide from being diffused into the gate oxide film during the heating step included in the process of manufacturing the semiconductor device. Also, a side wall spacer is formed of poly-Si to achieve an electrical connection between the poly-Si layer and the layer of the metal having a high melting point or of the metal silicide so as to constitute a part of the gate electrode.
Inventors
- 👤 Hideki Shibata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:32
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/60; H10D64/66; H10D64/671; H10D64/661; H10D64/662; H10D64/664; H10D64/675
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
156 words
A semiconductor device, comprising: a semiconductor substrate of a first conductivity type; a source/drain diffusion layer of a second conductivity type in the surface region of the semiconductor substrate, said source/drain diffusion layer including a first diffusion layer of a high impurity concentration and a second diffusion layer of a low impurity concentration; a first insulation film formed on the semiconductor substrate; a gate electrode formed on the first insulating film, said gate electrode including; a first conductor layer having a thickness of about 500Å or less formed on the first insulation film, a second insulation film formed on the first conductor layer, and a second conductor layer formed on the second insulation film, the first and second conductor layers and the insulation film defining a sidewall surface, a sidewall spacer including a third conductor layer formed on the sidewall surface for maintaining an electrical connection between the first conductor layer and the second conductor layer.
Claim 2
Dependent Claim
156 words
A semiconductor device, comprising: a semiconductor substrate of a first conductivity type; a source/drain diffusion layer of a second conductivity type in the surface region of the semiconductor substrate, said source/drain diffusion layer including a first diffusion layer of a high impurity concentration and a second diffusion layer of a low impurity concentration; a first insulation film formed on the semiconductor substrate; a gate electrode formed on the first insulating film, said gate electrode including; a first conductor layer having a thickness of about 500Å or less formed on the first insulation film, a second insulation film formed on the first conductor layer, and a second conductor layer formed on the second insulation film, the first and second conductor layers and the insulation film defining a sidewall surface, a sidewall spacer including a third conductor layer formed on the sidewall surface for maintaining an electrical connection between the first conductor layer and the second conductor layer.
Claim 3
Dependent Claim
28 words
The semiconductor device according to claim 1, wherein the second conductor layer is formed of a material selected from the group consisting of refractory metals and metal silicides.
Claim 4
Dependent Claim
161 words
A semiconductor device, comprising: a semiconductor substrate of a first conductivity type; a source/drain diffusion layer of a second conductivity type formed in the surface region of the semiconductor substrate, said source/drain diffusion layer including a first diffusion layer of a high impurity concentration and a second diffusion layer of a low impurity concentration; a first insulation film formed on the semiconductor substrate; a gate electrode formed on the first insulation film, said gate electrode including; a first conductor layer having a thickness of about 500Å or less formed on the first insulation film, a second insulation film formed on said first conductor layer, a second conductor layer formed on said second insulation film, the first and second conductor layer defining a sidewall surface, a sidewall spacer, including a polysilicon film doped with an impurity, formed on the sidewall surface, and a bottom surface of said sidewall spacer partially overlying the second diffusion layer with the first insulation film interposed therebetween.
Claim 5
Dependent Claim
161 words
A semiconductor device, comprising: a semiconductor substrate of a first conductivity type; a source/drain diffusion layer of a second conductivity type formed in the surface region of the semiconductor substrate, said source/drain diffusion layer including a first diffusion layer of a high impurity concentration and a second diffusion layer of a low impurity concentration; a first insulation film formed on the semiconductor substrate; a gate electrode formed on the first insulation film, said gate electrode including; a first conductor layer having a thickness of about 500Å or less formed on the first insulation film, a second insulation film formed on said first conductor layer, a second conductor layer formed on said second insulation film, the first and second conductor layer defining a sidewall surface, a sidewall spacer, including a polysilicon film doped with an impurity, formed on the sidewall surface, and a bottom surface of said sidewall spacer partially overlying the second diffusion layer with the first insulation film interposed therebetween.
Claim 6
Dependent Claim
28 words
The semiconductor device according to claim 3, wherein the second conductor layer is formed of a material selected from the group consisting of refractory metals and metal silicides.
References Cited (Backward Citations)
US4700215A
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US4807013A
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JPS61134072A
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JPS62293772A
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JPS63168050A
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JPS63217664A
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JPS63227059A
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