Process for pulse electroplating electroactive polymers and articles derived therefrom

Claim 2

A process for forming a composite comprising an electroactive polymer substrate comprising electroactive nuclei and a plurality of metal films, said composite having improved adhesion between the substrate and first metal film upon exposure to a temperature of 85° C. and a relative humidity of 85%, said process comprising the steps of: (a) providing an electroactive polymer substrate bearing on at least one surface a conductive layer of a first metal; (b) electroplating one or more metals selected from a first family of metals that are reduced at potentials more positive than the reduction potential of the electroactive polymer substrate; (c) pulse electroplating one or more metals selected from a second family of metals that are reduced at potentials more negative than the reduction potential of the electroactive nuclei in a plating solution having charge compensating counter cations wherein the charge compensating counter cations are incapable of sustaining the necessary flux of electrons through the metallized surface to reduce the electroactive nuclei in the polymer substrate, said plating solution having a concentration of alkali metal ions of less than 4000 ppm and a concentration of arsenic ions of less than 10 ppm.

Claim 3

The process of claim 1 wherein the first family of metals are selected from the group consisting of copper and tin.

Claim 4

The process of claim 1 wherein the second family of metals are selected from the group consisting of gold, platinum, palladium, and nickel.

Claim 5

The process of claim 1 wherein the electroactive nuclei of the polymer substrate are pyromellitimide.

Claim 6

The process of claim 1 wherein the electroactive nuclei are reduced at a potential of -200 millivolts versus a silver/silver chloride reference electrode.

Claim 7

The process of claim 1 wherein the charge compensating counter cation is an ammonium ion.

Claim 8

The process of claim 1 wherein the charge compensating counter cation is a tetra-alkyl ammonium ion selected from the group consisting of tetraethyl ammonium, tetrapropyl ammonium, tetrabutyl ammonium, and tetrapentyl ammonium ions.

Claim 9

The process of claim 1 wherein the the first metal layer comprises a metal which is selected from the group consisting of copper and tin.

Claim 10

The process of claim 1 wherein the first metal layer is deposited by vacuum sputtering.

Claim 11

The process of claim 1 wherein the first metal layer is deposited by electroless plating.

Claim 12

A process for making a micro interconnect article for the tape automated bonding system, said article comprising a polyimide substrate comprising electroactive nuclei and a plurality of metal films, said interconnect article having improved adhesion between the substrate and first metal film upon exposure to a temperature of 85° C. and a relative humidity of 85%, said process comprising the steps of: (a) providing a polyimide substrate having two major surfaces; (b) sputtering thereon a thin film of a chromium oxide on the first major surface of said substrate; (c) sputtering upon the surface of the said chromium oxide a thin layer of copper metal; (d) electroplating a thin layer of copper metal upon the surface of the sputtered copper layer to form a copper base layer on the first major substrate surface; (e) etching said copper layer with acid to roughen the copper surface; (f) laminating to both major substrate surfaces a photoresistive film; (g) imagewise exposing said photoresistive films on both major substrate surfaces to respective imagewise sources of actinic radiation; (h) developing said photoresistive films to remove the photoresistive film in those areas which are to be subsequently electroplated with copper or chemically milled; (i) etching the exposed copper base layer on the first major substrate surface to remove residual organic materials; (j) electroplating additional copper in the exposed areas of the copper base layer on the first major substrate surface, said patterned copper defining electrically conductive areas on the first major substrate surface; (k) chemically milling the patterned areas on the second major substrate surface to remove the polyimide; (l) stripping the remaining photoresist from both major substrate surfaces; (m) etching exposed copper surfaces on the first major substrate surface to remove residual organic materials; exposing areas of chromium oxide (n) etching exposed areas of chromium oxide to remove it from the first major substrate surface in said exposed areas; (o) pulse electroplating gold on exposed copper surfaces at a potential more negative than the reduction potential of the electroactive pyromellitimide nuclei of the polyimide substrate in a solution contains compensating counterions wherein the charge compensating counter cations are incapable of sustaining the necessary charge of electrons through the metallized surface to reduce the electroactive nuclei in the polymer substrate, said plating solution having a concentration of alkali metal ions of less than 4000 ppm and a concentration of arsenic ions of less than 10 ppm, said pulse electroplating process having a duty cycle in the range of 5% to 50%.

Claim 13

A process for making a micro interconnect article for the tape automated bonding system, said article comprising a polyimide substrate comprising electroactive nuclei and a plurality of metal films, said interconnect article having improved adhesion between the substrate and first metal film upon exposure to a temperature of 85° C. and a relative humidity of 85%, said process comprising the steps of: (a) providing a polyimide substrate having two major surfaces; (b) sputtering thereon a thin film of a chromium oxide on the first major surface of said substrate; (c) sputtering upon the surface of the said chromium oxide a thin layer of copper metal; (d) electroplating a thin layer of copper metal upon the surface of the sputtered copper layer to form a copper base layer on the first major substrate surface; (e) etching said copper layer with acid to roughen the copper surface; (f) laminating to both major substrate surfaces a photoresistive film; (g) imagewise exposing said photoresistive films on both major substrate surfaces to respective imagewise sources of actinic radiation; (h) developing said photoresistive films to remove the photoresistive film in those areas which are to be subsequently electroplated with copper or chemically milled; (i) etching the exposed copper base layer on the first major substrate surface to remove residual organic materials; (j) electroplating additional copper in the exposed areas of the copper base layer on the first major substrate surface, said patterned copper defining electrically conductive areas on the first major substrate surface; (k) chemically milling the patterned areas on the second major substrate surface to remove the polyimide; (l) stripping the remaining photoresist from both major substrate surfaces; (m) etching exposed copper surfaces on the first major substrate surface to remove residual organic materials; exposing areas of chromium oxide (n) etching exposed areas of chromium oxide to remove it from the first major substrate surface in said exposed areas; (o) pulse electroplating gold on exposed copper surfaces at a potential more negative than the reduction potential of the electroactive pyromellitimide nuclei of the polyimide substrate in a solution contains compensating counterions wherein the charge compensating counter cations are incapable of sustaining the necessary charge of electrons through the metallized surface to reduce the electroactive nuclei in the polymer substrate, said plating solution having a concentration of alkali metal ions of less than 4000 ppm and a concentration of arsenic ions of less than 10 ppm, said pulse electroplating process having a duty cycle in the range of 5% to 50%.

Claim 14

The process of claim 11 wherein said imagewise exposing of said photoresistive film is effected by (a) placing a mask in contact with photoresistive film on the first major substrate surface said mask having areas defined thereon comprising the patterns for electrically conductive circuitry; (b) placing a mask in contact with photoresistive film on the second major substrate surface, said mask having areas defined thereon corresponding to areas of the substrate to be dissolved during chemical milling.

Claim 15

The process of claim 11 wherein said chemical milling is performed in a milling solution comprising concentrated aqueous potassium hydroxide.

Claim 16

The process of claim 12 wherein said chemical milling is performed in a milling solution comprising concentrated aqueous potassium hydroxide.

Claim 17

An article comprising an arsenic free and alkali metal free electroplated composite produced by the process of claim 1.

Claim 18

The article of claim 15 wherein one or more of the electroplated metal films are patterned.

Claim 19

The article of claim 16 wherein the patterned composite forms a printed circuit board.

Claim 20

The article of claim 16 wherein the patterned composite forms a gold plated connector tape useful in the thermocompressive bonding of integrated circuit elements using the Tape Automated Bonding process.