Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
81 words
A method for bonding a semiconductor chip to a substrate, comprising: providing a semiconductor chip; providing a substrate; separating said chip and said substrate by a gap; introducing a metal-bearing gas in said gap; providing a thermal energy source having a focused energy beam; directing said beam into said gap to thermally decompose said gas by chemical vapor reaction to deposit and grow metal to provide a metallic molecular bond interface filling said gap and bonding said chip to said substrate.
Claim 2
Independent Claim
81 words
A method for bonding a semiconductor chip to a substrate, comprising: providing a semiconductor chip; providing a substrate; separating said chip and said substrate by a gap; introducing a metal-bearing gas in said gap; providing a thermal energy source having a focused energy beam; directing said beam into said gap to thermally decompose said gas by chemical vapor reaction to deposit and grow metal to provide a metallic molecular bond interface filling said gap and bonding said chip to said substrate.
Claim 3
Dependent Claim
36 words
The invention according to claim 1 comprising conducting said method substantially at room temperature except at the localized interface impinged by said beam which is locally heated thereby to a temperature less than about 200° C.
Claim 4
Dependent Claim
14 words
The invention according to claim 1 wherein said gap is 5 to 100 microns.
Claim 5
Dependent Claim
35 words
The invention according to claim 1 comprising providing a scanning said source, and scanning said focused beam to provide a wide area molecular bond interface bonding said chip to said substrate over a wide area.
Claim 6
Dependent Claim
71 words
The invention according to claim 1 wherein said focused beam has a wavelength, and wherein one of said chip and said substrate has a passband passing said wavelength such that said one of said chip and said substrate is transparent to said beam, and comprising directing said beam through said one of said chip and said substrate and into said gap and against the other of said chip and said substrate.
Claim 7
Dependent Claim
21 words
The invention according to claim 5 comprising directing said beam substantially perpendicularly against said other of said chip and said substrate.
Claim 8
Dependent Claim
30 words
The invention according to claim 5 wherein said substrate is transparent to said beam, and comprising directing said beam through said substrate and into said gap and against said chip.
Claim 9
Dependent Claim
24 words
The invention according to claim 1 wherein said metal is selected from the group consisting of W, Ni, Pd, Ag, Cu, Au, and Co.
Claim 10
Dependent Claim
30 words
The invention according to claim 1 wherein said source is selected from the group consisting of a laser, an x-ray source, an ion beam source, and an electron beam source.
Claim 11
Independent Claim
109 words
A method for bonding a semiconductor chip to a substrate, comprising: providing a semiconductor chip; providing a substrate; separating said chip and said substrate by a gap, at least one of said chip and said substrate having a silicon surface facing the other of said chip and said substrate across said gap; introducing WF 6 gas in said gap; providing a thermal energy source having a focused energy beam; directing said beam into said gap to thermally initiate by localized heating the chemical vapor reaction 2WF.sub.6 +3Si+heat→2W+3SiF.sub.4 to deposit and grow tungsten to provide a tungsten molecular bond interface filling said gap and bonding said chip to said substrate.
Claim 12
Independent Claim
109 words
A method for bonding a semiconductor chip to a substrate, comprising: providing a semiconductor chip; providing a substrate; separating said chip and said substrate by a gap, at least one of said chip and said substrate having a silicon surface facing the other of said chip and said substrate across said gap; introducing WF 6 gas in said gap; providing a thermal energy source having a focused energy beam; directing said beam into said gap to thermally initiate by localized heating the chemical vapor reaction 2WF.sub.6 +3Si+heat→2W+3SiF.sub.4 to deposit and grow tungsten to provide a tungsten molecular bond interface filling said gap and bonding said chip to said substrate.