Process for fabricating III-V devices using a composite dielectric layer

Claim 2

A process for fabricating enhancement and depletion mode devices on III-V semiconductor substrates including: (a) forming a composite dielectric layer on a major surface of said substrate, said composite dielectric layer comprising a first layer of silicon nitride formed on said substrate and a second layer of silicon dioxide formed on said first layer of silicon nitride; (b) patterning and etching said dielectric layer to provide openings exposing portions of said substrate surface; (c) forming channel regions in said openings; (d) forming schottky gate metal contacts to said channel regions and simultaneously forming extensions thereto, said extensions supported above said semiconductor substrate by said composite dielectric layer; (e) forming source and drain regions in said openings, with said channel region therebetween; (f) forming ohmic contacts to said source and drain regions; (g) forming interconnections with extensions of said schottky gate metal contacts, said interconnections supported above said semiconductor substrate by said composite dielectric layer; and (h) aligning subsequent processing steps to said openings in said dielectric layer.

Claim 3

The process of claim 1 wherein said semiconductor substrate comprises gallium arsenide.

Claim 4

The process of claim 1 wherein said first layer of silicon nitride is formed to a thickness of about 100 to 1,000 Å and second layer of silicon dioxide is formed to a thickness of about 1,000 to 7,000 Å.

Claim 5

The process of claim 3 wherein said first layer of silicon nitride is formed to a thickness of about 300 to 500 Å.

Claim 6

The process of claim 3 wherein said layer of silicon dioxide is formed to a thickness of about 3,500 Å.

Claim 7

A process for fabricating III-V semiconductor devices on a III-V semiconductor substrate, including: (a) forming a composite dielectric layer on a major surface of said semiconductor substrate, said composite dielectric layer comprising a first layer of silicon nitride formed on said surface and a second layer of silicon dioxide formed on said first layer of silicon nitride; (b) etching portions of said composite dielectric layer to expose of said semiconductor surface and to define active device areas; (c) ion-implanting a first group of channel regions within some of said active device areas to form depletion mode device channels; (d) ion-implanting a second group of channel regions within other of said active device areas to form enhancement mode device channels; (e) forming and patterning a Schottky gate metal to define source, channel, and drain portions within each said active device area, each said Schottky gate metal contacting said channel portions and provided with an extension supported above said semiconductor substrate by said composite dielectric layer; (f) ion-implanting said source and drain portions within each said active device to form source and drain regions in said semiconductor surface; (g) forming ohmic contacts to said source and drain regions; (h) forming interconnections with extensions of said Schottky gate metal contacts, said interconnections supported above said semiconductor substrate by said composite dielectric layer; and (i) aligning subsequent processing steps to said openings in said dielectric layer.

Claim 8

A process for fabricating III-V semiconductor devices on a III-V semiconductor substrate, including: (a) forming a composite dielectric layer on a major surface of said semiconductor substrate, said composite dielectric layer comprising a first layer of silicon nitride formed on said surface and a second layer of silicon dioxide formed on said first layer of silicon nitride; (b) etching portions of said composite dielectric layer to expose of said semiconductor surface and to define active device areas; (c) ion-implanting a first group of channel regions within some of said active device areas to form depletion mode device channels; (d) ion-implanting a second group of channel regions within other of said active device areas to form enhancement mode device channels; (e) forming and patterning a Schottky gate metal to define source, channel, and drain portions within each said active device area, each said Schottky gate metal contacting said channel portions and provided with an extension supported above said semiconductor substrate by said composite dielectric layer; (f) ion-implanting said source and drain portions within each said active device to form source and drain regions in said semiconductor surface; (g) forming ohmic contacts to said source and drain regions; (h) forming interconnections with extensions of said Schottky gate metal contacts, said interconnections supported above said semiconductor substrate by said composite dielectric layer; and (i) aligning subsequent processing steps to said openings in said dielectric layer.

Claim 9

The process of claim 6 wherein said semiconductor comprises gallium arsenide.

Claim 10

The process of claim 6 wherein said first layer of silicon nitride is formed to a thickness of about 100 to 1,000 Å and said second layer of silicon dioxide is formed to a thickness of about 1,000 to 7,000 Å.

Claim 11

The process of claim 8 wherein said first layer of silicon nitride is formed to a thickness of about 300 to 500 Å and wherein said layer of silicon dioxide is formed to a thickness of about 3,500 Å.

Claim 12

The process of claim 6 wherein said portions of said composite dieletric layer are etched by a process which comprises: (a) partially etching portions of said second layer of silicon dioxide by a dry etch; (b) completely etching said portions of said second layer of silicon dioxide to expose underlying portions of said first layer of silicon nitride; and (c) completely etching said underlying portions of said first layer of silicon nitride by a wet etch which is selective to silicon nitride to expose underlying portions of said semiconductor substrate.

Claim 13

The process of claim 6 wherein said first ionic species comprises silicon or selenium, implanted to a doping level of about 10 11 to 10 15 at an energy of about 25 to 200 keV, used to form depletion mode devices.

Claim 14

The process of claim 6 wherein said second ionic species comprises silicon or selenium, implanted to a doping level of about 10 11 to 10 15 at an energy of about 25 to 200 keV and about half that of the doping level of said first ionic species, used to form enhancement mode devices.