Patent US4995940A successfully refreshed from Google Patents.
US4995940A
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Method for forming a gas removing device for an ink jet system
Assignee: Fujifilm Dimatix Inc
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Filing: 1990-05-01
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Granted: 1991-02-26
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Expires: 2010-05-01
Abstract
Abstract In the particular embodiment of a device for removing dissolved gas from ink described in the specification, an elongated ink path leading to an ink jet head is formed between two permeable fluorine-containing membranes. The membranes are backed by air plenums which contain support members to hold the membranes in position. Reduced pressure is applied to the plenums to extract dissolved gas from the ink in the ink path without accumulating scum on the membrane surfaces. Increased pressure can also be applied to the plenums to eject ink from the ink jet head for purging. Within the ink jet head, ink is circulated convectively from the orifice to the deaerating path even when the jet is not jetting ink.
Inventors
- 👤 Nathan P. Hine
- 👤 Robert L. Wells, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 20:34
CPC Classifications
G; G01; G01D; G01D15/00; G01D15/16
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
43 words
A method for preparing a dissolved-gas removing device for an ink jet system comprising etching a surface of a fluorine-containing membrane, and bonding the etched surface to a support member to provide a wall of an ink-containing element in an ink jet system.
Claim 2
Independent Claim
43 words
A method for preparing a dissolved-gas removing device for an ink jet system comprising etching a surface of a fluorine-containing membrane, and bonding the etched surface to a support member to provide a wall of an ink-containing element in an ink jet system.
Claim 3
Dependent Claim
26 words
A method according to claim 1 including forming a plenum to apply reduced gas pressure to the opposite side of the wall of the ink-containing element.
Claim 4
Dependent Claim
13 words
A method according to claim 1 wherein the etching process employs a plasma.
Claim 5
Dependent Claim
14 words
A method according to claim 1 wherein the fluorine-containing membrane comprises a fluorosilicone material.
Claim 6
Dependent Claim
13 words
A method according to claim 4 wherein the etching process employs a plasma.
Claim 7
Dependent Claim
14 words
A method according to claim 1 wherein the fluorine-containing membrane comprises a Teflon material.
Claim 8
Dependent Claim
13 words
A method according to claim 6 wherein the etching process employs a plasma.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-02-25 | 1994-08-27 | 1995-02-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-02-25 | 1998-08-27 | 1999-02-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-02-25 | 2002-08-27 | 2003-02-26 | $7700.00 | Window Closed / Lapsed |