US4987462A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Power MISFET
Assignee: Texas Instruments Inc
•
Filing: 1987-01-06
•
Granted: 1991-01-22
•
Expires: 2007-01-06
Abstract
Abstract Preferred embodiments include a microwave power MISFET (30) with a thin GaAS channel (54) bounded by an undoped AlxGa1-xAs gate insulator (44) and a doped AlyGa1-yAs barrier (40). Under forward bias the channel (54) forms a quantum well which accumulates electrons and thereby increase maximum current and power handling without degrading breakdown voltage of the heterostructure MISFET An additional active layer (36) can be included on the other side of the barrier (40) to further increase power handling. Other embodiments include use of a strained layer InzGa1-zAs channel.
Inventors
- 👤 Bumman Kim
- 👤 Hua Q. Tserng
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 05:51
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/40; H10D30/47; H10D30/471; H10D30/473; H10D30/4732
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
138 words
A field effect transistor, comprising: (a) a channel made of a first semiconductor material, said channel undoped or lightly doped; (b) a gate insulator made of a second semiconductor material said insulator on said channel, said second material of wider bandgap than said first material and lattice matched or strained layer matched to said first material, and said insulator undoped or lightly doped; (c) a gate on said insulator, said gate separated from said channel by said insulator; (d) a barrier made of a third semiconductor material, said barrier on said channel and separated from said insulator by said channel, said third material of wider bandgap than said first material and lattice matched or strained layer matched to said first material, and said barrier at least partially heavily doped; and (e) source and drain regions contacting said channel.
Claim 2
Dependent Claim
138 words
A field effect transistor, comprising: (a) a channel made of a first semiconductor material, said channel undoped or lightly doped; (b) a gate insulator made of a second semiconductor material said insulator on said channel, said second material of wider bandgap than said first material and lattice matched or strained layer matched to said first material, and said insulator undoped or lightly doped; (c) a gate on said insulator, said gate separated from said channel by said insulator; (d) a barrier made of a third semiconductor material, said barrier on said channel and separated from said insulator by said channel, said third material of wider bandgap than said first material and lattice matched or strained layer matched to said first material, and said barrier at least partially heavily doped; and (e) source and drain regions contacting said channel.
Claim 3
Dependent Claim
37 words
The transistor of claim 1, wherein: (a) said first material is GaAs; (b) said second material is Al x Ga 1-x As; and (c) said third material is Al y Ga 1-y As and doped n type.
Claim 4
Dependent Claim
41 words
The transistor of claim 1, wherein: (a) said first material is In z Ga 1-z As: (b) said second material is Al x Ga 1-x As; and (c) said third material is Al y Ga 1-y As and doped n type.
Claim 5
Dependent Claim
58 words
The transistor of claim 1, further comprising: (a) an active layer made of a fourth semiconductor material, said active layer separated from said channel by said barrier, said fourth material of narower bandgap than said third material and lattice matched or strained layer matched to said third material, and said active layer contacting said source and drain regions.
Claim 6
Dependent Claim
16 words
The transistor of claim 4, wherein: (a) said active layer and said barrier form a heterojunction.
Claim 7
Dependent Claim
74 words
The transistor of claim 4, wherein: (a) said active layer and said barrier are separated by a graded layer of semiconductor material, said graded layer of composition substantially equal to that of said active layer at the interface of said graded layer and said active layer, of composition substantially equal to that of said barrier at the interface of said graded layer and said barrier, and of composition continuously varying in between the interfaces.
Claim 8
Dependent Claim
49 words
The transistor of claim 5, wherein: (a) said first material is In z Ga 1-z As; (b) said second material is Al x Ga 1-x As; (c) said third material is Al y Ga 1-y As and doped n type: and (d) said fourth material is GaAs and undoped.
Claim 9
Dependent Claim
80 words
The transistor of claim 6, wherein: (a) said first material is In z Ga 1-z As; (b) said second material is Al x Ga 1-x As; (c) said third material is Al y Ga 1-y As and doped n type; (d) said fourth material is GaAs and doped n type; and (e) said graded layer is made of Al w Ga 1-w As with w varying linearly with distance from w=0 at the active layer to w=y at the barrier.
Claim 10
Dependent Claim
40 words
The transistor of claim 1, wherein: (a) said channel is made of In x Ga 1-x As; (b) said insulator is made of Al y Ga 1-y As; and (c) said barrier is made of Al z Ga 1-z As.
References Cited (Backward Citations)
US4194935A
Cited
JPS5931072A
Cited
JPS59222966A
Cited
JPS60144979A
Cited
US4558337A
Cited
US4652896A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-21 | 1994-07-23 | 1995-01-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-21 | 1998-07-23 | 1999-01-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-21 | 2002-07-23 | 2003-01-22 | $7700.00 | Window Closed / Lapsed |