Patent US2420710A successfully refreshed from Google Patents.
Patent US3535996A successfully refreshed from Google Patents.
Patent US4987311A successfully refreshed from Google Patents.
US4987311A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine
Assignee: Applied Materials Inc
•
Filing: 1989-08-08
•
Granted: 1991-01-22
•
Expires: 2009-08-08
Abstract
Abstract Disclosed is a biassing scheme for a beam position location apparatus (50) which comprises electron detector diodes (52) in an electron beam lithography machine (10) such that the detector diodes (52) deposit fewer secondary electrons (62) on a substrate (16) being processed by the electron beam (22) and thus reduce or eliminate any charge buildup on said substrate which deflect the electron beam (22) causing pattern distortion.
Inventors
- 👤 William J. DeVore
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 10:45
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/04; H01J37/06; H01J37/30; H01J37/317; H01J37/3174; B; B82; B82Y; B82Y10/00; B82Y40/00; H01J37/244; H01J2237/00; H01J2237/244; H01J2237/2441; H01J2237/24475; H01J2237/2449; H01J2237/245; H01J2237/24507; H01J2237/24571; H01J2237/24578
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
103 words
In an electron beam lithography machine with a beam column and having a controlled electron beam capable of writing a pattern on a substrate located beneath the beam column, the improvement in a beam position locating apparatus comprising, electron detector means which locates the beam position by responding to backscattered electrons generated by the electron bombardment on said substrate by said electron beam, and means to reduce or eliminate secondary electrons emitted from said detector in response to said bombardment from reaching said substrate thereby reducing or eliminating a charge buildup on said substrate which would deflect said beam and cause pattern distortion.
Claim 2
Dependent Claim
103 words
In an electron beam lithography machine with a beam column and having a controlled electron beam capable of writing a pattern on a substrate located beneath the beam column, the improvement in a beam position locating apparatus comprising, electron detector means which locates the beam position by responding to backscattered electrons generated by the electron bombardment on said substrate by said electron beam, and means to reduce or eliminate secondary electrons emitted from said detector in response to said bombardment from reaching said substrate thereby reducing or eliminating a charge buildup on said substrate which would deflect said beam and cause pattern distortion.
Claim 3
Dependent Claim
35 words
The machine as claimed in claim 1 wherein the means to reduce or eliminate said secondary electrons from reaching said substrate comprises a biasing means on said electron detector means to attract said secondary electrons.
Claim 4
Dependent Claim
29 words
The machine as claimed in claim 2 wherein said biasing means comprises the application of a voltage on said detector means which is positive with respect to said substrate.
Claim 5
Dependent Claim
43 words
The machine as claimed in claim 1 wherein said electron detector means comprises diode means and wherein the means to reduce or eliminate said secondary electrons from reaching said substrate comprises a biasing means on said diode means to attract said secondary electrons.
Claim 6
Dependent Claim
29 words
The machine as claimed in claim 4 wherein said biasing means comprises the application of a voltage on said diode means which is positive with respect to said substrate.
References Cited (Backward Citations)
US4680468A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-21 | 1994-07-23 | 1995-01-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-21 | 1998-07-23 | 1999-01-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-21 | 2002-07-23 | 2003-01-22 | $7700.00 | Window Closed / Lapsed |