US4987005A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Chemical vapor processing method for deposition or etching on a plurality of substrates
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1989-08-21
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Granted: 1991-01-22
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Expires: 2009-08-21
Abstract
Abstract An improved method for manufacturing uniform films or etching uniformly on a plurality of substrates is shown. The substrates are vertically placed in a reaction chamber so as to be treated at once. A chemical vapor reaction takes place by virtue of a high frequency electric power which is modulated in its amplitude. By this modulation, the deposition or etching can be carried out over the surface of a susbtrate.
Inventors
- 👤 Kunio Suzuki
- 👤 Takeshi Fukada
- 👤 Mikio Kinka
- 👤 Masayoshi Abe
- 👤 Katsuhiko Shibata
- 👤 Masato Susukida
- 👤 Noriya Ishida
- 👤 Akemi Satake
- 👤 Yasuyuki Arai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 05:49
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/54
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
131 words
A method of coating an object with a film comprising: disposing said object in a reaction chamber; inputting a reactive gas into said reaction chamber; and applying an electric power to said reactive gas in order to initiate a reaction of said reactive gas and form a film by deposition of the product of said reaction, wherein the magnitude of said electric power is amplitude modulated between different non-zero levels to provide a substantially uniform thickness of said film on said substrate, the speed of deposition being lower at a center portion than that at a peripheral portion of said substrate at one non-zero power level and the speed of deposition being higher at said center portion than that at said peripheral portion of said substrate at another non-zero power level.
Claim 2
Independent Claim
131 words
A method of coating an object with a film comprising: disposing said object in a reaction chamber; inputting a reactive gas into said reaction chamber; and applying an electric power to said reactive gas in order to initiate a reaction of said reactive gas and form a film by deposition of the product of said reaction, wherein the magnitude of said electric power is amplitude modulated between different non-zero levels to provide a substantially uniform thickness of said film on said substrate, the speed of deposition being lower at a center portion than that at a peripheral portion of said substrate at one non-zero power level and the speed of deposition being higher at said center portion than that at said peripheral portion of said substrate at another non-zero power level.
Claim 3
Dependent Claim
14 words
The method of claim 1 wherein said electric power is carried by plasma discharge.
Claim 4
Dependent Claim
13 words
The method of claim 1 wherein said electric power is a RF power.
Claim 5
Dependent Claim
16 words
The method of claim 3 wherein said modulation has one cycle per 1 to 5 seconds.
Claim 6
Dependent Claim
15 words
The method of claim 4 wherein the degree of said modulation is less than 50%.
Claim 7
Dependent Claim
12 words
The method of claim 2 wherein said reactive gas includes silane gas.
Claim 8
Dependent Claim
12 words
The method of claim 3 wherein said reactive gas includes a hydrocarbon.
Claim 9
Dependent Claim
20 words
The method of claim 7 wherein the magnitude of said RF power is changed between 50 W and 1 KW.
Claim 10
Dependent Claim
53 words
Method of claim 1, wherein the power applying step is performed by a pair of electrodes and said disposing step comprises placing of an object in the form of a planar substrate within the reaction chamber with a surface thereof to be etched being situated perpendicular to and between said pair of electrodes.
Claim 11
Dependent Claim
14 words
The method of claim 1, wherein said electric power is carried by plasma discharge.
Claim 12
Dependent Claim
15 words
A method of claim 1 wherein said electric power is applied at only one frequency.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-21 | 1994-07-23 | 1995-01-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-21 | 1998-07-23 | 1999-01-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-21 | 2002-07-23 | 2003-01-22 | $7700.00 | Window Closed / Lapsed |