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US4979467A
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Thin film formation apparatus
Assignee: Fujifilm Business Innovation Corp
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Filing: 1989-05-05
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Granted: 1990-12-25
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Expires: 2009-05-05
Abstract
Abstract An apparatus for forming thin films on substrates includes a reactor vessel, and discharge and grounded electrodes opposably disposed within the reactor vessel. The discharge electrode has walls surrounding a hollow space having an outlet that is open to the grounded electrode. A starting gas is introduced into the reactor vessel through that hollow space. A radio frequency voltage is applied between the discharge and grounded electrodes to produce a discharge plasma zone therebetween. The potential of the discharge electrode is biased toward the negative side so that the discharge electrode behaves as a cathode to which a direct current voltage is applied, whereby a high density plasma is obtained in the hollow space of the discharge electrode.
Inventors
- 👤 Hideki Kamaji
- 👤 Shin Araki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 12:24
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5096; H01J37/32009; H01J37/32082; H01J37/32532; H01J37/32541; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332; H01J2237/3321
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
176 words
An apparatus for forming thin films on substrates, comprising: a reactor vessel; first and second electrodes opposably disposed within said reactor vessel, said first electrode including walls defining a hollow space which has an outlet that is open to said second electrode; introduction means for introducing a starting gas into said reactor vessel through the hollow space of said first electrode; and a circuit means including a radio frequency electric source for applying a radio frequency voltage between said first and second electrodes to produce a discharge plasma zone therebetween for dissociating the starting gas, the walls defining said hollow space being arranged in such a manner that a discharge plasma is generated within the hollow space, said circuit means being arranged so that the first electrode is a discharge electrode and said second electrode is grounded, said circuit means further including biasing means for biasing the potential of said first electrode toward the negative side, whereby a high density plasma is produced in said hollow space and dissociation of starting gas introduced therein is facilitated.
Claim 2
Independent Claim
176 words
An apparatus for forming thin films on substrates, comprising: a reactor vessel; first and second electrodes opposably disposed within said reactor vessel, said first electrode including walls defining a hollow space which has an outlet that is open to said second electrode; introduction means for introducing a starting gas into said reactor vessel through the hollow space of said first electrode; and a circuit means including a radio frequency electric source for applying a radio frequency voltage between said first and second electrodes to produce a discharge plasma zone therebetween for dissociating the starting gas, the walls defining said hollow space being arranged in such a manner that a discharge plasma is generated within the hollow space, said circuit means being arranged so that the first electrode is a discharge electrode and said second electrode is grounded, said circuit means further including biasing means for biasing the potential of said first electrode toward the negative side, whereby a high density plasma is produced in said hollow space and dissociation of starting gas introduced therein is facilitated.
Claim 3
Dependent Claim
45 words
An apparatus as set forth in claim 1, wherein said biasing means comprises a blocking capacitor and said first electrode has a discharge area that is smaller than the area of said second electrode that is opposed to the discharge area of said first electrode.
Claim 4
Dependent Claim
18 words
An apparatus as set forth i claim 1, wherein said biasing means comprises a direct current voltage source.
Claim 5
Dependent Claim
50 words
An apparatus as set forth in claim 1, wherein the hollow space of said first electrode is formed such that at least one opening hole is formed in one of the walls defining said hollow space for allowing starting gas ejecting from the introduction means to enter the hollow space.
Claim 6
Dependent Claim
24 words
An apparatus as set forth in claim 4, wherein the walls defining the hollow space include a sleeve element attached to said first electrode.
Claim 7
Dependent Claim
62 words
An apparatus as set forth in claim 1, wherein the walls defining the hollow space include a conductive mesh element attached to said first electrode, said introduction means including a pipe element which surrounds said conductive mesh element, and which has at least one opening hole formed therein for ejecting the starting gas through the mesh element and into the hollow space.
Claim 8
Dependent Claim
63 words
An apparatus as set forth in claim 4, wherein said first electrode has a hollow construction presenting an interior plenum chamber for the starting gas, the hollow space of said first electrode being in the form of a recess groove in said first electrode, said opening hole being formed at the bottom of said groove for intercommunicating the plenum chamber and the groove.
Claim 9
Dependent Claim
113 words
An apparatus as set forth in claim 1, wherein said first electrode comprises at least two electrode elements, each having a sector-shaped hollow construction, said second electrode being formed as a drum-shaped element, and being adapted to be rotated, the sector-shaped electrode being circumferentially and concentrically disposed around said drum-shaped element at regular intervals, each of the sector-shaped electrode elements having said walls defining at least one hollow space formed as a groove recessed in an inner wall of the hollow construction thereof, each sector-shaped element including at least one opening hole formed at the bottom of said groove for allowing starting gas ejected from the introduction means to enter the hollow space.
Claim 10
Dependent Claim
102 words
An apparatus as set forth in claim 1, wherein said first electrode has an annular-shaped hollow construction, said second electrode being formed as a drum-shaped element, and being adapted to be rotated, said second electrode being circumferentially and concentrically disposed with the annular-shaped hollow construction of said first electrode, the hollow space of said first electrode being formed as at least one groove recessed in an inner wall of the hollow construction thereof, said first electrode including at least one opening hole formed at the bottom of said groove allowing starting gas ejected from the introduction means to enter the hollow space.
Claim 11
Dependent Claim
44 words
An apparatus as set forth in claim 4, wherein said first electrode comprises more than one discharging electrode elements, each of said discharge electrode elements having a said hollow space formed therein and at least one said opening hole formed in a wall thereof.
Claim 12
Dependent Claim
47 words
An apparatus as set forth in claim 1, wherein the outlet of the hollow space of said first electrode is restricted by opposed projections formed as part of said first electrode, whereby electrons included in a high density plasma produced in said hollow space are confined therein.
Claim 13
Independent Claim
57 words
An apparatus as set forth in clam 1, wherein said first electrode includes at least one magnet element disposed to surround the outlet of the hollow space, whereby electrons included in a high density plasma produced in said hollow space are confined therein and subjected to a spin motion due to the presence of the magnet element.
Claim 14
Independent Claim
57 words
An apparatus as set forth in clam 1, wherein said first electrode includes at least one magnet element disposed to surround the outlet of the hollow space, whereby electrons included in a high density plasma produced in said hollow space are confined therein and subjected to a spin motion due to the presence of the magnet element.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-24 | 1994-06-25 | 1994-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-24 | 1998-06-25 | 1998-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-24 | 2002-06-25 | 2002-12-25 | $7700.00 | Window Closed / Lapsed |