US4977104A
Expired / Lapsed
US
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Method for producing a semiconductor device by filling hollows with thermally decomposed doped and undoped polysilicon
Assignee: Panasonic Holdings Corp
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Filing: 1989-03-23
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Granted: 1990-12-11
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Expires: 2009-03-23
Abstract
Abstract A method is provided for producing a semiconductor device characterized by filling hollows having a high aspect ratio with a semiconductor film doped with impurities as dopants and an undoped semiconductor film, given that the doped polycrystalline Si film produced by thermal decomposition of reactive gases mixed with impurity gases and the undoped polycrystalline Si film produced by thermal decomposition of reactive gases containing no impurity gas have different step coverage characteristics from each other. The method allows uniform distribution of dopants as well as improvement of processing throughput by forming sequentially the two types of semiconductor films in one reaction chamber.
Inventors
- 👤 Kazuyuki Sawada
- 👤 Hisashi Ogawa
- 👤 Kohsaku Yano
- 👤 Tsutomu Fujita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 17:16
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/01; H10D1/045; H10D1/047
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
129 words
A method for producing a semiconductor device comprising: a first step of depositing a first semiconductor film doped with impurities as dopants by thermally decomposing reactive gases incorporated with at least one gas for dopants selected from a group consisting of PH 3 , B 2 H 6 and AsH 3 on a semiconductor substrate having hollows in a reaction chamber; a second step of depositing a second undoped semiconductor film on said first semiconductor film to fill said hollows by thermal decomposition of said reactive gases not containing said gas for dopants without removing said semiconductor substrate out of said reaction chamber after said first step of deposition; and a heat-treating step of diffusing dopants from said first semiconductor film to said second semiconductor film in said hollows.
Claim 2
Independent Claim
129 words
A method for producing a semiconductor device comprising: a first step of depositing a first semiconductor film doped with impurities as dopants by thermally decomposing reactive gases incorporated with at least one gas for dopants selected from a group consisting of PH 3 , B 2 H 6 and AsH 3 on a semiconductor substrate having hollows in a reaction chamber; a second step of depositing a second undoped semiconductor film on said first semiconductor film to fill said hollows by thermal decomposition of said reactive gases not containing said gas for dopants without removing said semiconductor substrate out of said reaction chamber after said first step of deposition; and a heat-treating step of diffusing dopants from said first semiconductor film to said second semiconductor film in said hollows.
Claim 3
Dependent Claim
25 words
The method of claim 1 wherein a capacitor insulating film is formed between said substrate and said first semiconductor film to produce a capacitor device.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1993-12-10 | 1994-06-11 | 1994-12-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-10 | 1998-06-11 | 1998-12-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-10 | 2002-06-11 | 2002-12-11 | $7700.00 | Window Closed / Lapsed |