US4975159A
Expired / Lapsed
US
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Aqueous acidic bath for electrochemical deposition of a shiny and tear-free copper coating and method of using same
Assignee: Atotech Deutschland GmbH and Co KG
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Filing: 1989-10-24
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Granted: 1990-12-04
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Expires: 2009-10-24
Abstract
Abstract The aqueous acidic bath for electrochemical deposition of a shiny and tear-free copper coating, especially for reinforcement of conductive pathways of a printed circuit with outstanding breaking elongation, contains at least one copper salt, at least one inorganic acid and at least one alkoxylated lactam as an amide-group-containing compound. The aqueous acidic bath also includes, as necessary, a compound having a chloride ion, a sulfur-containing organic compound with a solubilizing group and another organic compound selected from a group including polyglycols defined in more detail hereinbelow in Table III.
Inventors
- 👤 Wolfgang Dahms
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:31
CPC Classifications
C; C25; C25D; C25D3/00; C25D3/02; C25D3/38; H; H05; H05K; H05K3/00; H05K3/22; H05K3/24; H05K3/244
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
49 words
An aqueous acidic bath for electrochemical deposition of a shiny and tear-free copper coating, especially for reinforcement of conductive pathways of a printed circuit with outstanding breaking elongation, containing at least one copper salt, at least one inorganic acid and at least one alkoxylated lactam as an amide-group-containing compound.
Claim 2
Dependent Claim
49 words
An aqueous acidic bath for electrochemical deposition of a shiny and tear-free copper coating, especially for reinforcement of conductive pathways of a printed circuit with outstanding breaking elongation, containing at least one copper salt, at least one inorganic acid and at least one alkoxylated lactam as an amide-group-containing compound.
Claim 3
Dependent Claim
25 words
An aqueous acid bath according to claim 1, further comprising a compound having a chloride ion and a sulfur-containing organic compound with a solubilizing group.
Claim 4
Dependent Claim
55 words
An aqueous acidic bath according to claim 2, further comprising another organic compound selected from the group consisting of polyvinyl alcohol, carboxymethyl cellulose, polyethylene glycol, polypropylene glycol, stearic acid-polyglycol ester, oleic acid-polyglycol ester, stearyl alcohol-polyglycol ether, nonylphenol-polyglycol ether, octanol polyalkenglycol ether, nonylphenol-polyglycol ether, octanol polyalkenglycol ether, octandiol-bis-(polyalkyleneglycol ether), polyoxypropylene glycol, polyethylene-propylene glycol and beta-naphthol-polyglycol ether.
Claim 5
Dependent Claim
24 words
An aqueous acidic bath according to claim 3, in which said other organic compound is present in a concentration of 0.005 to 20 g/l.
Claim 6
Dependent Claim
24 words
An aqueous acidic bath according to claim 3, in which said other organic compound is present in a concentration of 0.01 to 5 g/l.
Claim 7
Dependent Claim
33 words
A method of reinforcing a conductive pathway of a printed circuit comprising the step of electrochemically depositing a copper coating on said conductive pathway from an aqueous acidic bath according to claim 2.
Claim 8
Dependent Claim
56 words
An aqueous acidic bath according to claim 1, in which said alkoylated lactam has the general formula (I): wherein R is a member selected from the group consisting of methyl and hydrogen, A is a hydrocarbon group, n is a whole number from 2 to 10, and m is another whole number from 1 to 50.
Claim 9
Dependent Claim
15 words
An aqueous acidic bath according to claim 7, wherein n is from 2 to 5.
Claim 10
Dependent Claim
16 words
An aqueous acidic bath according to claim 7, wherein A is a --CH 2 -- group.
Claim 11
Dependent Claim
30 words
An aqueous acidic bath according to claim 1, wherein said alkoxylated lactam is a member selected from the group consisting of ethoxylated beta-propiolactam, hexaethoxylated-gamma-butyrolactam, octaethoxylated-delta-valerolactam, pentapropoxylated-delta- valerolactam, hexaethoxylated-epsilon-caprolactam and dodecaethoxylated-epsilon-caprolactam.
Claim 12
Dependent Claim
23 words
An aqueous acidic bath according to claim 1, wherein said alkoxylated lactam is present in a concentration of from 0.002 to 3 g/l.
Claim 13
Dependent Claim
21 words
An aqueous acidic bath according to claim 11, wherein said concentration of said alkoxylated lactam is from 0.005 to 0.2 g/l.
Claim 14
Dependent Claim
78 words
An aqueous acidic bath according to claim 2, wherein said sulfur-containing organic compound is a member selected from the group consisting of 3-mercaptopropane-l-sulfonic acid, sodium salt; thiophosphoric-0-ethyl -bis-(w-sulfopropyl)-ester, disodium salt; thiophosphoric acid-tris-(w-sulfopropyl)-ester, trisodium salt; thioglycolic acid; ethylenedithiodipropylsulfonic acid, sodium salt; di-n-propyl-thioether-di-w-sulfonic acid, disodium salt; bis(w-sulfopropyl)disulfide, disodium salt; bis(w-sulfohydroxypropyl) disulfide, disodium salt; bis(w-sulfobutyl)disulfide, disodium salt; bis(p-sulfophenyl) disulfide, sodium salt; methyl-(w-sulfopropyl)disulfide, sodium salt; methyl-(w-sulfobutyl)trisulfide, sodium salt; 3-(benzthiazole-2-thio)propyl sulfonic acid, sodium salt; N,N-dimethyl-dithiocarbamic acid-(3-sulfopropyl)-ester, sodium salt; and O-ethyl-dithiocarbonic acid-S-(3-sulfopropyl)-ester, potassium salt.
Claim 15
Dependent Claim
24 words
An aqueous acidic bath according to claim 13, wherein said sulfur-containing organic compound is present in a concentration of from 0.0005 to 0.2 g/l.
Claim 16
Dependent Claim
24 words
An aqueous acidic bath according to claim 14, wherein said sulfur-containing organic compound is present in a concentration of from 0.001 to 0.05 g/l.
Claim 17
Dependent Claim
13 words
An aqueous acidic bath according to claim 1, further comprising a wetting agent.
Claim 18
Dependent Claim
14 words
An aqueous acidic bath according to claim 1, further comprising an additional shininess-building agent.
References Cited (Backward Citations)
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