Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
86 words
A method of forming an electron emission device, the method comprising providing a first electrode structure comprising a first substrate with at least one tapered electrically-conductive body projecting therefrom; providing a second electrode structure comprising a second substrate with at least one tapered electrically-conductive body projecting therefrom; inverting said second electrode structure relative to said first electrode structure; and bonding the two electrode structures together with a space defined between the substrates and with the or each tapered body of each structure projecting into the space.
Claim 2
Independent Claim
86 words
A method of forming an electron emission device, the method comprising providing a first electrode structure comprising a first substrate with at least one tapered electrically-conductive body projecting therefrom; providing a second electrode structure comprising a second substrate with at least one tapered electrically-conductive body projecting therefrom; inverting said second electrode structure relative to said first electrode structure; and bonding the two electrode structures together with a space defined between the substrates and with the or each tapered body of each structure projecting into the space.
Claim 3
Dependent Claim
25 words
A method as claimed in claim 1, wherein each said electrically-conductive body is formed from a layer of electrically-conductive material provided on the respective substrate.
Claim 4
Dependent Claim
50 words
A method as claimed in claim 2, wherein each said electrically-conductive body is formed from said layer of electrically-conductive material by depositing a masking pad on said layer in the required position for the or each electrically-conductive body; and etching the layer to form said tapered body beneath the pad.
Claim 5
Dependent Claim
27 words
A method as claimed in claim 3, wherein the etching of the layer to form the or each electrically-conductive body is effected by a wet etching process.
Claim 6
Dependent Claim
27 words
A method as claimed in claim 3, wherein the etching of the layer to form the or each electrically-conductive body is effected by a dry etching process.
Claim 7
Dependent Claim
33 words
A method as claimed in claim 3, wherein the etching of the layer to form the or each electrically-conductive body is effected by a wet etching process followed by a dry etching process.
Claim 8
Dependent Claim
27 words
A method as claimed in claim 5, wherein the dry etching is effected by plasma etching, reactive ion etching, ion beam milling, or reactive ion beam milling.
Claim 9
Dependent Claim
28 words
A method as claimed in claim 7, wherein the dry etching is effected by a plasma etching process carried out in SF 6 /Cl 2 /O 2 .
Claim 10
Dependent Claim
27 words
A method as claimed in claim 7, wherein the dry etching is effected by a reactive ion etching process carried out in SF 6 /N 2 .
Claim 11
Dependent Claim
21 words
A method as claimed in claim 2, wherein the layer is formed of a semiconductor, a metal or a metal compound.
Claim 12
Dependent Claim
21 words
A method as claimed in claim 10, wherein the layer is formed of niobium, silicon, rhodium, molybdenum, gold, nickel or tungsten.
Claim 13
Dependent Claim
19 words
A method as claimed in claim 11, wherein the layer is formed of single crystal nickel, tungsten or rhodium.
Claim 14
Dependent Claim
38 words
A method as claimed in claim 1, further comprising the step of forming a frame of dielectric material round the periphery of at least one of the electrode structures to act as a spacer between the electrode structures.
Claim 15
Dependent Claim
26 words
A method as claimed in claim 13, wherein the or each frame of dielectric material has a metal layer thereon for use in the bonding step.
Claim 16
Dependent Claim
20 words
A method as claimed in claim 14, wherein the metal layer of the or each frame is formed of aluminium.
Claim 17
Dependent Claim
32 words
A method as claimed in claim 1, wherein the or each tapered body of the first electrode structure is substantially axially aligned with a respective tapered body of the second electrode structure.
Claim 18
Dependent Claim
28 words
A method as claimed in claim 1, wherein the or each tapered body of each electrode structure points towards a substantially planar region of the other electrode structure.
Claim 19
Dependent Claim
16 words
A method as claimed in claim 1, wherein said space defined between the substrates is evacuated.
Claim 20
Dependent Claim
16 words
A method as claimed in claim 1, wherein said space defined between the substrates is gas-filled.