Patent US4962318A successfully refreshed from Google Patents.
US4962318A
Expired / Lapsed
US
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Alignment system for exposure apparatus
Assignee: Nikon Corp
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Filing: 1989-08-17
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Granted: 1990-10-09
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Expires: 2009-08-17
Abstract
Abstract An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer. The apparatus is comprised of first and second detectors and a determination unit. The first detector includes a light-emitting system for generating first light to illuminate first marks on the substrate and provides first position data. The second mark position detector includes a light-emitting system for generating second light having a wider wavelength distribution than that of the first light to illuminate second marks on the substrate and provides second position data. Determination unit (EGA operational unit 502 or the like) is provided for determining the position of the substrate as a whole by using both of the first and second position data.
Inventors
- 👤 Kenji Nishi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 05:24
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7088; G03F9/7049
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
154 words
An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer sensitive to a predetermined wavelength range, comprising: first mark position detection means for illuminating said wafer with single wavelength or quasi monochromatic light as first light, detecting a first mark on said wafer illuminated by said first light and providing first position data concerning the position of said first mark according to the result of said first mark detection; second mark position detection means for illuminating said wafer with light having a wider wavelength distribution than said first light as second light, detecting a second mark on said wafer illuminated by said second light and providing second position data concerning the position of said second mark according to the result of said second mark detection; and position determination means for determining relative positions of said wafer and said mark according to both said first and second position data.
Claim 2
Dependent Claim
154 words
An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer sensitive to a predetermined wavelength range, comprising: first mark position detection means for illuminating said wafer with single wavelength or quasi monochromatic light as first light, detecting a first mark on said wafer illuminated by said first light and providing first position data concerning the position of said first mark according to the result of said first mark detection; second mark position detection means for illuminating said wafer with light having a wider wavelength distribution than said first light as second light, detecting a second mark on said wafer illuminated by said second light and providing second position data concerning the position of said second mark according to the result of said second mark detection; and position determination means for determining relative positions of said wafer and said mark according to both said first and second position data.
Claim 3
Dependent Claim
117 words
The exposure apparatus according to claim 1, wherein said exposure apparatus further comprises an optical projecting system for focusing said mask pattern on said wafer and a stage moved with said wafer supported thereon two-dimensionally along a mask pattern image projection surface of said optical projecting system to successively change in image projection position on said wafer, said first mark position detection means for photoelectrically detecting said first mark provided on each said image projection position on said wafer via said optical projecting system, and said second mark position detection means disposed at a predetermined distance from said optical projecting system for photoelectrically detecting said second mark provided at each said image projection position on said wafer.
Claim 4
Dependent Claim
30 words
The exposure apparatus according to claim 2, wherein said position determination means includes means for statistically determining the position of a map of said image projection positions on said wafer.
Claim 5
Dependent Claim
17 words
The exposure apparatus according to claim 1, wherein said marks are formed in a common mark pattern.
References Cited (Backward Citations)
US4385838A
Cited
US4566795A
Cited
US4402596A
Cited
US4677301A
Cited
US4780617A
Cited
US4655598A
Cited
US4798962A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-10-08 | 1994-04-09 | 1994-10-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-10-08 | 1998-04-09 | 1998-10-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-10-08 | 2002-04-09 | 2002-10-09 | $7700.00 | Window Closed / Lapsed |