US4948461A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry-etching method and plasma
Assignee: Eastman Kodak Co
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Filing: 1989-10-16
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Granted: 1990-08-14
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Expires: 2009-10-16
Abstract
Abstract An etching plasma containing a reactive fluorine-containing gas and atoms or ions of a heavy metal is particularly useful in a method of removing material from a substrate by reactive ion etching.
Inventors
- 👤 Dilip K. Chatterjee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 19:36
CPC Classifications
H; H10; H10P; H10P50/00; C; C03; C03B; C03B11/00; C03B11/06; C03B11/08; C03B11/084; C04; C04B; C04B41/00; C04B41/009; C04B41/53; C04B41/5338; C04B41/5346; C03B2215/00; C03B2215/02; C03B2215/05; C03B2215/07; C04B2111/00; C04B2111/00474; C04B2111/00939
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
47 words
In a method of removing material from a non- metallic substrate by reactive ion etching using an etching plasma containing a reactive fluorine-containing gas, the improvement comprising incorporating into said plasma atoms or ions of a metal having an atomic weight of at least about fifty-eight (58).
Claim 2
Dependent Claim
47 words
In a method of removing material from a non- metallic substrate by reactive ion etching using an etching plasma containing a reactive fluorine-containing gas, the improvement comprising incorporating into said plasma atoms or ions of a metal having an atomic weight of at least about fifty-eight (58).
Claim 3
Dependent Claim
22 words
The method of claim 1 wherein said metal is selected from the group consisting of Ni, Cu, Pd, Ag, Pt and Au.
Claim 4
Dependent Claim
13 words
The method of claim 1 wherein said metal is Cu, Ag or Mo.
Claim 5
Dependent Claim
16 words
The method of claim 1 wherein said etching plasma comprises CF 4 and O 2 .
Claim 6
Dependent Claim
13 words
The method of claim 1 wherein said material being removed is silicon carbide.
Claim 7
Dependent Claim
46 words
In an etching plasma containing a reactive fluorine containing gas adapted for removing material from a non metallic substrate by reactive ion etching, the improvement wherein said plasma comprises atoms or ions of a metal having an atomic weight of at least about fifty eight (58).
Claim 8
Dependent Claim
46 words
In an etching plasma containing a reactive fluorine containing gas adapted for removing material from a non metallic substrate by reactive ion etching, the improvement wherein said plasma comprises atoms or ions of a metal having an atomic weight of at least about fifty eight (58).
Claim 9
Independent Claim
43 words
A method of preparing an aspherized surface from a silicon carbide substrate by etching said substrate with an etching plasma containing a reactive fluorine containing gas and atoms or ions of a metal having an atomic weight of at least about fifty-eight (58).
Claim 10
Independent Claim
43 words
A method of preparing an aspherized surface from a silicon carbide substrate by etching said substrate with an etching plasma containing a reactive fluorine containing gas and atoms or ions of a metal having an atomic weight of at least about fifty-eight (58).
Claim 11
Dependent Claim
14 words
The method of claim 7 wherein said substrate is etched through a rotating mask.
Claim 12
Dependent Claim
14 words
The method of claim 8 wherein said mask is made of Cu or Mo.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-08-13 | 1994-02-12 | 1994-08-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-08-13 | 1998-02-12 | 1998-08-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-08-13 | 2002-02-12 | 2002-08-14 | $7700.00 | Window Closed / Lapsed |