US4943539A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for making a multilayer metallization structure
Assignee: NXP USA Inc
•
Filing: 1989-05-09
•
Granted: 1990-07-24
•
Expires: 2009-05-09
Abstract
Abstract A method for forming a via contact for devices having multilayer metallization is provided wherein a sacrificial layer is formed over a bottom interconnect layer, and an interlayer dielectric is formed on the sacrificial layer. A via is etched in the interlayer dielectric, exposing the sacrificial layer. The sacrificial layer is isotropically etched to expose an area of the interconnect metal that is larger than the area of the via and a via metallization is selectively formed on the interconnect metal by chemical vapor deposition so that the via, including a void created by the isotropic etch of the sacrificial layer, is filled with the via metallization, thereby providing a contact area to the bottom interconnect metal which is larger than the via metallization itself.
Inventors
- 👤 Syd R. Wilson
- 👤 James A. Sellers
- 👤 Robert J. Mattox
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:42
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/031; H10W20/056; H10W20/058; Y; Y10; Y10S; Y10S438/00; Y10S438/97
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
123 words
A method for increasing contact area of a via metallization formed between metal interconnect layers of a multi-layer metallization comprising the steps of: providing a first metal layer; forming a sacrificial layer on the first metal layer, wherein the first metal layer serves as an etch stop for the sacrificial layer; forming an interlayer dielectric covering the sacrificial layer; etching a via in the interlayer dielectric; isotropically etching the sacrificial layer to expose an area of the first metal layer so that the exposed area of the first metal layer is larger than the area of the via; forming the via metallization on the exposed first metal layer filling the via and a void created by the isotropic etching of the sacrificial layer.
Claim 2
Independent Claim
123 words
A method for increasing contact area of a via metallization formed between metal interconnect layers of a multi-layer metallization comprising the steps of: providing a first metal layer; forming a sacrificial layer on the first metal layer, wherein the first metal layer serves as an etch stop for the sacrificial layer; forming an interlayer dielectric covering the sacrificial layer; etching a via in the interlayer dielectric; isotropically etching the sacrificial layer to expose an area of the first metal layer so that the exposed area of the first metal layer is larger than the area of the via; forming the via metallization on the exposed first metal layer filling the via and a void created by the isotropic etching of the sacrificial layer.
Claim 3
Dependent Claim
19 words
The method of claim 1 wherein the first metal layer comprises TiW and the sacrificial layer comprises a metal.
Claim 4
Dependent Claim
18 words
The method of claim 1 wherein the first metal layer comprises TiSi and the sacrificial layer comprises TiN.
Claim 5
Dependent Claim
15 words
The method of claim 1 wherein the via metallization is formed by chemical vapor deposition.
Claim 6
Dependent Claim
15 words
The method of claim 1 wherein the via metallization is formed by electroless metal plating.
Claim 7
Dependent Claim
18 words
The method of claim 4 wherein the via metallization comprises W formed by decomposition of WF 6 gas.
Claim 8
Dependent Claim
11 words
The method of claim 4 wherein the via metallization comprises A1.
Claim 9
Dependent Claim
45 words
The method of claim 1 wherein the step of forming the via metallization further comprises overfilling the via so that a portion of the via metallization extends outside of the via and provides a larger surface area than the cross sectional area of the via.
Claim 10
Dependent Claim
47 words
The method of claim 6 wherein the sacrificial metal layer protects the first metal layer from damage caused by the via etch process and the first metal layer protects an underlying interconnect layer from damage caused by a fluorine by-product of the decomposition of WF 6 gas.
Claim 11
Independent Claim
126 words
A method for forming a via in an interlayer dielectric over an interconnect layer of a multilayer metal system, comprising the steps of: forming a sacrificial layer over a portion of the interconnect layer, wherein the sacrificial layer does not extend beyond the interconnect layer; forming the interlayer dielectric covering the interconnect layer and the sacrificial layer; etching the interlayer dielectric so as to expose a portion of the sacrificial layer and form a top portion of the via; and isotropically etching the sacrificial layer to form a bottom portion of the via, wherein the interlayer dielectric is significantly undercut during the step of isotropic etching the sacrificial layer so that the bottom portion of the via is larger than the top portion of the via.
Claim 12
Independent Claim
126 words
A method for forming a via in an interlayer dielectric over an interconnect layer of a multilayer metal system, comprising the steps of: forming a sacrificial layer over a portion of the interconnect layer, wherein the sacrificial layer does not extend beyond the interconnect layer; forming the interlayer dielectric covering the interconnect layer and the sacrificial layer; etching the interlayer dielectric so as to expose a portion of the sacrificial layer and form a top portion of the via; and isotropically etching the sacrificial layer to form a bottom portion of the via, wherein the interlayer dielectric is significantly undercut during the step of isotropic etching the sacrificial layer so that the bottom portion of the via is larger than the top portion of the via.
References Cited (Backward Citations)
JPS5768035A
Cited
US4634496A
Cited
US4767724A
Cited
US4786962A
Cited
JPS63114236A
Cited
US4826785A
Cited
US4824803A
Cited
US4839311A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-23 | 1994-01-22 | 1994-07-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-23 | 1998-01-22 | 1998-07-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-23 | 2002-01-22 | 2002-07-24 | $7700.00 | Window Closed / Lapsed |