Patent US4941489A successfully refreshed from Google Patents.
US4941489A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Carrier cleaning and drying apparatus
Assignee: Mitsubishi Electric Corp
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Filing: 1989-09-05
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Granted: 1990-07-17
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Expires: 2009-09-05
Abstract
Abstract A carrier cleaning and drying apparatus for cleaning and drying a wafer processing carrier has a cleaning tank for accommodating the carrier and a high-pressure injection nozzle disposed in an upper portion of the cleaning tank and for injecting a pressurized cleaning solution. This high-pressure injection nozzle is moved within a plane and the cleaning solution is injected at high pressure therefrom, thereby removing dust adhering to the inner and outer surfaces of the carrier by means of the force of injection. A supporting and rotating mechanism portion is also provided which, during cleaning of the carrier, swings the carrier at a predetermined angle, and, after cleaning, effects drying by spinning the carrier at high speed.
Inventors
- 👤 Yasuo Kamimura
- 👤 Toshiaki Ohmori
- 👤 Motonori Yanagi
- 👤 Takaaki Fukumoto
- 👤 Masaharu Hama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:13
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; B; B08; B08B; B08B3/00; B08B3/02; B08B3/04; B08B3/10; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
138 words
An apparatus for cleaning and drying a wafer processing carrier comprising: a cleaning tank having at least one side wall and upper and lower portions for accommodating a wafer processing carrier; a high-pressure injection nozzle disposed in the upper portion of said cleaning tank for injecting a cleaning solution toward the wafer processing carrier in said cleaning tank at high pressure; means for supporting the wafer processing carrier in said cleaning tank and for swinging the wafer processing carrier through an arc while the cleaning solution is being injected toward the wafer processing carrier; means for moving said high-pressure injection nozzle within said cleaning tank while the cleaning solution is being injected toward the wafer processing carrier; and a shower nozzle disposed on said side wall of said cleaning tank for spraying the cleaning solution on said carrier.
Claim 2
Independent Claim
138 words
An apparatus for cleaning and drying a wafer processing carrier comprising: a cleaning tank having at least one side wall and upper and lower portions for accommodating a wafer processing carrier; a high-pressure injection nozzle disposed in the upper portion of said cleaning tank for injecting a cleaning solution toward the wafer processing carrier in said cleaning tank at high pressure; means for supporting the wafer processing carrier in said cleaning tank and for swinging the wafer processing carrier through an arc while the cleaning solution is being injected toward the wafer processing carrier; means for moving said high-pressure injection nozzle within said cleaning tank while the cleaning solution is being injected toward the wafer processing carrier; and a shower nozzle disposed on said side wall of said cleaning tank for spraying the cleaning solution on said carrier.
Claim 3
Dependent Claim
45 words
An apparatus according to claim 1 wherein said means for supporting the wafer processing carrier in said cleaning tank includes means for spinning the carrier about an axis at high speed, after injection and spraying of the cleaning solution has ceased, to dry the carrier.
Claim 4
Dependent Claim
33 words
An apparatus according to claim 2 including said shower nozzle for spraying a gas at the carrier, after injection and spraying of the cleaning solution has ceased, to accelerate drying of the carrier.
Claim 5
Dependent Claim
24 words
An apparatus according to claim 2 including a heater mounted on said side wall of said cleaning tank for accelerating drying of the carrier.
Claim 6
Independent Claim
124 words
An apparatus for cleaning and drying a wafer processing carrier comprising: a cleaning tank having at least one side wall and upper and lower portions for accommodating a wafer processing carrier; a high-pressure injection nozzle disposed in the upper portion of said cleaning tank for injecting a cleaning solution toward the wafer processing carrier in said cleaning tank at high pressure; x-y drive means for controllably moving said high-pressure injection nozzle in two dimensions within a plane within said cleaning tank while the cleaning solution is being injected therethrough, thereby to inject the cleaning solution toward all portions of the wafer processing carrier; and a shower nozzle disposed on said side wall of said cleaning tank for spraying the cleaning solution on said carrier.
Claim 7
Independent Claim
124 words
An apparatus for cleaning and drying a wafer processing carrier comprising: a cleaning tank having at least one side wall and upper and lower portions for accommodating a wafer processing carrier; a high-pressure injection nozzle disposed in the upper portion of said cleaning tank for injecting a cleaning solution toward the wafer processing carrier in said cleaning tank at high pressure; x-y drive means for controllably moving said high-pressure injection nozzle in two dimensions within a plane within said cleaning tank while the cleaning solution is being injected therethrough, thereby to inject the cleaning solution toward all portions of the wafer processing carrier; and a shower nozzle disposed on said side wall of said cleaning tank for spraying the cleaning solution on said carrier.
Claim 8
Dependent Claim
40 words
An apparatus according to claim 5 comprising means for supporting the wafer processing carrier in said cleaning tank and for swinging the wafer processing carrier through an arc while the cleaning solution is being injected toward the wafer processing carrier.
Claim 9
Dependent Claim
64 words
An apparatus according to claim 5 comprising means for supporting the wafer processing carrier in said cleaning tank, for swinging the wafer processing carrier through an arc while the cleaning solution is being injected toward the wafer processing carrier, and for spinning the carrier about an axis at high speed, after injection and spraying of the cleaning solution has ceased, to dry the carrier.
Claim 10
Dependent Claim
33 words
An apparatus according to claim 7 including said shower nozzle for spraying a gas at the carrier, after injection and spraying of the cleaning solution has ceased, to accelerate drying of the carrier.
Claim 11
Dependent Claim
24 words
An apparatus according to claim 7 including a heater mounted on said side wall of said cleaning tank for accelerating drying of the carrier.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-16 | 1994-01-15 | 1994-07-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-16 | 1998-01-15 | 1998-07-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-16 | 2002-01-15 | 2002-07-17 | $7700.00 | Window Closed / Lapsed |