Hydrofluoric acid reprocessing for semiconductor standards

Claim 2

A spent hydrofluoric (HF) acid recycling and purification process comprising the steps of: first distilling a spent acid solution comprised of HF acid, water and waste through a first distillation means such that said water is vaporized and then condensing pure water by a condensing means coupled to the output of said first distillation means leaving a concentrated solution of HF acid and waste in said first distilling means; refluxing pure water through said first distillation means; conveying said concentrated solution of HF acid from said first distillation means to a second distillation means operating at a pressure below atmospheric pressure; boiling over a pure HF acid vapor from said second distillation means leaving a concentrated waste in said second distillation means; condensing said pure HF acid vapor into a pure HF acid solution by a second condensing means; collecting said pure HF acid solution in a product collection means; discarding said concentrated waste from said second distillation means after said pure HF acid vapor has boiled over into said second condensing means.

Claim 3

The process as recited in claim 1 wherein said boiling step includes adjusting the pressure of said second distillation means such that the operating temperature of said second distillation means is below 200° F.

Claim 4

The process as recited in claim 2 wherein said first distilling step includes adjusting the pressure of said first distillation means such that the operating temperature of said first distillation means is equal to or below the operating temperature of said second distillation means and wherein said process further comprises the step of diluting said pure HF acid solution.

Claim 5

The process as recited in claim 3 wherein said diluting step includes diluting said pure HF acid solution to a concentration less than 38 weight percent (wt %) HF with 18 megaohm (MΩ) ultra pure water.

Claim 6

The process as recited in claim 4 wherein apparatus for said process is comprised of a plastic wherein said plastic is a fluoropolymer plastic.

Claim 7

A spent hydrofluoric (HF) acid recycling and purification process comprising the steps of: combining a measured amount of makeup HF acid with a spent HF acid solution comprised of HF acid, water and waste to form a combination of HF acid; feeding said combination of HF acid into a first distillation means operating at a pressure below atmospheric pressure and having a column packing; first distilling said combination of HF acid such that essentially pure water is vaporized through said column packing of said first distillation means and then condensed by a condensing means coupled to the output of said first distillation means and said first distilling step leaving a concentrated combination of HF acid in the first distillation means; collecting said essentially pure water in a reflux container and recycling a small amount of said essentially pure water to said first distillation column and discarding the remainder of said essentially pure water; transferring said concentrated combination of HF acid from said first distillation means to a second distillation means operating at a pressure below atmospheric pressure; boiling over HF acid vapor from said second distillation means leaving said waste concentrated in said second distillation means; condensing said HF acid vapor into an acid solution by a second condensing means being coupled to said second distillation means to receive said HF acid vapor; collecting said acid solution in a product collection means; discarding said concentrated waste from said second distillation means after said HF acid has boiled over into said second condensing means; diluting said acid solution to a desired concentration of water/HF acid.

Claim 8

A spent hydrofluoric (HF) acid recycling and purification process comprising the steps of: combining a measured amount of makeup HF acid with a spent HF acid solution comprised of HF acid, water and waste to form a combination of HF acid; feeding said combination of HF acid into a first distillation means operating at a pressure below atmospheric pressure and having a column packing; first distilling said combination of HF acid such that essentially pure water is vaporized through said column packing of said first distillation means and then condensed by a condensing means coupled to the output of said first distillation means and said first distilling step leaving a concentrated combination of HF acid in the first distillation means; collecting said essentially pure water in a reflux container and recycling a small amount of said essentially pure water to said first distillation column and discarding the remainder of said essentially pure water; transferring said concentrated combination of HF acid from said first distillation means to a second distillation means operating at a pressure below atmospheric pressure; boiling over HF acid vapor from said second distillation means leaving said waste concentrated in said second distillation means; condensing said HF acid vapor into an acid solution by a second condensing means being coupled to said second distillation means to receive said HF acid vapor; collecting said acid solution in a product collection means; discarding said concentrated waste from said second distillation means after said HF acid has boiled over into said second condensing means; diluting said acid solution to a desired concentration of water/HF acid.

Claim 9

The process as recited in claim 6 wherein the pressure of said second distillation means is adjusted such that the operating temperature of said second distillation means is below 200° F.

Claim 10

The process as recited in claim 7 wherein the pressure of said first distillation means is adjusted such that the operating temperature of said first distillation means is equal to or below the operating temperature of said second distillation means.

Claim 11

The process as recited in claim 8 wherein said diluting step includes diluting said acid solution to a desired concentration less than 38 weight percent hydrofluoric acid with 18 megaohm (MΩ) ultra pure water.

Claim 12

The process as recited in claim 9 wherein apparatus for said process is comprised of a plastic wherein said plastic is a fluoropolymer plastic.

Claim 13

The process as recited in claim 5 wherein said essentially pure water of said refluxing step is 18 megaohm (MΩ) ultra pure water.

Claim 14

A spent hydrofluoric (HF) acid recycling and purification process for use in semiconductor fabrication comprising the steps of: combining a measured amount of makeup HF with a spent HF solution comprised of HF, water and waste material to form a combined solution concentration of up to 7 weight percent (wt %) of HF (combined solution); feeding said combined solution into a first distillation means operating at a temperature equal to or below the operating temperature of a second distillation means, wherein said first distillation means uses a packed distillation column; first distilling said combined solution such that essentially pure water is vaporized through said packed distillation column of said first distillation means and is then condensed by a condensing means coupled to an output of said first distillation means and such that said first distilling step leaves a concentrated combination of HF and waste material in the first distillation means; collecting said essentially pure water in a reflux container and recycling a small amount of essentially pure water to said first distillation column and discarding the remainder of said essentially pure water; pumping said concentrated combination of HF and waste material from said first distillation means to said second distillation means operating at a temperature below 200° F.; distilling over HF vapor from said second distillation means leaving said waste material concentrated in said second distillation means; condensing said HF vapor into an ultrapure acid solution by a second condensing means coupled to a mist eliminator at an output of said second distillation means to filter said HF vapor; collecting said ultrapure acid solution in a product collection means; discarding said concentrated waste material from said second distillation means after said HF vapor has distilled over into said second condensing means; diluting said ultrapure acid solution with 18 megaohm (MΩ) ultrapure water to a concentration less than 38 wt % HF.

Claim 15

A spent hydrofluoric (HF) acid recycling and purification process for use in semiconductor fabrication comprising the steps of: combining a measured amount of makeup HF with a spent HF solution comprised of HF, water and waste material to form a combined solution concentration of up to 7 weight percent (wt %) of HF (combined solution); feeding said combined solution into a first distillation means operating at a temperature equal to or below the operating temperature of a second distillation means, wherein said first distillation means uses a packed distillation column; first distilling said combined solution such that essentially pure water is vaporized through said packed distillation column of said first distillation means and is then condensed by a condensing means coupled to an output of said first distillation means and such that said first distilling step leaves a concentrated combination of HF and waste material in the first distillation means; collecting said essentially pure water in a reflux container and recycling a small amount of essentially pure water to said first distillation column and discarding the remainder of said essentially pure water; pumping said concentrated combination of HF and waste material from said first distillation means to said second distillation means operating at a temperature below 200° F.; distilling over HF vapor from said second distillation means leaving said waste material concentrated in said second distillation means; condensing said HF vapor into an ultrapure acid solution by a second condensing means coupled to a mist eliminator at an output of said second distillation means to filter said HF vapor; collecting said ultrapure acid solution in a product collection means; discarding said concentrated waste material from said second distillation means after said HF vapor has distilled over into said second condensing means; diluting said ultrapure acid solution with 18 megaohm (MΩ) ultrapure water to a concentration less than 38 wt % HF.

Claim 16

The process as recited in claim 12 wherein apparatus for said process is comprised of a plastic wherein said plastic is a fluoropolymer plastic.