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US4125594A Expired / Lapsed US ⏱️ 0.0 years remaining

Purification of hydrofluoric acid etching solutions with weak anion exchange resins

Assignee: Corning Glass Works
•
Filing: 1976-12-22
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Granted: 1978-11-14
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Expires: 1996-12-22
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Abstract

Abstract A method for purifying a spent hydrofluoric acid etching solution containing siliceous by-products which comprises treating the solution with a weak anion exchange resin of the polyamine type to remove SiF 6 = ions therefrom is described. The anion exchange resin may be regenerated with aqueous NaOH.

Inventors

  • 👤 Yao-Sin Su
  • 👤 Ken F. Sugawara

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 13:13
CPC Classifications
C; C01; C01B; C01B7/00; C01B7/19; C01B7/191; C01B7/195; C01B7/197; C01B7/198

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 89 words
A method for purifying a spent hydrofluoric acid glass etching solution containing up to about 13% HF by weight and containing fluosilicic acid by removing SiF 6 = ions therefrom which comprises the steps of treating said spent solution with a weak anion exchange resin of the polyamine type in the fluoride salt form to remove said SiF 6 = ions, thereafter regenerating the weak anion exchange resin with an aqueous solution of NaOH and then converting the regenerated weak anion exchange resin back to the fluoride salt from.
Claim 2
Independent Claim 89 words
A method for purifying a spent hydrofluoric acid glass etching solution containing up to about 13% HF by weight and containing fluosilicic acid by removing SiF 6 = ions therefrom which comprises the steps of treating said spent solution with a weak anion exchange resin of the polyamine type in the fluoride salt form to remove said SiF 6 = ions, thereafter regenerating the weak anion exchange resin with an aqueous solution of NaOH and then converting the regenerated weak anion exchange resin back to the fluoride salt from.
Claim 3
Dependent Claim 23 words
A method according to claim 1 wherein the spent hydrofluoric acid solution contains up to about 35 grams per liter of fluosilicic acid.

References Cited (Backward Citations)

US2341907A Cited
US2504695A Cited
US4056605A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-11-13 1982-05-15 1982-11-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-11-13 1986-05-15 1986-11-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-11-13 1990-05-15 1990-11-14 $7700.00 Window Closed / Lapsed

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