US4929563A
Expired / Lapsed
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Method of manufacturing semiconductor device with overvoltage self-protection
Assignee: Toshiba Corp
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Filing: 1988-11-18
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Granted: 1990-05-29
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Expires: 2008-11-18
Abstract
Abstract A method of manufacturing a semiconductor device with overvoltage self-protection of punchthrough type comprises the following steps. (a) A step of making a recess in a P gate-base layer from its surface exposed to the top surface of a substrate. In this step, the recess is formed to such depth that a space-charge layer produced in the gate-base layer when a predetermined breakover voltage for self-protection is applied to a thyristor reaches at least the bottom of the recess, and the bottom of the recess extends close to a junction between the gate-base layer and an emitter layer. (b) A step of doping the gate-base layer with P type impurities from the bottom of the recess to gate-base layer to form a region of low impurity concentration just under the bottom of the recess. The amount (atoms/cm 2 ) of the P type impurities is substantially equal to N D ×l which is the product of the depth l (cm) of the space-charge layer produced in the base layer when the breakover voltage is applied to the thyristor and the impurity concentration N D (atoms/cm 3 ) of an N base layer. (c) A step of forming an electrode on the surface of the recess.
Inventors
- 👤 Yoshiaki Tsunoda
- 👤 Masatoshi Kanaya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 19:59
CPC Classifications
H; H10; H10D; H10D18/00; H10D18/01; H10D18/211
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
253 words
A method of manufacturing a semiconductor device with overvoltage self-protection, comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including an emitter layer of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and another emitter layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being such that the bottom of said recess reaches at least a space-charge layer produced in said gate-base layer when a predetermined forward voltage is applied to said semiconductor device, and further extends close to a junction between said base layer and said gate-base layer; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said semiconductor device and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess.
Claim 2
Independent Claim
253 words
A method of manufacturing a semiconductor device with overvoltage self-protection, comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including an emitter layer of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and another emitter layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being such that the bottom of said recess reaches at least a space-charge layer produced in said gate-base layer when a predetermined forward voltage is applied to said semiconductor device, and further extends close to a junction between said base layer and said gate-base layer; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said semiconductor device and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess.
Claim 3
Dependent Claim
31 words
A method according to claim 1, wherein said second step, said impurities of said opposite conductivity type are introduced into said semiconductor substrate by the use of an ion implantation technique.
Claim 4
Dependent Claim
58 words
A method according to claim 1, wherein said semiconductor substrate is formed of silicon, and wherein, after the surface of said recess is covered with a layer of a metal which is not alloyed with silicon at a temperature used in forming said electrode in said third step, said electrode is formed over said layer of said metal.
Claim 5
Dependent Claim
21 words
A method according to claim 3, wherein said metal is selected from the group consisting of Mo, Ti, Ni and V.
Claim 6
Dependent Claim
38 words
A method according to claim 1, wherein said recess (20) is of a cylindrical shape, and its bottom (20a) has a portion substantially parallel to said junction (11) between said gate-base layer (3) and said base layer (2).
Claim 7
Independent Claim
247 words
A method of manufacturing a thyristor comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including coaxial ring-like emitter layers of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and an anode layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being determined such that the bottom of said recess reaches a space-charge layer produced in said gate-base layer if a predetermined forward voltage is applied to said thyristor, and further extends close to a junction between said base layer and said gate-base layer; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said thyristor and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess.
Claim 8
Independent Claim
247 words
A method of manufacturing a thyristor comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including coaxial ring-like emitter layers of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and an anode layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being determined such that the bottom of said recess reaches a space-charge layer produced in said gate-base layer if a predetermined forward voltage is applied to said thyristor, and further extends close to a junction between said base layer and said gate-base layer; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said thyristor and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess.
Claim 9
Dependent Claim
31 words
A method according to claim 6, wherein said second step, said impurities of said opposite conductivity type are introduced into said semiconductor substrate by the use of an ion implantation technique.
Claim 10
Dependent Claim
58 words
A method according to claim 6, wherein said semiconductor substrate is formed of silicon, and wherein, after the surface of said recess is covered with a layer of a metal which is not alloyed with silicon at a temperature used in forming said electrode in said third step, said electrode is formed over said layer of said metal.
Claim 11
Dependent Claim
21 words
A method according to claim 8, wherein said metal is selected from the group consisting of Mo, Ti, Ni and V.
Claim 12
Dependent Claim
33 words
A method according to claim 6, wherein said recess is of a cylindrical shape, and its bottom has a portion substantially parallel to said junction between said gate-base layer and said base layer.
Claim 13
Independent Claim
282 words
A method of manufacturing a thyristor comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including an emitter layer of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and an anode layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being determined such that the bottom of said recess reaches a space-charge layer produced in said gate-base layer if a predetermined forward voltage is applied to said thyristor; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said thyristor and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess, wherein said semiconductor substrate is formed of silicon, and after the surface of said recess is covered with a layer of a metal which is not alloyed with silicon at a temperature used in forming said electrode in said third step, said electrode is formed over said layer of said metal.
Claim 14
Independent Claim
282 words
A method of manufacturing a thyristor comprising a four-layer structure extending from a top surface to a bottom surface of a semiconductor substrate and including an emitter layer of one conductivity type, a gate-base layer of an opposite conductivity type, a base layer of said one conductivity type and an anode layer of said opposite conductivity type, said method comprising the steps of: a first step of making a recess in said gate-base layer from its surface exposed to the top surface of said substrate, the depth of said recess being determined such that the bottom of said recess reaches a space-charge layer produced in said gate-base layer if a predetermined forward voltage is applied to said thyristor; a second step of doping said semiconductor substrate with impurities of said opposite conductivity type from the bottom of said recess to form a region under said recess having an impurity concentration lower than said gate-base layer, the amount of said impurities being substantially equal to N D × l (atoms/cm 2 ) which is the product of the depth l (cm) of the space-charge layer produced in said base layer when the forward voltage is applied to said thyristor and a concentration N D (atoms/cm 3 ) of impurities of said one conductivity type in said base layer; and a third step of forming an electrode on the surface of said recess, wherein said semiconductor substrate is formed of silicon, and after the surface of said recess is covered with a layer of a metal which is not alloyed with silicon at a temperature used in forming said electrode in said third step, said electrode is formed over said layer of said metal.
Claim 15
Dependent Claim
21 words
A method according to claim 11, wherein said metal is selected from the group consisting of Mo, Ti, Ni and V.
Claim 16
Dependent Claim
28 words
A method according to claim 11, wherein the button of said recess has a portion substantially parallel to said junction between said gate-base layer and said base layer.
References Cited (Backward Citations)
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| 7.5 Years (Year 8) | 1997-05-28 | 1997-11-27 | 1998-05-29 | $3760.00 | Window Closed / Lapsed |
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