← Back to Patent Explorer
US4516315A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making a self-protected thyristor

Assignee: Westinghouse Electric Corp
•
Filing: 1983-05-09
•
Granted: 1985-05-14
•
Expires: 2003-05-09
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract The present invention is directed to a thyristor self-protected against overvoltage by the avalanche mechanism, the protection resulting from a well cut in the top surface of the thyristor and extending through one base region of the thyristor and forming two regions of opposite conductivity type at the bottom of said well, and to the process for making the thyristor.

Inventors

  • 👤 John X. Przybysz
  • 👤 Earl S. Schlegel, deceased

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 19:33
CPC Classifications
H; H10; H10D; H10D18/00; H10D18/211

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 313 words
A process for making a thyristor, said thyristor being self-protected from overvoltage by the avalanche mechanism, comprising, forming two regions of a second type of conductivity in a body of semiconductor material of a first type of conductivity by diffusing a suitable doping material through a top and a bottom surface of said body, said two regions of second type conductivity being separated by a region of said first type conductivity, forming a well in a central portion of said top surface of said body, said well extending at least entirely through said region of second type conductivity formed by diffusion through said top surface of said body of first type conductivity, said well having a bottom surface, implanting ions, capable of forming a region of first type conductivity, through said bottom surface of said well, whereby a region of said first type of conductivity is formed adjacent to the bottom surface of said well, forming a region of said second type of conductivity between said bottom surface of said well and said region of first type conductivity formed by ion implantation, activating said implanted region, forming at least one region of said first type of conductivity in said region of second type conductivity formed by diffusion through said top surface, said at least one region being spaced apart from said well, said at least one region extending into said region of second type of conductivity to a width less than the width of the region of second type conductivity, affixing metal electrical contacts to said top surface of said body in ohmic electrical contact with said at least one region and said region of second type of conductivity, affixing a second metal electrical contact to the bottom surface of said body in ohmic electrical contact with said region of second type conductivity formed by diffusion through said bottom surface of said body.
Claim 2
Dependent Claim 313 words
A process for making a thyristor, said thyristor being self-protected from overvoltage by the avalanche mechanism, comprising, forming two regions of a second type of conductivity in a body of semiconductor material of a first type of conductivity by diffusing a suitable doping material through a top and a bottom surface of said body, said two regions of second type conductivity being separated by a region of said first type conductivity, forming a well in a central portion of said top surface of said body, said well extending at least entirely through said region of second type conductivity formed by diffusion through said top surface of said body of first type conductivity, said well having a bottom surface, implanting ions, capable of forming a region of first type conductivity, through said bottom surface of said well, whereby a region of said first type of conductivity is formed adjacent to the bottom surface of said well, forming a region of said second type of conductivity between said bottom surface of said well and said region of first type conductivity formed by ion implantation, activating said implanted region, forming at least one region of said first type of conductivity in said region of second type conductivity formed by diffusion through said top surface, said at least one region being spaced apart from said well, said at least one region extending into said region of second type of conductivity to a width less than the width of the region of second type conductivity, affixing metal electrical contacts to said top surface of said body in ohmic electrical contact with said at least one region and said region of second type of conductivity, affixing a second metal electrical contact to the bottom surface of said body in ohmic electrical contact with said region of second type conductivity formed by diffusion through said bottom surface of said body.
Claim 3
Dependent Claim 39 words
The process of claim 1 in which the well enters into the region of first type of conductivity that separates the two regions of second type conductivity formed by diffusion through the top and bottom surfaces of the body.
Claim 4
Dependent Claim 37 words
The process of claim 1 in which the region of second type conductivity disposed between the bottom surface of said well and the region of first type conductivity formed by ion implantation, is formed by ion implantation.
Claim 5
Dependent Claim 14 words
The process of claim 3 in which the well is formed by laser etching.

References Cited (Backward Citations)

US4047219A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-05-13 1988-11-12 1989-05-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-05-13 1992-11-12 1993-05-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-05-13 1996-11-12 1997-05-14 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag