← Back to Patent Explorer
US4925773A Expired / Lapsed US ⏱️ 0.0 years remaining

Solder resist ink composition

Assignee: Toshiba Corp
•
Filing: 1987-12-18
•
Granted: 1990-05-15
•
Expires: 2007-12-18
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A solder resist ink composition is disclosed which contains a photo-curable resin obtained by causing an unsaturated monocarboxylic acid to react with a cresolnovolak- or phenolnovolak-type epoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product, a photo-curable resin obtained by causing an unsaturated monocarboxylic acid to react with a bisphenol A novolak- or cycloaliphatic oxirane novolak-type opoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product, at least one photo-polymerizable compound selected from photo-polymerizable monomers, a photo-polymerization initiator, an organic solvent, and an inorganic filler. Also disclosed are two other solder resist ink compositions each having a different photo-curable component.

Inventors

  • 👤 Masataka Miyamura
  • 👤 Yuusuke Wada
  • 👤 Kazuhiro Takeda
  • 👤 Yuji Nakaizumi
  • 👤 Teiji Kohara

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-10 02:13
CPC Classifications
C; C08; C08L; C08L63/00; C08L63/10; G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/032; B; B23; B23K; B23K35/00; B23K35/22; B23K35/224; G03F7/26; G03F7/38; H; H05; H05K; H05K3/00; H05K3/22; H05K3/28; H05K3/285; H05K3/287; H05K2203/00; H05K2203/07; H05K2203/0779; H05K2203/0786; H05K2203/0793; Y; Y10; Y10S; Y10S525/00; Y10S525/922

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 148 words
A solder resist ink composition comprising: a photo-curable resin (A2) obtained by causing an unsaturated monocarboxylic acid to react with a cresolnovolak- or phenolnovolak- epoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product; a photo-curable resin (B2) obtained by causing an unsaturated monocarboxylic acid to react with a bisphenol a novolak epoxy resin or epoxy vinyl cyclohexene-polyether resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product; at least one photo-polymerizable compound (C) selected from photo-polymerizable monomers; a photo-polymerization initiator; an organic solvent; and an inorganic filler, and which composition contains 0.1 to 0.5 equivalents of the photo-curable resin B2 with respect to 1.0 equivalents of photo-curable resin A2, wherein the equivalents are the original epoxy equivalents in the said cresolnovolak- or phenolnovolak- epoxy resin and in the bisphenol A novolak epoxy resin or epoxy vinyl cyclohexane-polyether resin.
Claim 2
Dependent Claim 148 words
A solder resist ink composition comprising: a photo-curable resin (A2) obtained by causing an unsaturated monocarboxylic acid to react with a cresolnovolak- or phenolnovolak- epoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product; a photo-curable resin (B2) obtained by causing an unsaturated monocarboxylic acid to react with a bisphenol a novolak epoxy resin or epoxy vinyl cyclohexene-polyether resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product; at least one photo-polymerizable compound (C) selected from photo-polymerizable monomers; a photo-polymerization initiator; an organic solvent; and an inorganic filler, and which composition contains 0.1 to 0.5 equivalents of the photo-curable resin B2 with respect to 1.0 equivalents of photo-curable resin A2, wherein the equivalents are the original epoxy equivalents in the said cresolnovolak- or phenolnovolak- epoxy resin and in the bisphenol A novolak epoxy resin or epoxy vinyl cyclohexane-polyether resin.
Claim 3
Dependent Claim 64 words
A composition according to claim 1, which contains 1 to 15 parts by weight of the photo-polymerization initiator, 10 to 40 parts by weight of the organic solvent, and 10 to 60 parts by weight of the inorganic filler with respect to 100 parts by weight of the total weight of the photo-curable resin A2, the photo-curable resin B2, and the photo-polymerizable compound C.
Claim 4
Dependent Claim 60 words
A composition according to claim 1, wherein each of the photo-curable resins A2 and B2 is obtained by causing 0.7 to 1.2 equivalent of the unsaturated monocarboxylic acid to react with 1 epoxy equivalent of the novolak epoxy resin, and causing 0.5 to 1.0 equivalent of the dicarboxylic acid anhydride to react with 1 equivalent of the resultant reaction product.
Claim 5
Dependent Claim 33 words
A composition according to claim 1 which contains 0.01 to 0.2 equivalent of the photo-polymerizable compound C with respect to 1.0 equivalent of the total weight of the photo-curable resins A2 and B2.

References Cited (Backward Citations)

US4101398A Cited
JPS492601A Cited
GB2025996A Cited
US4428807A Cited
EP0113409A2 Cited
FR2580828A1 Cited
JPS61243869A Cited
EP0207188A2 Cited
EP0246467A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-05-14 1993-11-13 1994-05-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-05-14 1997-11-13 1998-05-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-05-14 2001-11-13 2002-05-15 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag