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US4919614A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for heat treatment of a substrate

Assignee: Dainippon Screen Manufacturing Co Ltd
•
Filing: 1989-06-19
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Granted: 1990-04-24
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Expires: 2009-06-19
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Abstract

Abstract An apparatus for the heat treatment of a substrate comprises a heat treating plate for heating or cooling a substrate, three holes for one substrate provided on the surface of the heat treating plate whose position is selected to suitably place the substrate, and three balls respectively in the three holes with the diameter of the balls being slightly larger than the depth of the holes. The substrate is retained on the three balls for heat treatment.

Inventors

  • 👤 Kunio Kitagawa
  • 👤 Akira Maeda
  • 👤 Yoshio Matsumura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:31
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0432; C; C30; C30B; C30B25/00; C30B25/02; C30B25/10; C30B31/00; C30B31/06; C30B31/12

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 229 words
An apparatus for the heat treatment of a substrate for heating or cooling the substrate, comprising: a heat treating plate having either heating or cooling means, a main surface and a plurality of through-holes arranged spaced apart from each other by a prescribed internal; three concave portions provided in spaced relationship with each other on a surface of said heat treating plate and each having the same depth, the positions of said three concave portions being selected so as to place said substrate a predetermined spacing above said main surface to facilitate heat exchange between said substrate and said main surface; three balls respectively and detachably retained in said three concave portions and having the same diameter which is larger than the depth of said concave portions for placing said substrate on the top portion thereof and thereby defining said predetermined spacing; and substrate elevating means capable of being protruded to said main surface of said heat treating plate and being retracted from said main surface through said through-holes with said means provided with a placing portion for placing said substrate on the upper portion thereof; said substrate elevating means comprising a plurality of pins which are raised and lowered through said plurality of through-holes and having their upper end portions maintained at the same height, with the upper end of said plurality of pins constituting said placing portions.
Claim 2
Independent Claim 229 words
An apparatus for the heat treatment of a substrate for heating or cooling the substrate, comprising: a heat treating plate having either heating or cooling means, a main surface and a plurality of through-holes arranged spaced apart from each other by a prescribed internal; three concave portions provided in spaced relationship with each other on a surface of said heat treating plate and each having the same depth, the positions of said three concave portions being selected so as to place said substrate a predetermined spacing above said main surface to facilitate heat exchange between said substrate and said main surface; three balls respectively and detachably retained in said three concave portions and having the same diameter which is larger than the depth of said concave portions for placing said substrate on the top portion thereof and thereby defining said predetermined spacing; and substrate elevating means capable of being protruded to said main surface of said heat treating plate and being retracted from said main surface through said through-holes with said means provided with a placing portion for placing said substrate on the upper portion thereof; said substrate elevating means comprising a plurality of pins which are raised and lowered through said plurality of through-holes and having their upper end portions maintained at the same height, with the upper end of said plurality of pins constituting said placing portions.
Claim 3
Dependent Claim 27 words
An apparatus according to claim 1, wherein said plurality of pins are maintained below said through-holes of said heat treating plate when said substrate is heat treated.
Claim 4
Dependent Claim 18 words
An apparatus according to claim 2, wherein said plurality of pins comprises three pins for said one substrate.

References Cited (Backward Citations)

US1941941A Cited
US2208734A Cited
US2273475A Cited
US3266116A Cited
US3904352A Cited
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JPS5737848A Cited
US4362507A Cited
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US4715812A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-04-23 1993-10-23 1994-04-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-04-23 1997-10-23 1998-04-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-04-23 2001-10-23 2002-04-24 $7700.00 Window Closed / Lapsed

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