US4917759A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming self-aligned vias in multi-level metal integrated circuits
Assignee: Motorola Solutions Inc
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Filing: 1989-04-17
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Granted: 1990-04-17
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Expires: 2009-04-17
Abstract
Abstract A process for forming a via in a semiconductor device using a self-aligned metal pillar to connect metal layers separated by a dielectric. A first aluminum layer is formed on an oxide layer overlying a semiconductor substrate, and a thin tungsten layer is formed and patterned overlying the first aluminum layer. The pattern in this tungsten layer will determine the pattern for the first level of metal interconnect to be formed later in the first aluminum layer. The tungsten layer is etched using the underlying first aluminum layer as an etch stop. A second aluminum layer is then formed overlying the patterned tungsten layer and the exposed regions of the first aluminum layer. In one continuous etching step the second aluminum layer is patterned and etched to form a pillar, and the first aluminum layer is etched to form the first level of metal interconnect in the semiconductor device using the pattern formed earlier in the tungsten layer and to expose regions of the oxide layer. A dielectric is deposited overlying the exposed regions of the oxide layer, the formed pillar, and the thin tungsten layer. This dielectric is etched back to expose the top of the pillar, and then a third aluminum layer is deposited overlying the dielectric to make electrical contact to the exposed surface of the pillar.
Inventors
- 👤 Duncan M. Fisher
- 👤 Jeffrey L. Klein
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:14
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/0633; H10W20/069; H10W20/0693; H10W20/40; H10W20/41; H10W20/42
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
140 words
A method for forming a via in a semiconductor device comprising the steps of: providing a semiconductor substrate; forming a first conducting layer overlying said substrate; forming a second conducting layer of a material different from said first conducting layer overlying said first conducting layer; etching a portion of said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer; forming a third conducting layer of material different from said second conducting layer overlying said patterned portion of said second conducting layer; and etching a portion of said third conducting layer using said patterned portion of said second conducting layer as an etch stop to form a pillar wherein said etching selectively etches said third connecting layer substantially more than said patterned portion of said second conducting layer.
Claim 2
Independent Claim
140 words
A method for forming a via in a semiconductor device comprising the steps of: providing a semiconductor substrate; forming a first conducting layer overlying said substrate; forming a second conducting layer of a material different from said first conducting layer overlying said first conducting layer; etching a portion of said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer; forming a third conducting layer of material different from said second conducting layer overlying said patterned portion of said second conducting layer; and etching a portion of said third conducting layer using said patterned portion of said second conducting layer as an etch stop to form a pillar wherein said etching selectively etches said third connecting layer substantially more than said patterned portion of said second conducting layer.
Claim 3
Dependent Claim
84 words
The method of claim 1 further comprising the steps of: etching a portion of said first conducting layer using said patterned portion of said second conducting layer as an etch mask to form a patterned portion of said first conducting layer; depositing a dielectric layer overlying said patterned portion of said second conducting layer and said pillar; etching back said dielectric layer to expose a top surface of said pillar; and forming a fourth conducting layer overlying said exposed top surface of said pillar.
Claim 4
Dependent Claim
30 words
The method of claim 1 wherein said step of forming a first conducting layer comprises forming a layer selected from the group consisting of aluminum, tungsten, titanium, and combinations thereof.
Claim 5
Dependent Claim
30 words
The method of claim 1 wherein said step of forming a second conducting layer comprises forming a layer selected from the group consisting of aluminum, tungsten, titanium, and combinations thereof.
Claim 6
Dependent Claim
30 words
The method of claim 1 wherein said step of forming a third conducting layer comprises forming a layer selected from the group consisting of aluminum, tungsten, titanium, and combinations thereof.
Claim 7
Dependent Claim
17 words
The method of claim 1 wherein said step of etching said third conducting layer comprises etching anisotropically.
Claim 8
Dependent Claim
29 words
The method of claim 2 wherein said step of depositing a dielectric layer comprises depositing a layer selected from the group consisting of PEO, PSG, BSG, BPSG, and PEN.
Claim 9
Independent Claim
188 words
A method for forming a via in a semiconductor device comprising the steps of: providing a semiconductor substrate; forming a first conducting layer overlying said substrate; forming a second conducting layer of a material different from said first conducting layer overlying said first conducting layer; selectively etching said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer wherein said etching selectively etches said second conducting layer substantially more than said first conducting layer; forming a third conducting layer of a material different from said second conducting layer overlying said patterned portion of said second conducting layer; and selectively etching said third conducting layer using said patterned portion of said second conducting layer as an etch stop to form a pillar and etching said first conducting layer using said second conducting layer as an etch mask, said first and third conducting layers being etched with the same etch chemistry in a continuous etch step, wherein said etching selectively etches said first and third conducting layers substantially more than said patterned portion of said second conducting layer.
Claim 10
Independent Claim
188 words
A method for forming a via in a semiconductor device comprising the steps of: providing a semiconductor substrate; forming a first conducting layer overlying said substrate; forming a second conducting layer of a material different from said first conducting layer overlying said first conducting layer; selectively etching said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer wherein said etching selectively etches said second conducting layer substantially more than said first conducting layer; forming a third conducting layer of a material different from said second conducting layer overlying said patterned portion of said second conducting layer; and selectively etching said third conducting layer using said patterned portion of said second conducting layer as an etch stop to form a pillar and etching said first conducting layer using said second conducting layer as an etch mask, said first and third conducting layers being etched with the same etch chemistry in a continuous etch step, wherein said etching selectively etches said first and third conducting layers substantially more than said patterned portion of said second conducting layer.
Claim 11
Dependent Claim
53 words
The method of claim 8 further comprising the steps of: depositing a dielectric layer overlying said patterned portion of said second conducting layer and said pillar; etching back said dielectric layer to expose a top surface of said pillar; and forming a fourth conducting layer overlying said exposed top surface of said pillar.
Claim 12
Independent Claim
247 words
A method for forming a via in a semiconductor device comprising the steps of: providing a first dielectric layer overlying a semiconductor substrate; forming a first conducting layer of a first metal overlying said first dielectric layer; forming a second conducting layer of a second metal overlying said first conducting layer; selectively etching said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer; forming a third conducting layer of said first metal overlying said patterned portion of said second conducting layer; selectively etching said third conducting layer to form a pillar using said patterned portion of said second conducting layer as an etch stop, and etching said first conducting layer using said patterned portion of said second conducting layer as an etch mask and said first dielectric layer as an etch stop, said first and third conducting layers being etched with the same etch chemistry in a continuous etch step, wherein said etching selectively etches said first and third conducting layers substantially more than said patterned portion of said second conducting layer; depositing a second dielectric layer overlying said pillar; etching back said second dielectric layer to expose a top surface of said pillar and to substantially planarize a top surface of said second dielectric layer; and forming a fourth conducting layer overlying said planarized top surface of said second dielectric layer to make electrical contact to said exposed top surface of said pillar.
Claim 13
Independent Claim
247 words
A method for forming a via in a semiconductor device comprising the steps of: providing a first dielectric layer overlying a semiconductor substrate; forming a first conducting layer of a first metal overlying said first dielectric layer; forming a second conducting layer of a second metal overlying said first conducting layer; selectively etching said second conducting layer using said first conducting layer as an etch stop to form a patterned portion of said second conducting layer; forming a third conducting layer of said first metal overlying said patterned portion of said second conducting layer; selectively etching said third conducting layer to form a pillar using said patterned portion of said second conducting layer as an etch stop, and etching said first conducting layer using said patterned portion of said second conducting layer as an etch mask and said first dielectric layer as an etch stop, said first and third conducting layers being etched with the same etch chemistry in a continuous etch step, wherein said etching selectively etches said first and third conducting layers substantially more than said patterned portion of said second conducting layer; depositing a second dielectric layer overlying said pillar; etching back said second dielectric layer to expose a top surface of said pillar and to substantially planarize a top surface of said second dielectric layer; and forming a fourth conducting layer overlying said planarized top surface of said second dielectric layer to make electrical contact to said exposed top surface of said pillar.
References Cited (Backward Citations)
US4670091A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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