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US4916510A Expired / Lapsed US ⏱️ 0.0 years remaining

Thin film mesa transistor of field effect type with superlattice

Assignee: Canon Inc
•
Filing: 1988-03-11
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Granted: 1990-04-10
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Expires: 2008-03-11
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Abstract

Abstract A thin film mesa type FET having a gate electrode formed on a substrate. An insulating thin film layer is formed on the gate electrode. A multilayer structure is formed on the insulating thin film layer by alternately laminating a number of non-monocrystalline semiconductor material layers and a number of non-monocrystalline insulating material layers. The thickness of the semiconductor layers is 5 to 500 Å.

Inventors

  • 👤 Masafumi Sano
  • 👤 Katsuji Takasu
  • 👤 Hisanori Tsuda
  • 👤 Yutaka Hirai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 04:45
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/67; H10D30/6729; H10D30/673; H10D30/6732; H10D30/674; H10D30/6741; H10D30/6743; H10D30/6746; H10D30/6748; H10D62/00; H10D62/80; H10D62/81; H10D62/815; H10D62/8161; H10D62/8162; H10D62/8163

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 153 words
A thin film mesa type field effect transistor comprising: a substrate, a gate electrode formed on said substrate; an insulating thin film layer formed on said gate electrode subsequent to formation of the gate electrode on said substrate; a multilayer structure formed on said insulating thin film layer subsequent to formation of said insulating thin film layer by alternately laminating a number of first solid layers each comprising a non-monocrystalline semiconductor material and a number of second solid layers each comprising non-monocrystalline material, wherein a difference of an optical energy band gap between said first and second solid layers is set to be greater than 0.4 eV, and a thickness of a single layer of each of said first and second layers has a value such that a quantum effect is obtained; and a drain electrode and a source electrode, said multilayer structure being sandwiched by said drain electrode and said source electrode.
Claim 2
Dependent Claim 153 words
A thin film mesa type field effect transistor comprising: a substrate, a gate electrode formed on said substrate; an insulating thin film layer formed on said gate electrode subsequent to formation of the gate electrode on said substrate; a multilayer structure formed on said insulating thin film layer subsequent to formation of said insulating thin film layer by alternately laminating a number of first solid layers each comprising a non-monocrystalline semiconductor material and a number of second solid layers each comprising non-monocrystalline material, wherein a difference of an optical energy band gap between said first and second solid layers is set to be greater than 0.4 eV, and a thickness of a single layer of each of said first and second layers has a value such that a quantum effect is obtained; and a drain electrode and a source electrode, said multilayer structure being sandwiched by said drain electrode and said source electrode.
Claim 3
Dependent Claim 57 words
A thin film transistor according to claim 1, wherein each of said first solid layers is made of a material selected from the group consisting of hydroamorphous silicon and hydroamorphous silicon germanium, and each of said second solid layers is made of a material selected from the group consisting of hydroamorphous silicon carbide and hydroamorphous silicon nitride.
Claim 4
Dependent Claim 23 words
A thin film transistor according to claim 1, wherein a thickness of each of said first solid layers is 5 to 500 Å.
Claim 5
Dependent Claim 23 words
A thin film transistor according to claim 1, wherein a thickness of each of said second solid layers is 50 to 1000 Å.
Claim 6
Dependent Claim 25 words
A thin film mesa type field effect transistor according to claim 1, wherein said second solid layers comprise a non-monocrystalline material having an insulating property.

References Cited (Backward Citations)

US3626328A Cited
US3721583A Cited
US4642144A Cited
US4558337A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-04-09 1993-10-09 1994-04-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-04-09 1997-10-09 1998-04-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-04-09 2001-10-09 2002-04-10 $7700.00 Window Closed / Lapsed

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