Patent JPS5044259A successfully refreshed from Google Patents.
Patent US4904902A successfully refreshed from Google Patents.
US4904902A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ion implanting system
Assignee: Sumitomo Heavy Industries Ion Technology Co Ltd
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Filing: 1988-04-14
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Granted: 1990-02-27
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Expires: 2008-04-14
Abstract
Abstract In an ion implanting apparatus, a first conductor member for monitoring the charge-up of the workpiece is positioned on the front face of a wafer disk, a second conductor member electrically connected with the first conductor member for distributing the charge on the first conductor member is positioned on the rear face of the wafer disk, and a third conductor capable of forming capacitive coupling with the second conductor member is fixed to a disk chamber. When the first conductor member is charged, the charge is distributed also to the second conductor member. When the second conductor member passes by the third conductor member by the rotation of the disk, charge is induced on the third conductor member depending on the charged state of the second conductor member. The first, the second and the third conductor members can be effectively shielded from the surroundings. Charge detection with a high S/N ratio is made possible.
Inventors
- 👤 Tadamoto Tamai
- 👤 Masateru Sato
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:33
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/026; H01J37/30; H01J37/317; H01J37/3171
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
129 words
An ion implanting apparatus for implanting ions into a plurality of workpieces, comprising: a rotatable disk having a front and a rear face, for mounting a plurality of workpieces on the front face; disk chamber means for defining a hermetic space and containing said disk therein; a first conductor member disposed on the front face of said disk; a second conductor member disposed on the rear face of said disk and electrically connected to said first conductor member; and a third conductor member fixed to said disk chamber means and disposed in the vicinity of the passage of said second conductor member and capacitively coupled to said second conductor member, whereby the charged state of the first conductor is monitored by the electrical state of the third conductor member.
Claim 2
Dependent Claim
129 words
An ion implanting apparatus for implanting ions into a plurality of workpieces, comprising: a rotatable disk having a front and a rear face, for mounting a plurality of workpieces on the front face; disk chamber means for defining a hermetic space and containing said disk therein; a first conductor member disposed on the front face of said disk; a second conductor member disposed on the rear face of said disk and electrically connected to said first conductor member; and a third conductor member fixed to said disk chamber means and disposed in the vicinity of the passage of said second conductor member and capacitively coupled to said second conductor member, whereby the charged state of the first conductor is monitored by the electrical state of the third conductor member.
Claim 3
Dependent Claim
28 words
An ion implanting apparatus according to claim 1, wherein said disk is made of metal and said first and second conductor members are electrically isolated from the disk.
Claim 4
Dependent Claim
23 words
An ion implanting apparatus according to claim 2, further comprising a first shielding conductor surrounding the first conductor and isolated from said disk.
Claim 5
Dependent Claim
31 words
An ion implanting apparatus according to claim 2, further comprising a second shielding conductor surrounding the second conductor on the rear face of the disk and electrically connected with said disk.
Claim 6
Dependent Claim
28 words
An ion implanting apparatus according to claim 2, further comprising a first capacitor of a predetermined capacitance connected between said disk and said first and second conductor members.
Claim 7
Dependent Claim
22 words
An ion implanting apparatus according to claim 3, further comprising a second capacitance connected between said first shielding conductor and said disk.
Claim 8
Dependent Claim
24 words
An ion implanting apparatus according to claim 1, further comprising an electron source capable of supplying electrons to the front face of said disk.
Claim 9
Dependent Claim
26 words
An ion implanting apparatus according to claim 7, further comprising means for controlling said electron source in dependence on the charge state of said third conductor.
Claim 10
Dependent Claim
39 words
An ion implanting apparatus according to claim 8, wherein said electron source includes an electron gun for emitting primary electrons and a target for receiving the primary electrons and emitting secondary electrons upon the irradiation of the primary electrons.
Claim 11
Dependent Claim
56 words
An ion implanting apparatus according to claim 9, further comprising a plurality of workpiece susceptors disposed on the front face of said disk in a peripheral portion along the circumference of the disk, wherein said first conductor member extends between a pair of workpiece susceptors and covering the whole radial scan length of the ion beam.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-02-26 | 1993-08-28 | 1994-02-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-02-26 | 1997-08-28 | 1998-02-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-02-26 | 2001-08-28 | 2002-02-27 | $7700.00 | Window Closed / Lapsed |