US4900582A
Expired / Lapsed
US
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Method for improving film quality of silica-based films
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1988-05-20
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Granted: 1990-02-13
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Expires: 2008-05-20
Abstract
Abstract A coating solution for forming a silica-based film, having a given viscosity, is coated on a substrate such as a silicon wafer, this coating solution is dried to form a silica-based film, and this silica-based film is exposed to ultraviolet radiation in an atmosphere containing ozone at room temperature or while heating it preferably at a temperature of not more than 300 DEG C., particularly at a temperature of from 50 DEG to 200 DEG C., by means of a heating member such as a hot plate. The film quality of the silica-based film can be improved by exposing it to ultraviolet radiation in the atmosphere containing ozone.
Inventors
- 👤 Muneo Nakayama
- 👤 Akira Hashimoto
- 👤 Toshihiro Nishimura
- 👤 Eiichi Kashiwagi
- 👤 Isamu Hijikata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 21:07
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/40; H10W74/47; H10W74/476; H10W74/01
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
63 words
A method of improving the quality of a silica-based film, which comprises: forming a silica-based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight.
Claim 2
Independent Claim
63 words
A method of improving the quality of a silica-based film, which comprises: forming a silica-based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight.
Claim 3
Dependent Claim
154 words
The method of claim 1, wherein said silica compound is selected from a halogenated silane represented by the formula: R.sub.n SiX.sub.4-n wherein X represents a halogen atom, R represents an alkyl group having 1 to 4 carbon atoms, an aryl group having 6 to 9 carbon atoms, a vinyl group, a glycidoxymethyl group, a glycidoxyethyl group or a glycidoxypropyl group, and n is an integer of 0 or 1 to 3, and an alkoxysilane represented by the formula: (RO.sub.n)SiX.sub.4-n or (RO.sub.n)SiR' .sub.4-n wherein X represents a halogen atom, R and R' each independently represent an alkyl group having 1 to 4 carbon atoms, an aryl group having 6 to 9 carbon atoms, a vinyl group, a glycidoxymethyl group, a glycidoxyethyl group, a glycidoxypropyl group, an acryloxymethyl group, an acryloxyethyl group, an acryloxypropyl group, a methacryloxymethyl group, a methacryloxyethyl group or a methacryloxypropyl group, and n is an integer of 0 or 1 to 4.
Claim 4
Dependent Claim
36 words
The method of claim 1, wherein said silica-based film is exposed to ultraviolet radiation in the atmosphere containing ozone, at room temperature or while heating said film at a temperature of not more than 300° C.
Claim 5
Dependent Claim
20 words
The method of claim 3, wherein the heating is carried out at a temperature of from 50° to 200° C.
Claim 6
Dependent Claim
42 words
The method of claim 1, wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen and air, in an amount of not less than 1% by weight.
Claim 7
Dependent Claim
23 words
The method of claim 5, wherein said ozone is mixed with said gas in an amount of from 1 to 10% by weight.
Claim 8
Dependent Claim
23 words
The method of claim 1, wherein said film forming coating solution comprises an organic solvent solution containing a hydrolyzate of the silicon compound.
Claim 9
Dependent Claim
23 words
The method of claim 2, wherein said film forming coating solution comprises an organic solvent solution containing a hydrolyzate of the silicon compound.
Claim 10
Dependent Claim
58 words
The method of claim 7, wherein said film forming coating solution is prepared by dissolving said hydrolyzate of the silicon compound in said organic solvent at a concentration of from 5 to 50% by weight, subjecting the resulting solution to dehydration condensation reaction conditions, and adjusting the viscosity of the solution to about 2×10 -3 to 0.2 Pa.
Claim 11
Dependent Claim
41 words
The method of claim 9, wherein said concentration of said hydrolyzate of the silicon compound in said organic solvent is from 10 to 30% by weight, and wherein said dehydration condensation reaction conditions include a temperature of less than 200° C.
Claim 12
Dependent Claim
35 words
The method of claim 9, wherein said film forming coating solution further comprises a vitrifying agent in an amount of from 1 to 50% by weight in terms of metal based on the silicon compound.
Claim 13
Dependent Claim
35 words
The method of claim 10, wherein said film forming coating solution further comprises a vitrifying agent in an amount of from 1 to 50% by weight in terms of metal based on the silicon compound.
Claim 14
Dependent Claim
33 words
The method of claim 1, wherein said silica-based film is dried at temperatures of not more than 200° C. before said silica-based film is exposed to ultraviolet radiation in an atmosphere containing ozone.
Claim 15
Dependent Claim
27 words
The method of claim 1, wherein said silica-based film is further heat-treated in an insert gas after being exposed to ultraviolet radiation in an atmosphere containing ozone.
Claim 16
Dependent Claim
11 words
The method of claim 14, wherein said inert gas is nitrogen.
Claim 17
Dependent Claim
42 words
The method of claim 3, wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen and air, in an amount of not less than 1% by weight.
Claim 18
Dependent Claim
20 words
The method of claim 16, wherein the heating is carried out at a temperature of from 50 to 200° C.
Claim 19
Dependent Claim
20 words
The method of claim 10, wherein the heating is carried out at a temperature of from 50° to 200° C.
Claim 20
Dependent Claim
23 words
The method of claim 10, wherein said ozone is mixed with said gas in an amount of from 1 to 10% by weight.
Claim 21
Independent Claim
118 words
A method of improving the quality of a silica-based film, which comprises: forming a silica based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica-based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight, wherein said silica-based film is exposed to the ultraviolet radiation at room temperature or while heating said film to a temperature of not more than 300° C., and wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen, and air.
Claim 22
Independent Claim
118 words
A method of improving the quality of a silica-based film, which comprises: forming a silica based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica-based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight, wherein said silica-based film is exposed to the ultraviolet radiation at room temperature or while heating said film to a temperature of not more than 300° C., and wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen, and air.
Claim 23
Independent Claim
101 words
A method of improving the quality of silica-based film, which comprises: forming a silica based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica-based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight, wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen, and air, and wherein said ozone is produced by means of an ozone generator.
Claim 24
Independent Claim
101 words
A method of improving the quality of silica-based film, which comprises: forming a silica based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; and exposing said silica-based film to ultraviolet radiation in an atmosphere containing ozone in an amount of not less than 1% by weight, wherein said ozone is mixed with a gas selected from the group consisting of nitrogen gas, oxygen gas, a mixed gas of nitrogen and oxygen, and air, and wherein said ozone is produced by means of an ozone generator.
Claim 25
Independent Claim
91 words
A method of improving the quality of a silica-based film, which comprises: forming a silica-based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; placing said substrate formed thereon with said silica-based film in a chamber; introducing into said chamber a gas containing ozone produced outside said chamber,r wherein said ozone is in an amount of not less than 1% by weight; and exposing said silica-based film to ultraviolet radiation in said gas and said chamber.
Claim 26
Independent Claim
91 words
A method of improving the quality of a silica-based film, which comprises: forming a silica-based film by coating on a substrate a film forming coating solution, wherein said coating solution comprises an organic solvent solution of a silicon compound; placing said substrate formed thereon with said silica-based film in a chamber; introducing into said chamber a gas containing ozone produced outside said chamber,r wherein said ozone is in an amount of not less than 1% by weight; and exposing said silica-based film to ultraviolet radiation in said gas and said chamber.
References Cited (Backward Citations)
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