Coated material and use thereof

Claim 2

A process for producing a protective coating which comprises (a) coating a substrate on at least one surface with a layer of a polyamic acid, which polymer contains 50 to 100 mol %, based on said polymer, of at least one structural unit of formula I or II ##STR36## or of a mixture thereof, and 0 to 50 mol. % of a structural unit of formula III or IV ##STR37## or of a mixture thereof, wherein the arrows denote position isomerism and Ra is a hydrogen atom, Z is a tetravalent aromatic radical which contains a benzophenone structural unit and to which one --CONH and one --COOR a group is attached to one or two different phenyl radicals in ortho- or peri-position to each other, and where Z is a radical of formula V, VI, VII or XI ##STR38## wherein n is 0 or 1, T is a direct bond, --CH 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR b -- or --CR b R c --, wherein R b is a hydrogen atom, C 1 -C 10 alkyl, naphthyl or benzyl, and R c has the meaning of R b but is not hydrogen, the rings A in formula XI are saturated or aromatic, and a pair of free bonds is ortho to each other, Z' is a tetravalent aromatic radical which differs from Z and to which one ester group and one amide group are attached in ortho or peri-position to each other, Z" is a trivalent aromatic radical which differs from the radical in the structural unit of formula II and to which one ester and one amide group are attached in ortho- or peri-position to each other, X is the radical of an aromatic diamine which is substituted in both ortho-positions to at least one N-atom by alkyl, cycloalkyl, alkoxy, alkoxyalkyl or aralkyl, or two adjacent carbon atoms of the aromatic radical are substituted by alkylene, X' is a divalent aromatic radical which is substituted by at least one group as defined for X, and X" has the same meaning as X or is a divalent radical of an organic diamine which differs from the radical X, (b) irradiating the coated material to crosslink said material, and (c) heating the crosslinked layer to convert said layer to the corresponding polyimide form.

Claim 3

A process according to claim 1 where in the polymer the aromatic radicals X and X' are each a divalent, mononuclear or binuclear phenylene radical.

Claim 4

A process according to claim 1 where in the polymer an alkyl or alkoxy substituent of X and X' contains 1 to 20 carbon atoms, an alkoxy-alkyl substituent of X and X' contains 2 to 12 carbon atoms, a cycloalkyl substituent of X and X' contains 5 or 6 ring carbon atoms, an alkylene substituent of X and X' contains 3 or 4 carbon atoms, and an aralkyl substituent is benzyl.

Claim 5

A process according to claim 3 wherein the substituent of X and X' is alkyl of 1 to 4 carbon atoms.

Claim 6

A process according to claim 1 where in the polymer the aromatic radicals Z and Z' contain 6 to 30 carbon atoms.

Claim 7

A process according to claim 1 where in the polymer n in formulae V and VI is 0 and T in formula VII is --O-- or --CO--.

Claim 8

A process according to claim 1 where in the polymer Z' is selected from the group consisting of ##STR39## wherein R 1 is a direct bond or a bridge of the formula ##STR40## wherein R 2 , R 3 and R 4 are C 1 -C 6 alkyl, phenyl or benzyl, and R 3 and R 4 in the silicone-containing groups are C 1 -C 6 alkoxy, phenoxy or benzyloxy.

Claim 9

A process according to claim 7 where in the polymer Z' is a radical of the formula ##STR41## wherein R 1 is a direct bond, --O--, --SO 2 -- or --CH 2 --.

Claim 10

A process according to claim 1 where in the polymer Z" in formula IV is a radical of the formula ##STR42## wherein R d is a bridge or a direct bond.

Claim 11

A process according to claim 1 where in the polymer an aromatic radical X is a radical of formula VIII, VIIIa and/or VIIIb ##STR43## wherein the free bonds in formula VIII are meta or para to each other and in formula VIIIa are meta or para to the R 11 group and R 5 and R 6 are located in both ortho-positions to the free bond, and in formula VIIIb the free bonds are in 2-, 3-, 6- and 7-position and R 5 and R 6 are located in both ortho-positions to the free bonds; R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, --N--alkyl containing 1 to 6 carbon atoms in the alkyl moiety, ##STR44## --CONH--, --CON--alkyl-- containing 1 to 6 carbon atoms in the alkyl moiety, --CON--phenyl--, --CON--benzyl--, ##STR45## and R 17 is a hydrogen atom, C 1 -C 6 alkyl or phenyl, linear or branched alkylene of 1 to 3 carbon atoms, alkylidene of 2 to 12 carbon atoms which is unsubstituted or substituted by chloro or fluoro, cycloalkylidene containing 5 or 6 ring atoms, phenylene, phenylenedioxy, or the ##STR46## group, wherein R 3 and R 4 are alkyl or alkoxy, each of 1 to 6 carbon atoms, phenyl, benzyl, phenoxy or benzyloxy, r is an integer from 1 to 10, t is 0 or 1 and s is 0 or 1, R is --O-- or --S-- and Q is C 1 -C 6 alkylene, q is an integer from 1 to 100, R 5 and R 6 are alkyl or alkoxy, each of 1 to 12 carbon atoms, alkoxyalkyl of 2 to 12 carbon atoms, cyclopentyl, cyclohexyl or benzyl, or R 5 and R 7 in formula VIII or VIIIa are adjacent to each other and, when taken together, are trimethylene or tetramethylene, or R 6 is also a hydrogen atom, R 7 and R 8 are hydrogen or independently have the meaning of R 5 and R 7 , and R 9 and R 10 are hydrogen or independently have the meaning of R 5 and R 6 , or R 7 and R 9 in formula VIIIa, when taken together, are trimethylene or tetramethylene.

Claim 12

A process according to claim 10 wherein R 5 and R 6 are C 1 -C 6 -alkyl.

Claim 13

A process according to claim 10 wherein R 11 is --CH 2 --, --O--, --CO-- or a direct bond.

Claim 14

A process according to claim 10 wherein the free bonds in formula VIIIa are para to the R 11 group.

Claim 15

A process according to claim 1 wherein the polyamic acid as a copolymer contains at least 2 different structural units.

Claim 16

A process according to claim 14 wherein the structural units of formula I in the radical X are different.

Claim 17

A process according to claim 10 wherein X is a radical of formula ##STR47## wherein the free bonds are meta or para to each other; or is a radical of formula ##STR48## wherein R 5 and R 6 are each independently methyl, ethyl, n-propyl or isopropyl, and R 7 and R 8 are a hydrogen atom or have the meaning of R 5 , or R 5 and R 7 , when taken together, are trimethylene or tetramethylene and R 6 and R 7 are a hydrogen atom, and R 11 is a direct bond, --CH 2 -- or --CO--.

Claim 18

A process according to claim 16 wherein the polyamic acid is a copolymer in which X corresponds to two or more radicals of the formulae ##STR49## wherein the free bonds are meta or para to each other, or of the formula ##STR50## wherein R 5 , R 6 , R 7 , R 8 and R 11 are defined in claim 16.

Claim 19

A process according to claim 1 where in the polymer X" in formula III is C 2 -C 30 -alkylene, cycloalkylene containing 5 or 6 ring carbon atoms, C 7 -C 30 -aralkylene, C 6 -C 22 -arylene or a polysiloxane radical.

Claim 20

A process according to claim 18 wherein X" as arylene has the formula ##STR51## wherein m is 0 or 1, the free bonds are meta or preferably ortho to the R 12 group, R 11 has the same meaning as in formula VIIIa and R 12 has the same meaning as R 5 .

Claim 21

A process according to claim 19 wherein X" corresponds to formula IX, IXb or IXc ##STR52## wherein R 11 is a direct bond, --O--, --CO-- or --CH 2 --, and R 12 is methyl, ethyl, isopropyl, methoxy, ethoxy or a hydrogen atom.

Claim 22

A process according to claim 1 wherein the polymer contains 80-100 mol % of structural units of formula I, formula II or mixtures thereof, and 20-0 mol % of structural units of formula III, formula IV or mixtures thereof.

Claim 23

A process according to claim 1 where in the polymer the aromatic radical X' is an alkyl-substituted phenylene radical or bisphenylene radical.

Claim 24

A process according to claim 22 wherein the radical X' is of formula X ##STR53## wherein q' is 0 or 1, R j is a direct bond or a bridge, R 1 is C 1 -C 4 alkyl and R g to R n is a hydrogen atom or C 1 -C 4 alkyl, and the free bonds are meta or para to the R j group.

Claim 25

A process according to claim 23 wherein R j is a direct bond, or a bridge selected from the group consisting of --S--, --SO--, --SO 2 , --CO--, --CH 2 --, --O-- or C 2 -C 6 -alkylidene.

Claim 26

A process according to claim 1 where in the polymer the radical of formula II corresponds to the structural unit ##STR54##

Claim 27

A process for producing a relief image which comprises (a) coating a substrate with a layer of a polyamic acid, which polymer contains 50 to 100 mol %, based on said polymer, of at least one structural unit of formula I or II ##STR55## or of a mixture thereof, and 0 to 50 mol. % of a structural unit of formula III or IV ##STR56## or of a mixture thereof, wherein the arrows denote position isomerism and R a is a hydrogen atom, Z is a tetravalent aromatic radical which contains a benzophenone structural unit and to which one --CONH and one --COOR a group is attached to one or two different phenyl radicals in ortho- or peri-position to each other, and where Z is a radical of formula V, VI, VII or XI ##STR57## wherein n is 0 or 1, T is a direct bond, --CH 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR b -- or --CR b R c --, wherein R b is a hydrogen atom, C 1 -C 10 alkyl, naphthyl or benzyl, and Rc has the meaning of R b but is not hydrogen, the rings A in formula XI are saturated or aromatic, and a pair of free bonds is ortho to each other, Z' is a tetravalent aromatic radical which differs from Z and to which one ester group and one amide group are attached in ortho- or peri-position to each other, Z' is a trivalent aromatic radical which differs from the radical in the structural unit of formula II and to which one ester and one amide group are attached in ortho- or peri-position to each other, X is the radical of an aromatic diamine which is substituted in both ortho-positions to at least one N-atom by alkyl, cycloalkyl, alkoxy, alkoxyalkyl or aralkyl, or two adjacent carbon atoms of the aromatic radical are substituted by alkylene, X' is a divalent aromatic radical which is substituted by at least one group as defined for X, and X" has the same meaning as X or is a divalent radical of an organic diamine which differs from the radical X, (b) irradiating the coated material through a photomask, (c) developing the image by treating the material with a solvent to remove the uncrosslinked polymer from the areas not exposed to irradiation, and (d) heating the crosslinked image to convert said image to the corresponding polyimide form.

Claim 28

A process for producing a relief image which comprises (a) coating a substrate with a layer of a polyamic acid, which polymer contains 50 to 100 mol %, based on said polymer, of at least one structural unit of formula I or II ##STR55## or of a mixture thereof, and 0 to 50 mol. % of a structural unit of formula III or IV ##STR56## or of a mixture thereof, wherein the arrows denote position isomerism and R a is a hydrogen atom, Z is a tetravalent aromatic radical which contains a benzophenone structural unit and to which one --CONH and one --COOR a group is attached to one or two different phenyl radicals in ortho- or peri-position to each other, and where Z is a radical of formula V, VI, VII or XI ##STR57## wherein n is 0 or 1, T is a direct bond, --CH 2 --, --O--, --S--, --SO--, --SO 2 --, --CO--, --NR b -- or --CR b R c --, wherein R b is a hydrogen atom, C 1 -C 10 alkyl, naphthyl or benzyl, and Rc has the meaning of R b but is not hydrogen, the rings A in formula XI are saturated or aromatic, and a pair of free bonds is ortho to each other, Z' is a tetravalent aromatic radical which differs from Z and to which one ester group and one amide group are attached in ortho- or peri-position to each other, Z' is a trivalent aromatic radical which differs from the radical in the structural unit of formula II and to which one ester and one amide group are attached in ortho- or peri-position to each other, X is the radical of an aromatic diamine which is substituted in both ortho-positions to at least one N-atom by alkyl, cycloalkyl, alkoxy, alkoxyalkyl or aralkyl, or two adjacent carbon atoms of the aromatic radical are substituted by alkylene, X' is a divalent aromatic radical which is substituted by at least one group as defined for X, and X" has the same meaning as X or is a divalent radical of an organic diamine which differs from the radical X, (b) irradiating the coated material through a photomask, (c) developing the image by treating the material with a solvent to remove the uncrosslinked polymer from the areas not exposed to irradiation, and (d) heating the crosslinked image to convert said image to the corresponding polyimide form.

Claim 29

A process according to claim 26 where in the polymer the aromatic radicals X and X' are each a divalent, mononuclear or binuclear phenylene radical.

Claim 30

A process according to claim 26 where in the polymer an alkyl or alkoxy substituent of X and X' contains 1 to 20 carbon atoms, an alkoxy-alkyl substituent of X and X' contains 2 to 12 carbon atoms, a cycloalkyl substituent of X and X' contains 5 or 6 ring carbon atoms, an alkylene substituent of X and X' contains 3 or 4 carbon atoms, and an aralkyl substituent is benzyl.

Claim 31

A process according to claim 28 wherein the substituent of X and X' is alkyl of 1 to 4 carbon atoms.

Claim 32

A process according to claim 26 where in the polymer the aromatic radicals Z and Z' contain 6 to 30 carbon atoms.

Claim 33

A process according to claim 26 where in the polymer n in formulae V and VI is 0 and T in formula VII is --O-- or --CO--.

Claim 34

A process according to claim 26 where in the polymer Z' is selected from the group consisting of ##STR58## wherein R 1 is a direct bond or a bridge of the formula ##STR59## wherein R 2 , R 3 and R 4 are C 1 -C 6 alkyl, phenyl or benzyl, and R 3 and R 4 in the silicone-containing groups are C 1 -C 6 alkoxy, phenoxy or benzyloxy.

Claim 35

A process according to claim 32 wherein Z' is a radical of the formula ##STR60## wherein R 1 is a direct bond, --O--, --SO 2 -- or --CH 2 --.

Claim 36

A process according to claim 26 where in the polymer Z" in formula IV is a radical of the formula ##STR61## wherein R d is a bridge or a direct bond.

Claim 37

A process according to claim 26 where in the polymer an aromatic radical X is a radical of formula VIII, VIIIa and/or VIIIb ##STR62## wherein the free bonds in formula VIII are meta or para to each other and in formula VIIIa are meta or para to the R 11 group and R 5 and R 6 are located in both ortho-positions to the free bond, and in formula VIIIb the free bonds are in 2-, 3-, 6- and 7-position and R 5 and R 6 are located in both ortho-positions to the free bonds; R 11 is a direct bond, --O--, --S--, --SS--, --SO--, --SO 2 --, --CO--, --COO--, --NH--, --N--alkyl containing 1 to 6 carbon atoms in the alkyl moiety, ##STR63## --CONH--, --CON--alkyl-- containing 1 to 6 carbon atoms in the alkyl moiety, --CON--phenyl--, --CON--benzyl--, ##STR64## and R 17 is a hydrogen atom, C 1 -C 6 alkyl or phenyl, linear or branched alkylene of 1 to 3 carbon atoms, alkylidene of 2 to 12 carbon atoms which is unsubstituted or substituted by chloro or fluoro, cycloalkylidene containing 5 or 6 ring atoms, phenylene, phenylenedioxy, or the ##STR65## group, wherein R 3 and R 4 are alkyl or alkoxy, each of 1 to 6 carbon atoms, phenyl, benzyl, phenoxy or benzyloxy, r is an integer from 1 to 10, t is 0 or 1 and s is 0 or 1, R is --O-- or --S-- and Q is C 1 -C 6 alkylene, q is an integer from 1 to 100, R 5 and R 6 are alkyl or alkoxy, each of 1 to 12 carbon atoms, alkoxyalkyl of 2 to 12 carbon atoms, cyclopentyl, cyclohexyl or benzyl, or R 5 and R 7 in formula VIII or VIIIa are adjacent to each other and, when taken together, are trimethylene or tetramethylene, or R 6 is also a hydrogen atom, R 7 and R 8 are hydrogen or independently have the meaning of R 5 and R 7 , and R 9 and R 10 are hydrogen or independently have the meaning of R 5 and R 6 , or R 7 and R 9 in formula VIIIa, when taken together, are trimethylene or tetramethylene.

Claim 38

A process according to claim 35 wherein R 5 and R 6 are C 1 -C 6 -alkyl.

Claim 39

A process according to claim 35 wherein R 11 is --CH 2 --, --O--, --CO-- or a direct bond.

Claim 40

A process according to claim 35 wherein the free bonds in formula VIIIa are para to the R 11 group.

Claim 41

A process according to claim 26 wherein the polyamic acid as a copolymer contains at least 2 different structural units.

Claim 42

A process according to claim 39 wherein the structural units of formula I in the radical X are different.

Claim 43

A process according to claim 35 wherein X is a radical of formula ##STR66## wherein the free bonds are meta or para to each other; or is a radical of formula ##STR67## wherein R 5 and R 6 are each independently methyl, ethyl, n-propyl or isopropyl, and R 7 and R 8 are a hydrogen atom or have the meaning of R 5 , or R 5 and R 7 , when taken together, are trimethylene or tetramethylene and R 6 and R 7 are a hydrogen atom, and R 11 is a direct bond, --CH 2 -- or --CO--.

Claim 44

A process according to claim 41 wherein the polyamic acid is a copolymer in which X corresponds to two or more radicals of the formulae ##STR68## wherein the free bonds are meta or para to each other, or of the formula ##STR69## wherein R 5 , R 6 , R 7 , R 8 and R 11 are defined in claim 41.

Claim 45

A process according to claim 26 where in the polymer X" in formula III is C 2 -C 30 -alkylene, cycloalkylene containing 5 or 6 ring carbon atoms, C 7 -C 30 -aralkylene, C 6 -C 22 -arylene or a polysiloxane radical.

Claim 46

A process according to claim 43 wherein X" as arylene has the formula ##STR70## wherein m is 0 or 1, the free bonds are meta or preferably ortho to the R 12 group, R 11 has the same meaning as in formula VIIIa and R 12 has the same meaning as R 5 .

Claim 47

A process according to claim 44 wherein X" corresponds to formula IX, IXb or IXc ##STR71## wherein R 11 is a direct bond, --O--, --CO-- or --CH 2 --, and R 12 is methyl, ethyl, isopropyl, methoxy, ethoxy or a hydrogen atom.

Claim 48

A process according to claim 26 wherein the polymer contains 80-100 mol % of structural units of formula I, formula II or mixtures thereof, and 20-0 mol % of structural units of formula III, formula IV or mixtures thereof.

Claim 49

A process according to claim 26 where in the polymer the aromatic radical X' is an alkyl-substituted phenylene radical or bisphenylene radical.

Claim 50

A process according to claim 47 wherein the radical X' is of formula X ##STR72## wherein q' is 0 or 1, R j is a direct bond or a bridge, R 1 is C 1 -C 4 alkyl and R g to R n is a hydrogen atom or C 1 -C 4 alkyl, and the free bonds are meta or para to the R j group.

Claim 51

A process according to claim 48 wherein R j is a direct bond, or a bridge selected from the group consisting of --S--, --SO, --SO 2 , --CO--, --CH 2 --, --O-- or C 2 -C 6 -alkylidene.

Claim 52

A process according to claim 26 where in the polymer the radical of formula II corresponds to the structural unit ##STR73##