US4892844A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Making a low resistance three layered contact for silicon devices
Assignee: Advanced Micro Devices Inc
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Filing: 1988-12-16
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Granted: 1990-01-09
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Expires: 2008-12-16
Abstract
Abstract A three-layer metal contact including aluminum is provided for silicon-based semiconductor devices to minimize the effects of formation of silicon precipitates in the aluminum layer and low contact junction leakage. The metal contact comprises a first layer of a refractory metal silicide formed on a silicon surface, an intermediate layer of aluminum formed on the refractory metal silicide and a top layer of a refractory metal silicide formed on the layer of aluminum. Where contact is made to polysilicon layers forming high resistance load resistors, the metal contact of the invention prevents reduction in resistance resulting from the interdiffusion of silicon and aluminum.
Inventors
- 👤 Robin W. Cheung
- 👤 Bernard W. K. Ho
- 👤 Hsiang-Wen Chen
- 👤 Hugo W. K. Chan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 20:16
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/425; Y; Y10; Y10S; Y10S148/00; Y10S148/019
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
108 words
A process for forming an improved metal contact to conducting regions of a silicon-based semiconductor device formed on a surface of a silicon substrate, said contact formed through openings in a dielectric layer to said conducting regions underlying said dielectric layer, said process comprising: (a) forming a composite metal contact comprising (1) forming a first layer of a refractory metal silicide everywhere on said dielectric layer, including in said openings, (2) forming a second layer of aluminum on said refractory metal silicide, (3) forming a top layer of a refractory metal silicide on said layer of aluminum; (b) patterning said composite contact; and (c) sintering said composite contact.
Claim 2
Dependent Claim
108 words
A process for forming an improved metal contact to conducting regions of a silicon-based semiconductor device formed on a surface of a silicon substrate, said contact formed through openings in a dielectric layer to said conducting regions underlying said dielectric layer, said process comprising: (a) forming a composite metal contact comprising (1) forming a first layer of a refractory metal silicide everywhere on said dielectric layer, including in said openings, (2) forming a second layer of aluminum on said refractory metal silicide, (3) forming a top layer of a refractory metal silicide on said layer of aluminum; (b) patterning said composite contact; and (c) sintering said composite contact.
Claim 3
Dependent Claim
25 words
The process of claim 1 wherein said refractory metal silicide includes a refractory metal selected from the group consisting of molybdenum, tungsten, titanium and tantalum.
Claim 4
Dependent Claim
11 words
The process of claim 2 wherein said refractory metal comprises molybdenum.
Claim 5
Dependent Claim
19 words
The process of claim 1 wherein said refractory metal silicide ranges in thickness from about 500 to 2,000 Å.
Claim 6
Dependent Claim
19 words
The process of claim 4 wherein said thickness of said refractory metal silicide is about 1,000 to 1,100 Å.
Claim 7
Dependent Claim
22 words
The process of claim 1 wherein said refractory metal silicides and said aluminum are deposited on said substrate at an elevated temperature.
Claim 8
Dependent Claim
33 words
The process of claim 6 wherein said refractory metal silicides and said aluminum are deposited by sputtering appropriate materials on a substrate maintained at a temperature ranging from about 100° to 300° C.
Claim 9
Dependent Claim
31 words
The process of claim 6 wherein said contact is subsequently sintered in an oxygen-free atmosphere at a temperature less than about 450° C. for a time less than about 2 hours.
References Cited (Backward Citations)
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US4507852A
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US4800177A
Cited
US4744861A
Cited
JPS62163342A
Cited
US4796081A
Cited
US4824803A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-01-08 | 1993-07-10 | 1994-01-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-01-08 | 1997-07-10 | 1998-01-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-01-08 | 2001-07-10 | 2002-01-09 | $7700.00 | Window Closed / Lapsed |