Patent US4891118A successfully refreshed from Google Patents.
US4891118A
Expired / Lapsed
US
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Plasma processing apparatus
Assignee: Fuji Electric Co Ltd
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Filing: 1988-11-23
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Granted: 1990-01-02
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Expires: 2008-11-23
Abstract
Abstract In a typical plasma processing apparatus, microwaves are generated into a processing chamber which contains a gas and a substrate. Magnetic fields transmitted into the processing chamber cause plasma to be produced when microwaves are generated. Typically an RF bias voltage is applied to the substrate during the process. By optimizing the RF bias voltage which the pulses of microwaves the apparatus produces a higher quality thin film, or etching process, without damaging the substrate surface.
Inventors
- 👤 Kiyoshi Ooiwa
- 👤 Masahiko Doki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 13:03
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32357; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/515
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
222 words
A plasma processing apparatus comprising: a cylindrical plasma generating chamber having openings at the opposite ends thereof; a cylindrical processing chamber communicating with said plasma generating chamber via the opening at one end of said plasma chamber; means for evacuating said plasma generating chamber and said processing chamber; a microwave generator for generating pulses of microwaves; a waveguide means for transferring said pulses of microwaves through an opening at the end of said plasma chamber; a means for supplying a gas into said plasma generating chamber; an excitation solenoid surrounding said plasma generating chamber for generating lines of magnetic force within said plasma chamber substantially coaxially with the openings at the ends thereof for transforming said gas, by resonance effects with said microwaves, into a plasma of active atoms, molecules or ions; support means positioned within said processing chamber for supporting a substrate to be processed in a position to be bombarded by active atoms, molecules or ions flowing out of said plasma chamber along said lines of magnetic force; RF generating means for applying an RF bias to said substrate; and RF generation optimizing means for applying said RF bias voltage to said substrate during periods when said microwave pulses are generated, and for maintaining the voltage of the substrate below a predetermined threshold level during intervals between said microwave pulses.
Claim 2
Dependent Claim
222 words
A plasma processing apparatus comprising: a cylindrical plasma generating chamber having openings at the opposite ends thereof; a cylindrical processing chamber communicating with said plasma generating chamber via the opening at one end of said plasma chamber; means for evacuating said plasma generating chamber and said processing chamber; a microwave generator for generating pulses of microwaves; a waveguide means for transferring said pulses of microwaves through an opening at the end of said plasma chamber; a means for supplying a gas into said plasma generating chamber; an excitation solenoid surrounding said plasma generating chamber for generating lines of magnetic force within said plasma chamber substantially coaxially with the openings at the ends thereof for transforming said gas, by resonance effects with said microwaves, into a plasma of active atoms, molecules or ions; support means positioned within said processing chamber for supporting a substrate to be processed in a position to be bombarded by active atoms, molecules or ions flowing out of said plasma chamber along said lines of magnetic force; RF generating means for applying an RF bias to said substrate; and RF generation optimizing means for applying said RF bias voltage to said substrate during periods when said microwave pulses are generated, and for maintaining the voltage of the substrate below a predetermined threshold level during intervals between said microwave pulses.
Claim 3
Dependent Claim
66 words
A plasma processing apparatus as set forth in claim 1, wherein said RF generation optimizing means comprises a synchronization pulse generating circuit for generating synchronizing signals, and a pulse signal transmitting means for transferring said synchronizing signals to said RF generating means and to said microwave generator such that said RF bias voltage is applied to said substrate in synchronism with the generation of said plasma.
Claim 4
Dependent Claim
84 words
A plasma processing apparatus as set forth in claim 1, wherein said RF generation optimizing means comprises detecting means for detecting said voltage on the substrate, an RF bias modulation circuit for comparing said voltage on the substrate with a reference voltage, and an RF ON/OFF transferring means for providing to said RF generating means a signal based on said comparison for regulating the RF bias voltage on the substrate so as to prevent the voltage on the substrate from exceeding said threshold level.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-01-01 | 1993-07-03 | 1994-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-01-01 | 1997-07-03 | 1998-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-01-01 | 2001-07-03 | 2002-01-02 | $7700.00 | Window Closed / Lapsed |