Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
214 words
In a semiconductor laser device with an active layer for laser oscillation, the combination of a first layer that is of a first conductivity type; a second layer that is disposed as said active layer on said first layer, said second layer having a forbidden bandgap smaller than that of said first layer and having a refraction index larger than that of said first layer; a third layer that is of a second conductivity type, said third layer being disposed over said second layer, having a forbidden bandgap larger than that of said second layer, and having a refraction index smaller than that of said second layer; a fourth layer that functions as a quantum well, said fourth layer being disposed between said second and third layers and the thickness of said fourth layer being the de Broglie's wavelength or less; and at least one striped mesa, the lower portion of which is constituted by said third layer, wherein said fourth layer has a forbidden bandgap that is larger than that of the energy of photons generated by said second layer, and moreover said fourth layer is formed from a material with an etching rate different from that of a material from which said third layer positioned just above said fourth layer is formed.
Claim 2
Dependent Claim
214 words
In a semiconductor laser device with an active layer for laser oscillation, the combination of a first layer that is of a first conductivity type; a second layer that is disposed as said active layer on said first layer, said second layer having a forbidden bandgap smaller than that of said first layer and having a refraction index larger than that of said first layer; a third layer that is of a second conductivity type, said third layer being disposed over said second layer, having a forbidden bandgap larger than that of said second layer, and having a refraction index smaller than that of said second layer; a fourth layer that functions as a quantum well, said fourth layer being disposed between said second and third layers and the thickness of said fourth layer being the de Broglie's wavelength or less; and at least one striped mesa, the lower portion of which is constituted by said third layer, wherein said fourth layer has a forbidden bandgap that is larger than that of the energy of photons generated by said second layer, and moreover said fourth layer is formed from a material with an etching rate different from that of a material from which said third layer positioned just above said fourth layer is formed.
Claim 3
Dependent Claim
213 words
In a semiconductor laser device with an active layer for laser oscillation, the combination of a first layer that is of a first conductivity type; a second layer that is disposed as said active layer on said first layer, said second layer having a forbidden bandgap smaller than that of said first layer and having a refraction index larger than that of said first layer; a third layer that is of a second conductivity type, said third layer being disposed over said second layer, having a forbidden bandgap larger than that of said second layer, and having a refraction index smaller than that of said second layer; a fourth layer that functions as a quantum well, said fourth layer being disposed inside of said second layer and the thickness of said fourth layer being the de Broglie's wavelength or less; and at least one striped mesa, the lower portion of which is constituted by said third layer, wherein said fourth layer has a forbidden bandgap that is larger than that of the energy of photons generated by said second layer, and moreover said fourth layer is formed from a material with an etching rate different from that of a material from which said second layer positioned just above said fourth layer is formed.
Claim 4
Dependent Claim
213 words
In a semiconductor laser device with an active layer for laser oscillation, the combination of a first layer that is of a first conductivity type; a second layer that is disposed as said active layer on said first layer, said second layer having a forbidden bandgap smaller than that of said first layer and having a refraction index larger than that of said first layer; a third layer that is of a second conductivity type, said third layer being disposed over said second layer, having a forbidden bandgap larger than that of said second layer, and having a refraction index smaller than that of said second layer; a fourth layer that functions as a quantum well, said fourth layer being disposed inside of said second layer and the thickness of said fourth layer being the de Broglie's wavelength or less; and at least one striped mesa, the lower portion of which is constituted by said third layer, wherein said fourth layer has a forbidden bandgap that is larger than that of the energy of photons generated by said second layer, and moreover said fourth layer is formed from a material with an etching rate different from that of a material from which said second layer positioned just above said fourth layer is formed.