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US4888628A Expired / Lapsed US ⏱️ 0.0 years remaining

Dynamic memory in integrated circuit form

Assignee: Eurotechnique SA
•
Filing: 1986-02-10
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Granted: 1989-12-19
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Expires: 2006-02-10
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Abstract

Abstract In a dynamic memory for capacitive data storage, enhanced storage performances are achieved by increasing the value of the storage capacitance. A junction capacitor is formed between the source region and the well region in which the memory cells are formed, the junction capacitor being associated with a conventional capacitor. By judiciously and heavily doping the wells, the junction capacitances are appreciably increased. The heavy-doping operation is performed by backward implantation of the wells at very high energy in order to place the concentration peak of the wells at the depth of the base of the thick oxides which form separations between memory cells.

Inventors

  • 👤 Albert Bergemont

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 04:37
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/033; H10B12/30; H10B12/31

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 126 words
A dynamic memory in integrated circuit form for capacitive data storage of the type in which each memory cell comprises an MOS transistor having a given first channel polarity and formed in a well having a reverse second polarity in a semi-conductor substrate of the first polarity, said well having a high implant energy retrograde, wherein said memory comprises means for increasing the junction capacitance of the source-well junction of the transistor, and wherein the means for increasing the junction capacitance comprise unequally doped well regions in which the doping peak is located on the one hand in the immediate vicinity of the drain-source regions of the transistor and on the other hand directly beneath thick oxide regions which separate adjacent memory cells in the memory.
Claim 2
Dependent Claim 126 words
A dynamic memory in integrated circuit form for capacitive data storage of the type in which each memory cell comprises an MOS transistor having a given first channel polarity and formed in a well having a reverse second polarity in a semi-conductor substrate of the first polarity, said well having a high implant energy retrograde, wherein said memory comprises means for increasing the junction capacitance of the source-well junction of the transistor, and wherein the means for increasing the junction capacitance comprise unequally doped well regions in which the doping peak is located on the one hand in the immediate vicinity of the drain-source regions of the transistor and on the other hand directly beneath thick oxide regions which separate adjacent memory cells in the memory.
Claim 3
Dependent Claim 29 words
A memory according to claim 1, wherein the doping peaks correspond to an impurity concentration of the order of 10 17 to 10 18 atoms per cm 3 .
Claim 4
Dependent Claim 19 words
A memory according to claim 1, wherein said memory comprises means for adjusting the value of the junction capacitance.
Claim 5
Dependent Claim 20 words
A memory according to claim 1, wherein said memory comprises means for increasing the surface area of the source-well junction.
Claim 6
Dependent Claim 31 words
A memory according to claim 1, wherein said memory comprises means for reducing capacitances of transfer lines which transmit data between memory cells and circuits that are external to the memory.

References Cited (Backward Citations)

US4151607A Cited
US4329706A Cited
US4355374A Cited
JPS5667958A Cited
US4628590A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-12-18 1993-06-19 1993-12-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-12-18 1997-06-19 1997-12-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-12-18 2001-06-19 2001-12-19 $7700.00 Window Closed / Lapsed

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