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Sputtering target and method of preparing the same

Assignee: Eastman Kodak Co
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Filing: 1988-08-22
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Granted: 1989-12-05
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Expires: 2008-08-22
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Abstract

Abstract Highly uniform alloy targets are prepared by melting together predetermined amounts of terbium iron and cobalt with an additional element selected from platinum, chromium, nickel, palladium, tantalum, hafnium or mixtures thereof in an argon atmosphere and casting the thus formed melt into a mold.

Inventors

  • 👤 Tukaram K. Hatwar

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 03:47
CPC Classifications
G; G11; G11B; G11B7/00; G11B7/24; G11B7/26; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; Y; Y10; Y10S; Y10S428/00; Y10S428/922; Y10S428/9265; Y10S428/928

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 47 words
A sputtering target comprising a fine grain, physically sound, uniform composition, uniform structure corrosion resistant alloy of terbium, iron and cobalt and containing from about 2.5 to about 15 atomic percent of an element selected from the group consisting of platinum, chromium, nickel, palladium, tantalum and hafnium.
Claim 2
Dependent Claim 47 words
A sputtering target comprising a fine grain, physically sound, uniform composition, uniform structure corrosion resistant alloy of terbium, iron and cobalt and containing from about 2.5 to about 15 atomic percent of an element selected from the group consisting of platinum, chromium, nickel, palladium, tantalum and hafnium.
Claim 3
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is platinum.
Claim 4
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is chromium.
Claim 5
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is nickel.
Claim 6
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is palladium.
Claim 7
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is tantalum.
Claim 8
Dependent Claim 11 words
The sputtering target of claim 1 wherein the element is hafnium.
Claim 9
Dependent Claim 50 words
The sputtering target of claim 1 wherein terbium is present in the alloy in an amount of from about 10 to about 40 atomic percent iron an amount of from about 50 to about 85 atomic percent and cobalt in an amount of from about 5 to 15 atomic percent.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-12-04 1993-06-05 1993-12-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-12-04 1997-06-05 1997-12-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-12-04 2001-06-05 2001-12-05 $7700.00 Window Closed / Lapsed

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