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US4868621A Expired / Lapsed US ⏱️ 0.0 years remaining

Input protection circuit

Assignee: Toshiba Corp
•
Filing: 1988-03-11
•
Granted: 1989-09-19
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Expires: 2008-03-11
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Abstract

Abstract An input protection circuit for prevention of electrostatic breakdown is provided. This circuit comprises, on a semiconductor substrate of a first conductivity type, a heavily doped region of a second conductivity type connected to an input terminal and a heavily doped region of the first conductivity type so that they are in contact with each other. This circuit may further include another heavily doped region of the second conductivity type connected to the ground level with it being opposite to the heavily doped region of the second conductivity type provided in the above-mentioned elementary circuit configuration. Thus, the p-n junction comprising heavily doped regions is formed to thereby lower the junction breakdown voltage when a breakdown due to an input of a high potential occurs, resulting in an increased electrostatic withstand voltage.

Inventors

  • 👤 Junichi Miyamoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 05:00
CPC Classifications
H; H10; H10D; H10D89/00; H10D89/60; H10D89/601

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 82 words
An input protection circuit comprising: a heavily doped region of a second conductivity type which is formed on a semiconductor substrate of a first conductivity type, and connected to an input terminal; and a heavily doped region of the first conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being in contact with said heavily doped region of the second conductivity type, and being surrounded by said heavily doped region of the second conductivity type.
Claim 2
Dependent Claim 82 words
An input protection circuit comprising: a heavily doped region of a second conductivity type which is formed on a semiconductor substrate of a first conductivity type, and connected to an input terminal; and a heavily doped region of the first conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being in contact with said heavily doped region of the second conductivity type, and being surrounded by said heavily doped region of the second conductivity type.
Claim 3
Dependent Claim 40 words
A circuit as set forth in claim 1, wherein said heavily doped region of the second conductivity type is common to the drain of an output MOS transistor, thus providing a function to output a signal from said input terminal.
Claim 4
Dependent Claim 40 words
A circuit as set forth in claim 1, wherein said heavily doped region of the second conductivity type is common to the drain of an output MOS transistor, thus providing a function to output a signal from said input terminal.
Claim 5
Dependent Claim 129 words
An input protection circuit comprising: a first heavily doped region of a second conductivity type which is formed on a semiconductor substrate of a first conductivity type, and connected to an input terminal; a heavily doped region of the first conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being in contact with said first heavily doped region of the second conductivity type, and being surrounded by said first heavily doped region of the second conductivity type; and a second heavily doped region of the second conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being opposite to said first heavily doped region of the second conductivity type, and connected to a reference power source.
Claim 6
Dependent Claim 129 words
An input protection circuit comprising: a first heavily doped region of a second conductivity type which is formed on a semiconductor substrate of a first conductivity type, and connected to an input terminal; a heavily doped region of the first conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being in contact with said first heavily doped region of the second conductivity type, and being surrounded by said first heavily doped region of the second conductivity type; and a second heavily doped region of the second conductivity type which is formed on said semiconductor substrate of the first conductivity type with it being opposite to said first heavily doped region of the second conductivity type, and connected to a reference power source.
Claim 7
Dependent Claim 42 words
A circuit as set forth in claim 4, wherein said heavily doped region of the first conductivity type is located between said first heavily doped region of the second conductivity type and said second heavily doped region of the second conductivity type.
Claim 8
Dependent Claim 40 words
A circuit as set forth in claim 4, wherein said heavily doped region of the second conductivity type is common to the drain of an output MOS transistor, thus providing a function to output a signal from said input terminal.
Claim 9
Dependent Claim 40 words
A circuit as set forth in claim 5, wherein said heavily doped region of the second conductivity type is common to the drain of an output MOS transistor, thus providing a function to output a signal from said input terminal.

References Cited (Backward Citations)

US4449158A Cited
EP0057024A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-09-18 1993-03-20 1993-09-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-09-18 1997-03-20 1997-09-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-09-18 2001-03-20 2001-09-19 $7700.00 Window Closed / Lapsed

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