US4859563A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive photoresist composition
Assignee: Mitsubishi Chemical Corp
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Filing: 1987-03-09
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Granted: 1989-08-22
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Expires: 2007-03-09
Abstract
Abstract Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-napthtoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxyl groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
Inventors
- 👤 Konoe Miura
- 👤 Tameichi Ochiai
- 👤 Yasuhiro Kameyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 19:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
96 words
A positive photoresist composition consisting essentially of an admixture of (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which, on the average, not less than two hydroxyl groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of 10 to 80 mol % of m-cresol, 10 to 80 mol % of p-cresol and 10 to 80 mol % of 2,5-xylenol with formaldehyde, the weight ratio of said 1,2-naphthoquinone diazides photosensitive-material to said novolak resin being in the range of 15/100 to 60/100.
Claim 2
Dependent Claim
96 words
A positive photoresist composition consisting essentially of an admixture of (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which, on the average, not less than two hydroxyl groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of 10 to 80 mol % of m-cresol, 10 to 80 mol % of p-cresol and 10 to 80 mol % of 2,5-xylenol with formaldehyde, the weight ratio of said 1,2-naphthoquinone diazides photosensitive-material to said novolak resin being in the range of 15/100 to 60/100.
Claim 3
Dependent Claim
25 words
A positive photoresist composition according to claim 1, wherein the weight-average molecular weight of said novolak resin is in the range of 1,000 to 30,000.
Claim 4
Dependent Claim
35 words
A positive photoresist composition according to claim 1, wherein said 1,2-naphthoquinone diazides photosensitive-material is an esterified 2,3,4,4'-tetrahydroxybenzophenone in which, on the average 2.5 to 3.5 hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid.
Claim 5
Dependent Claim
30 words
A positive photoresist composition according to claim 1, wherein the weight ratio of said 1,2-naphthoquinone diazides photosensitive material to said novolak resin is in the range of 20/100 to 55/100.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-08-21 | 1993-02-20 | 1993-08-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-08-21 | 1997-02-20 | 1997-08-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-08-21 | 2001-02-20 | 2001-08-22 | $7700.00 | Window Closed / Lapsed |