US4857430A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process and system for determining photoresist development endpoint by effluent analysis
Assignee: Texas Instruments Inc
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Filing: 1987-12-17
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Granted: 1989-08-15
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Expires: 2007-12-17
Abstract
Abstract A system and method for determining the pattern development endpoint of a photoresist polymer during spin/spray processing of a semiconductor wafer utilizes the optical transmission of the waster developer liquid during the pattern develop process to determine when the developing is completed.
Inventors
- 👤 Edwin G. Millis
- 👤 Samuel J. Wood, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 23:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/3021; G03F7/3028
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
99 words
In a method of developing patterned photoresist polymer on a semiconductor wafer and detecting the endpoint of the develop process, the steps of spraying developer fluid onto a semiconductor wafer mounted and spinning on a spinning vacuum chuck, catching the developer fluid as it is spun from the surface of the semiconductor wafer, draining the developer fluid into an analysis chamber, analyzing the developer fluid for the amount of dissolved photoresist polymer therein, and rinsing the semiconductor wafer to remove developer fluid therefrom when the detected amount of dissolved photoresist polymer in the developer fluid reaches a predetermined amount.
Claim 2
Dependent Claim
99 words
In a method of developing patterned photoresist polymer on a semiconductor wafer and detecting the endpoint of the develop process, the steps of spraying developer fluid onto a semiconductor wafer mounted and spinning on a spinning vacuum chuck, catching the developer fluid as it is spun from the surface of the semiconductor wafer, draining the developer fluid into an analysis chamber, analyzing the developer fluid for the amount of dissolved photoresist polymer therein, and rinsing the semiconductor wafer to remove developer fluid therefrom when the detected amount of dissolved photoresist polymer in the developer fluid reaches a predetermined amount.
Claim 3
Dependent Claim
45 words
The method according to claim 1, wherein the analysis chamber measures the amount of photoresist polymer in the developer fluid by monitoring the ultraviolet light transparency of the developer fluid, which transparency is dependent upon the amount of photoresist polymer dissolved in the developer fluid.
Claim 4
Dependent Claim
50 words
The method according to claim 2, wherein said analysis chamber measures the transparency of the developer fluid by directing a beam of filtered light through the developer fluid to a photodetector, the amount of light from the beam reaching the photodetector being indicative of the transparency of the developer fluid.
Claim 5
Dependent Claim
37 words
The method according to claim 3, wherein a reference value is used in determining the ultraviolet light transparency of the developer fluid, said reference being the transparency of developer fluid that has no photoresist polymer dissolved therein.
Claim 6
Dependent Claim
21 words
The method according to claim 1, wherein the developer fluid drains at the rate of at least 1-3 milliliter per second.
Claim 7
Dependent Claim
108 words
In a method of developing patterned photoresist polymer on a semiconductor wafer and detecting the endpoint of the develop process, the steps of spraying developer fluid onto a semiconductor wafer mounted and spinning on a spinning vacuum chuck, catching the developer fluid in a steeply-sloped drain bowl as it is spun from the surface of the semiconductor wafer, draining the developer fluid from the drain bowl into an analysis chamber, analyzing the developer fluid for the amount of dissolved photoresist polymer therein, and rinsing the semiconductor wafer to remove developer fluid therefrom when the detected amount of dissolved photoresist polymer in the developer fluid reaches a predetermined amount.
Claim 8
Dependent Claim
108 words
In a method of developing patterned photoresist polymer on a semiconductor wafer and detecting the endpoint of the develop process, the steps of spraying developer fluid onto a semiconductor wafer mounted and spinning on a spinning vacuum chuck, catching the developer fluid in a steeply-sloped drain bowl as it is spun from the surface of the semiconductor wafer, draining the developer fluid from the drain bowl into an analysis chamber, analyzing the developer fluid for the amount of dissolved photoresist polymer therein, and rinsing the semiconductor wafer to remove developer fluid therefrom when the detected amount of dissolved photoresist polymer in the developer fluid reaches a predetermined amount.
Claim 9
Dependent Claim
46 words
The method according to claim 6, wherein the analysis chamber measures the changing amount of photoresist polymer in the developer fluid by monitoring the ultraviolet light transparency of the developer fluid, which transparency is dependent upon the amount of photoresist polymer dissolved in the developer fluid.
Claim 10
Dependent Claim
51 words
The method according to claim 7, wherein said analysis chamber measures the ultraviolet light transparency of the developer fluid by directing a beam of light through the developer fluid to a photodetector, the amount of light from the beam reaching the photodetector being indicative of the transparency of the developer fluid.
Claim 11
Dependent Claim
35 words
The method according to claim 8, wherein a reference value is used in determining the transparency of the developer fluid, said reference being the transparency of developer fluid that has no photoresist polymer dissolved therein.
Claim 12
Dependent Claim
30 words
The method according to claim 6, wherein the developer fluid is analyzed in the analysis chamber to determine the rate of change of the photoresist polymer in the developer fluid.
Claim 13
Dependent Claim
44 words
The method according to claim 10, wherein the endpoint of the develop process of the photoresist polymer on the semiconductor wafer is reached when the fluid transmission recovers substantially and the rate of change of the photoresist polymer in the developer fluid approaches zero.
References Cited (Backward Citations)
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US4166702A
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US4201579A
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GB2041569A
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JPS572042A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-08-14 | 1993-02-13 | 1993-08-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-08-14 | 1997-02-13 | 1997-08-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-08-14 | 2001-02-13 | 2001-08-15 | $7700.00 | Window Closed / Lapsed |