US4846948A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing magnetic films of Fe-Si-Al alloy
Assignee: Eneos Corp
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Filing: 1987-11-05
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Granted: 1989-07-11
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Expires: 2007-11-05
Abstract
Abstract A method of producing a magnetic film of Fe-Si-Al alloy in which argon is entrapped, by using a DC magnetron sputtering apparatus to apply RF bias to a substrate thereby depositing a Fe-Si-Al alloy film on the substrate. The alloy film produced has a thermal expansion coefficient of 110x10-7 to 170x10-7 DEG C.-1 and the substrate has a thermal expansion coefficient of 100x10-7 to 135x10-7 DEG C.-1. The amount of argon entrapped in the alloy film is controlled within the range of 0.01 o 0.3 weight percent so as to substantially zero the internal stresses in the alloy film.
Inventors
- 👤 Kazuhiro Saito
- 👤 Taiichi Mori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 23:47
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; G11B5/3109; G11B5/313; G11B5/147; G11B5/3163; H; H01; H01F; H01F10/00; H01F10/08; H01F10/10; H01F10/12; H01F10/14; H01F10/142; H01F10/145; H01F10/26; H01F10/265; H01F41/00; H01F41/14; H01F41/18; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/4902; Y10T29/49021; Y10T29/49032; Y10T29/49036; Y10T29/49043; Y10T29/49055
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
102 words
A method of producing a magnetic film of Fe-Si-Al alloy, characterized by using a DC sputtering apparatus to apply RF bias to a substrate and to deposit a Fe-Si-Al alloy film on said substrate, said alloy film having a thermal expansion coefficient of 110×10 -7 to 170×10 -7 ° C. -1 and said substrate having a thermal expansion coefficient of 100×10 -7 to 135 ×10 -7 ° C. -1 , and the amount of argon entrapped in said alloy film being controlled within range of 0.01 to 0.3 wt % so as to substantially zero the internal stesses in said alloy film.
Claim 2
Independent Claim
102 words
A method of producing a magnetic film of Fe-Si-Al alloy, characterized by using a DC sputtering apparatus to apply RF bias to a substrate and to deposit a Fe-Si-Al alloy film on said substrate, said alloy film having a thermal expansion coefficient of 110×10 -7 to 170×10 -7 ° C. -1 and said substrate having a thermal expansion coefficient of 100×10 -7 to 135 ×10 -7 ° C. -1 , and the amount of argon entrapped in said alloy film being controlled within range of 0.01 to 0.3 wt % so as to substantially zero the internal stesses in said alloy film.
Claim 3
Dependent Claim
42 words
The method according to claim 1 wherein said Fe-Si-Al alloy film is a composition containing 83 to 94 wt % Fe, 4 to 11 wt % Si and 2 to 6 wt % Al and having a high level of saturation magnetization.
Claim 4
Dependent Claim
16 words
The method according to claim 1 or 2 wherein said substrate is made of crystallized glass.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-07-10 | 1993-01-09 | 1993-07-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-07-10 | 1997-01-09 | 1997-07-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-07-10 | 2001-01-09 | 2001-07-11 | $7700.00 | Window Closed / Lapsed |