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US4845183A
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Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
Assignee: Hoechst Celanese Chemical Co
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Filing: 1987-11-24
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Granted: 1989-07-04
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Expires: 2007-11-24
Abstract
Abstract Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack. The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.
Inventors
- 👤 Werner H. Mueller
- 👤 Dinesh N. Khanna
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 14:22
CPC Classifications
C; C08; C08G; C08G63/00; C08G63/02; C08G63/12; C08G63/40; C08G63/44; C08G73/00; C08G73/06; C08G73/22; C08G69/00; C08G69/02; C08G69/26; C08G69/32; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1337; G02F1/133711; G02F1/133723; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/027; G03F7/032; G03F7/037; H; H01; H01B; H01B3/00; H01B3/18; H01B3/30; H01B3/303; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24628; Y10T428/24736
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
96 words
A polyamide comprising the following recurring structure in the polymer chain: ##STR9## wherein: (1) R is a tetravalent aromatic moiety of the formula: ##STR10## (2) R' is a monovalent moiety independently selected from: ##STR11## X is hydrogen or a substituent independently selected from: substituted or unsubstituted lower alkyl of 1 to 8 carbons or substituted or unsubstituted phenyl; Z is independently selected from chloro, bromo, fluoro, iodo or lower alkyl of 1 to 6 carbons; n is independently 0 or 1; and (3) R" is selected from a substituted or unsubstituted alkylene, alicyclic or arylene moiety.
Claim 2
Dependent Claim
96 words
A polyamide comprising the following recurring structure in the polymer chain: ##STR9## wherein: (1) R is a tetravalent aromatic moiety of the formula: ##STR10## (2) R' is a monovalent moiety independently selected from: ##STR11## X is hydrogen or a substituent independently selected from: substituted or unsubstituted lower alkyl of 1 to 8 carbons or substituted or unsubstituted phenyl; Z is independently selected from chloro, bromo, fluoro, iodo or lower alkyl of 1 to 6 carbons; n is independently 0 or 1; and (3) R" is selected from a substituted or unsubstituted alkylene, alicyclic or arylene moiety.
Claim 3
Dependent Claim
14 words
A coating solution comprising an organic solvent and a polyamide according to claim 1.
Claim 4
Dependent Claim
10 words
A polyamide film comprising a polyamide according to claim 1.
Claim 5
Dependent Claim
10 words
A molded part comprising a polyamide according to claim 1.
Claim 6
Dependent Claim
10 words
The polyamide of claim 1 wherein R 1 is hydrogen.
Claim 7
Dependent Claim
9 words
The polyamide of claim 5 wherein n is 0.
Claim 8
Dependent Claim
17 words
The polyamide of claim 6 wherein R is the amide condensation residuum of the amine: 4,4,-Bis[2-(3-amino-4-hydroxyphenyl)-hexafluoroisopropyl]diphenyl ether.
Claim 9
Dependent Claim
17 words
The polyamide of claim 7 further including the amide condensation residuum of 2,2-hexafluoro-bis-(3-amino-4-hydroxyphenyl)propane in the polymer structure.
Claim 10
Dependent Claim
37 words
The polyamide of claim 7 which is the amide condensation residuum of one or a mixture of acid halides having the formula: ##STR12## wherein R" represents a divalent alkylene, alicyclic or aromatic moiety, and halo represents halogen.
Claim 11
Dependent Claim
38 words
The polyamide of claim 9 wherein the acid halide is selected from the group consisting of isophthaloyl chloride, terephthaloyl chloride, 2,2-hexafluoro-bis(4-chlorocarbonylphenyl) propane, 4,4,'-bis[2-(4-chlorocarbonylphenyl)hexafluoroisopropyl]diphenyl ether, 4,4, 'para-diphenyl ether dibenzoyl chloride, 4,4,'-para-phenylenedioxy dibenzoyl chloride, 2,6-naphthalene diacid chloride, and mixtures thereof.
Claim 12
Dependent Claim
18 words
The polyamide of claim 10 wherein the acid halide is a mixture of isophthaloyl chloride and terephthaloyl chloride.
Claim 13
Dependent Claim
13 words
The polyamide of claim 10 wherein the acid halide consists of isophthaloyl chloride.
Claim 14
Dependent Claim
13 words
The polyamide of claim 10 wherein the acid halide consists of terephthaloyl chloride.
Claim 15
Dependent Claim
15 words
A coating solution comprising the polyamide of claim 1 dissolved in propylene glycol methyl ether.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1992-07-03 | 1993-01-02 | 1993-07-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-07-03 | 1997-01-02 | 1997-07-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-07-03 | 2001-01-02 | 2001-07-04 | $7700.00 | Window Closed / Lapsed |