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US4843451A Expired / Lapsed US ⏱️ 0.0 years remaining

Photovoltaic device with O and N doping

Assignee: Sanyo Electric Co Ltd
•
Filing: 1988-07-29
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Granted: 1989-06-27
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Expires: 2008-07-29
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Abstract

Abstract A photovoltaic device has at least one set of amorphous semiconductor layers forming a p-i-n junction structure, wherein at least one of the semiconductor layers having a given thickness, is doped with nitrogen and oxygen to a depth forming at least part of said given thickness. Such a photovoltaic device is fabricated by depositing on a substrate at least one set of amorphous semiconductor layers which form a p-i-n junction structure, and by doping at least one of the layers with nitrogen and oxygen to a depth forming at least part of the thickness of the doped layer.

Inventors

  • 👤 Kaneo Watanabe
  • 👤 Tsugufumi Matsuoka
  • 👤 Yukio Nakashima
  • 👤 Hisao Haku

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 18:19
CPC Classifications
H; H10; H10F; H10F71/00; H10F71/10; H10F71/103; H10F10/00; H10F10/10; H10F10/17; H10F71/1035; H10F77/00; H10F77/10; H10F77/12; H10F77/122; H10F77/1223; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/548; Y02P; Y02P70/00; Y02P70/50

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 102 words
A photovoltaic device comprising at least one set of amorphous semiconductor layers which form a p-i-n junction structure, said semiconductor layers including a p-layer, an intrinsic i-layer, and an n-layer, at least one layer of said semiconductor layers having a given thickness and being doped simultaneously with nitrogen and oxygen so that both nitrogen and oxygen are present together in said at least one layer to a depth forming at least part of said given thickness, and so that said doped layer contains nitrogen with the range of 0.01 to 3.0 at.% and oxygen within the range of 0.05 to 5.0 at.%.
Claim 2
Dependent Claim 102 words
A photovoltaic device comprising at least one set of amorphous semiconductor layers which form a p-i-n junction structure, said semiconductor layers including a p-layer, an intrinsic i-layer, and an n-layer, at least one layer of said semiconductor layers having a given thickness and being doped simultaneously with nitrogen and oxygen so that both nitrogen and oxygen are present together in said at least one layer to a depth forming at least part of said given thickness, and so that said doped layer contains nitrogen with the range of 0.01 to 3.0 at.% and oxygen within the range of 0.05 to 5.0 at.%.
Claim 3
Dependent Claim 16 words
The photovoltaic device of claim 1, wherein the preferred oxygen range is 0.1 to 1.0 at.%.
Claim 4
Dependent Claim 22 words
The photovoltaic device of claim 1, wherein a doped layer contains nitrogen of about 0.02 at.% and oxygen of about 0.4 at.%.
Claim 5
Dependent Claim 12 words
The photovoltaic device of claim 1, wherein said intrinsic i-layer is doped.
Claim 6
Dependent Claim 19 words
The photovoltaic device of claim 1, wherein said intrinsic i-layer is doped to at least part of its depth.
Claim 7
Dependent Claim 45 words
The photovoltaic device of claim 1, wherein at least one of the doped nitrogen and oxygen is distributed with a concentration which changes in the direction of the depth of the i-layer from one surface of the i-layer to an opposite surface of the i-layer.
Claim 8
Dependent Claim 11 words
The photovoltaic device of claim 1, wherein a p-layer is doped.
Claim 9
Dependent Claim 11 words
The photovoltaic device of claim 1, wherein an n-layer is doped.

References Cited (Backward Citations)

US4064521A Cited
US4385199A Cited
US4460670A Cited
US4626885A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-06-26 1992-12-26 1993-06-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-06-26 1996-12-26 1997-06-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-06-26 2000-12-26 2001-06-27 $7700.00 Window Closed / Lapsed

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